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公开(公告)号：US08216762B2
公开(公告)日：2012-07-10
申请号：US11814899
申请日：2006-02-01
申请人： Byoung-Kee Kim , Se-Hyung Park , Dal-Seok Byun , Seog-Jeong Song , Jong-Min Park
发明人： Byoung-Kee Kim , Se-Hyung Park , Dal-Seok Byun , Seog-Jeong Song , Jong-Min Park
CPC分类号： G03F7/161 , G02F1/1362 , G02F2001/136231 , G03F7/0048 , G03F7/022 , H01L27/12 , H01L27/3244 , H01L2227/326
摘要： An array for a display device is formed by adhering a positive dry film resist, which has a positive photoresist resin layer over a supporting film, to a substrate such that the photoresist resin layer adheres on a surface of the substrate. The supporting film is then released from the photoresist resin layer adhered to the surface of the substrate, the layer is exposed to light; and the positive type photoresist layer is developed to remove exposed regions.
摘要翻译： 通过将具有正性光致抗蚀剂树脂层的正性干膜抗蚀剂粘附到基板上，使得光致抗蚀剂树脂层粘附在基板的表面上，形成显示装置的阵列。 然后将支撑膜从粘附到基板表面的光致抗蚀剂树脂层中释放，该层暴露于光; 并且显影正型光致抗蚀剂层以去除暴露的区域。
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2.发明授权Composition for positive type photoresist and positive type photoresist film manufactured thereby 有权由此制造正型光致抗蚀剂和正型光致抗蚀剂膜的组合物公开(公告)号：US08197934B2
公开(公告)日：2012-06-12
申请号：US12296744
申请日：2007-04-06
申请人： Byoung-Kee Kim , Se-Hyung Park , Bryong-Il Lee , Jong-Min Park , Seog-Jeong Song
发明人： Byoung-Kee Kim , Se-Hyung Park , Bryong-Il Lee , Jong-Min Park , Seog-Jeong Song
CPC分类号： G03F7/0226 , Y10T428/265 , Y10T428/266
摘要： Disclosed are a composition for positive type photoresist and a positive type photoresist film manufactured thereby. The composition comprises an alkali soluble resin, a photosensitive compound, a thermo-curable cross linking agent, a sensitivity enhancer and a solvent. The photoresist film has a supporting film and a photoresist layer formed on the supporting film, wherein the photoresist layer comprises the alkali soluble resin, the photosensitive compound, the thermo-curable cross linking agent and the sensitivity enhancer.
摘要翻译： 公开了由其制造的正型光致抗蚀剂和正型光致抗蚀剂膜的组合物。 该组合物包含碱溶性树脂，光敏化合物，热可固化交联剂，敏感性增强剂和溶剂。 光致抗蚀剂膜具有支撑膜和形成在支撑膜上的光致抗蚀剂层，其中光致抗蚀剂层包含碱溶性树脂，光敏化合物，可热固化交联剂和灵敏度增强剂。
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3.发明申请Composition For Positive Type Photoresist and Positive Type Photoresist Film Manufactured Thereby 有权因此，制造正型光致抗蚀剂和正型光致抗蚀剂膜的组成公开(公告)号：US20090274900A1
公开(公告)日：2009-11-05
申请号：US12296744
申请日：2007-04-06
申请人： Byoung-Kee Kim , Se-Hyung Park , Bryong-Il Lee , Jong-Min Park , Seog-Jeong Song
发明人： Byoung-Kee Kim , Se-Hyung Park , Bryong-Il Lee , Jong-Min Park , Seog-Jeong Song
IPC分类号： G03F7/039
CPC分类号： G03F7/0226 , Y10T428/265 , Y10T428/266
摘要： Disclosed are a composition for positive type photoresist and a positive type photoresist film manufactured thereby. The composition comprises an alkali soluble resin, a photosensitive compound, a thermo-curable cross linking agent, a sensitivity enhancer and a solvent. The photoresist film has a supporting film and a photoresist layer formed on the supporting film, wherein the photoresist layer comprises the alkali soluble resin, the photosensitive compound, the thermo-curable cross linking agent and the sensitivity enhancer.
摘要翻译： 公开了由其制造的正型光致抗蚀剂和正型光致抗蚀剂膜的组合物。 该组合物包含碱溶性树脂，光敏化合物，热可固化交联剂，敏感性增强剂和溶剂。 光致抗蚀剂膜具有支撑膜和形成在支撑膜上的光致抗蚀剂层，其中光致抗蚀剂层包含碱溶性树脂，光敏化合物，可热固化交联剂和灵敏度增强剂。
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公开(公告)号：US20080166659A1
公开(公告)日：2008-07-10
申请号：US11814897
申请日：2006-02-01
申请人： Byoung-Kee Kim , Se-Hyung Park , Dal-Seok Byun , Seog-Jeong Song , Jong-Min Park
发明人： Byoung-Kee Kim , Se-Hyung Park , Dal-Seok Byun , Seog-Jeong Song , Jong-Min Park
CPC分类号： G03F7/0226 , G03F7/0048 , G03F7/0236
摘要： A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The photoresist layer may be formed from a composition containing a resin, a photosensitive compound, and a first solvent having a boiling point sufficiently high such that a second solvent can be removed from the composition by heating while the first solvent is substantially retained in the composition.
摘要翻译： 正型光致抗蚀剂树脂膜包含层压在载体膜上的支撑膜和正性光致抗蚀剂树脂层。 光致抗蚀剂层可以由含有树脂，光敏化合物和沸点足够高的第一溶剂的组合物形成，使得可以通过加热将第二溶剂从组合物中除去，同时第一溶剂基本上保留在组合物中 。
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公开(公告)号：US20080135842A1
公开(公告)日：2008-06-12
申请号：US11814899
申请日：2006-02-01
申请人： Byoung-Kee Kim , Se-Hyung Park , Dal-Seok Byun , Seog-Jeong Song , Jong-Min Park
发明人： Byoung-Kee Kim , Se-Hyung Park , Dal-Seok Byun , Seog-Jeong Song , Jong-Min Park
CPC分类号： G03F7/161 , G02F1/1362 , G02F2001/136231 , G03F7/0048 , G03F7/022 , H01L27/12 , H01L27/3244 , H01L2227/326
摘要： An array for a display device is formed by adhering a positive dry film resist, which has a positive photoresist resin layer over a supporting film, to a substrate such that the photoresist resin layer adheres on a surface of the substrate. The supporting film is then released from the photoresist resin layer adhered to the surface of the substrate, the layer is exposed to light; and the positive type photoresist layer is developed to remove exposed regions.
摘要翻译： 通过将具有正性光致抗蚀剂树脂层的正性干膜抗蚀剂粘附到基板上，使得光致抗蚀剂树脂层粘附在基板的表面上，形成显示装置的阵列。 然后将支撑膜从粘附到基板表面的光致抗蚀剂树脂层中释放，该层暴露于光; 并且显影正型光致抗蚀剂层以去除暴露的区域。
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