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    Composition for positive type photoresist and positive type photoresist film manufactured thereby
    4.
    发明授权
    Composition for positive type photoresist and positive type photoresist film manufactured thereby 有权
    由此制造正型光致抗蚀剂和正型光致抗蚀剂膜的组合物

    公开(公告)号：US08197934B2

    公开(公告)日：2012-06-12

    申请号：US12296744

    申请日：2007-04-06

    申请人： Byoung-Kee Kim ,  Se-Hyung Park ,  Bryong-Il Lee ,  Jong-Min Park ,  Seog-Jeong Song

    发明人： Byoung-Kee Kim ,  Se-Hyung Park ,  Bryong-Il Lee ,  Jong-Min Park ,  Seog-Jeong Song

    IPC分类号： G11B5/64 ,  C09J7/02

    CPC分类号： G03F7/0226 ,  Y10T428/265 ,  Y10T428/266

    摘要： Disclosed are a composition for positive type photoresist and a positive type photoresist film manufactured thereby. The composition comprises an alkali soluble resin, a photosensitive compound, a thermo-curable cross linking agent, a sensitivity enhancer and a solvent. The photoresist film has a supporting film and a photoresist layer formed on the supporting film, wherein the photoresist layer comprises the alkali soluble resin, the photosensitive compound, the thermo-curable cross linking agent and the sensitivity enhancer.

    摘要翻译： 公开了由其制造的正型光致抗蚀剂和正型光致抗蚀剂膜的组合物。 该组合物包含碱溶性树脂，光敏化合物，热可固化交联剂，敏感性增强剂和溶剂。 光致抗蚀剂膜具有支撑膜和形成在支撑膜上的光致抗蚀剂层，其中光致抗蚀剂层包含碱溶性树脂，光敏化合物，可热固化交联剂和灵敏度增强剂。

    Composition For Positive Type Photoresist and Positive Type Photoresist Film Manufactured Thereby
    5.
    发明申请
    Composition For Positive Type Photoresist and Positive Type Photoresist Film Manufactured Thereby 有权
    因此，制造正型光致抗蚀剂和正型光致抗蚀剂膜的组成

    公开(公告)号：US20090274900A1

    公开(公告)日：2009-11-05

    申请号：US12296744

    申请日：2007-04-06

    申请人： Byoung-Kee Kim ,  Se-Hyung Park ,  Bryong-Il Lee ,  Jong-Min Park ,  Seog-Jeong Song

    发明人： Byoung-Kee Kim ,  Se-Hyung Park ,  Bryong-Il Lee ,  Jong-Min Park ,  Seog-Jeong Song

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0226 ,  Y10T428/265 ,  Y10T428/266

    摘要： Disclosed are a composition for positive type photoresist and a positive type photoresist film manufactured thereby. The composition comprises an alkali soluble resin, a photosensitive compound, a thermo-curable cross linking agent, a sensitivity enhancer and a solvent. The photoresist film has a supporting film and a photoresist layer formed on the supporting film, wherein the photoresist layer comprises the alkali soluble resin, the photosensitive compound, the thermo-curable cross linking agent and the sensitivity enhancer.

    摘要翻译： 公开了由其制造的正型光致抗蚀剂和正型光致抗蚀剂膜的组合物。 该组合物包含碱溶性树脂，光敏化合物，热可固化交联剂，敏感性增强剂和溶剂。 光致抗蚀剂膜具有支撑膜和形成在支撑膜上的光致抗蚀剂层，其中光致抗蚀剂层包含碱溶性树脂，光敏化合物，可热固化交联剂和灵敏度增强剂。

    Positive Type Dry Film Photoresist
    6.
    发明申请
    Positive Type Dry Film Photoresist 有权
    正型干膜光刻胶

    公开(公告)号：US20080090168A1

    公开(公告)日：2008-04-17

    申请号：US11791886

    申请日：2005-12-07

    申请人： Byoung-Kee Kim ,  Se-Hyung Park ,  Jong-Min Park ,  Seong-In Baek

    发明人： Byoung-Kee Kim ,  Se-Hyung Park ,  Jong-Min Park ,  Seong-In Baek

    IPC分类号： G03C1/52

    CPC分类号： G03F7/0007 ,  G03F7/022 ,  G03F7/0226 ,  G03F7/0236 ,  G03F7/09

    摘要： A positive type photoresist resin film includes a support film and a thermosetting positive type photoresist resin layer laminated over the support film. The positive type photoresist resin layer contains alkali soluble resin, a diazide based photosensitive compound and a sensitivity enhancer. The support film has a surface roughness that inhibits the formation of defect structures such as fish eye. The invention overcomes process inefficiencies and defects cause by spin coating photoresist technologies.

    摘要翻译： 正型光致抗蚀剂树脂膜包括层压在载体膜上的支撑膜和热固性正型光致抗蚀剂树脂层。 正型光致抗蚀剂树脂层含有碱溶性树脂，二叠氮类光敏化合物和灵敏度增强剂。 支撑膜具有抑制鱼眼等缺陷结构的形成的表面粗糙度。 本发明克服了通过旋涂光刻胶技术引起的工艺低效率和缺点。

    Positive Type Dry Film Photoresist And Composition For Preparing The Same
    8.
    发明申请
    Positive Type Dry Film Photoresist And Composition For Preparing The Same 失效
    正型干膜光刻胶及其制备方法

    公开(公告)号：US20080124654A1

    公开(公告)日：2008-05-29

    申请号：US11791887

    申请日：2005-12-07

    申请人： Se-Hyung Park ,  Byoung-Kee Kim ,  Jong-Min Park ,  Seong-In Baek

    发明人： Se-Hyung Park ,  Byoung-Kee Kim ,  Jong-Min Park ,  Seong-In Baek

    IPC分类号： G03F7/039

    CPC分类号： G03F7/022 ,  G03F7/0007 ,  G03F7/0226 ,  G03F7/0233

    摘要： A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The peak height (Rp) of the support film is less than about 300 nm to eliminate fish eye defects. The positive photoresist resin layer may contain alkali soluble resin, a diazide based photosensitive compound, a plasticizer and, optionally, a sensitivity enhancer and a releasing agent.

    摘要翻译： 正型光致抗蚀剂树脂膜包含层压在载体膜上的支撑膜和正性光致抗蚀剂树脂层。 支撑膜的峰高（Rp）小于约300nm以消除鱼眼缺陷。 正性光致抗蚀剂树脂层可以含有碱溶性树脂，二叠氮基感光性化合物，增塑剂，任选的敏感性增强剂和脱模剂。

    Positive type dry film photoresist
    9.
    发明授权
    Positive type dry film photoresist 有权
    正型干膜光致抗蚀剂

    公开(公告)号：US07790345B2

    公开(公告)日：2010-09-07

    申请号：US11791886

    申请日：2005-12-07

    申请人： Byoung-Kee Kim ,  Se-Hyung Park ,  Jong-Min Park ,  Seong-In Baek

    发明人： Byoung-Kee Kim ,  Se-Hyung Park ,  Jong-Min Park ,  Seong-In Baek

    IPC分类号： G03F7/023

    CPC分类号： G03F7/0007 ,  G03F7/022 ,  G03F7/0226 ,  G03F7/0236 ,  G03F7/09

    摘要： A positive type photoresist resin film includes a support film and a thermosetting positive type photoresist resin layer laminated over the support film. The positive type photoresist resin layer contains alkali soluble resin, a diazide based photosensitive compound and a sensitivity enhancer. The support film has a surface roughness that inhibits the formation of defect structures such as fish eye. The invention overcomes process inefficiencies and defects cause by spin coating photoresist technologies.

    摘要翻译： 正型光致抗蚀剂树脂膜包括层压在载体膜上的支撑膜和热固性正型光致抗蚀剂树脂层。 正型光致抗蚀剂树脂层含有碱溶性树脂，二叠氮类光敏化合物和灵敏度增强剂。 支撑膜具有抑制鱼眼等缺陷结构的形成的表面粗糙度。 本发明克服了通过旋涂光刻胶技术引起的工艺低效率和缺点。

    METHOD AND APPARATUS FOR CONTROLLING BATTERY
    10.
    发明申请
    METHOD AND APPARATUS FOR CONTROLLING BATTERY 有权
    用于控制电池的方法和装置

    公开(公告)号：US20090174410A1

    公开(公告)日：2009-07-09

    申请号：US12299592

    申请日：2007-05-04

    申请人： Ju-Young Kim ,  Jong-Min Park ,  Jun-IlI Yoon ,  Do-Young Kim ,  Do-Yang Jung

    发明人： Ju-Young Kim ,  Jong-Min Park ,  Jun-IlI Yoon ,  Do-Young Kim ,  Do-Yang Jung

    IPC分类号： G01R31/00

    CPC分类号： H01M10/48 ,  G01R31/362 ,  H01M10/44

    摘要： An apparatus for controlling a battery includes a capacitor for charging a voltage when the apparatus is on and discharging a voltage when the apparatus is off, a discharging circuit for discharging the voltage charged in the capacitor; a first switching unit for connecting or disconnecting the capacitor to/from a predetermined power source for the purpose of charging of the capacitor; a second switching unit for connecting or disconnecting the capacitor to/from the discharging unit; a voltage measuring unit for measuring a voltage charged in the capacitor; and a controller for calculating a power-off duration time according to the measured voltage. This apparatus may continuously calculate a power-off duration time of a battery pack.

    摘要翻译： 一种用于控制电池的装置包括：电容器，用于在装置接通时对电压进行充电，并且在装置关闭时放电;放电电路，用于对充电电容器中的电压进行放电; 第一开关单元，用于将电容器连接到/从预定电源断开，以便为电容器充电; 第二开关单元，用于将电容器连接到/从放电单元断开; 用于测量电容器中充电的电压的电压测量单元; 以及控制器，用于根据所测量的电压来计算断电持续时间。 该装置可以连续地计算电池组的断电持续时间。