Two-fluid nozzle for cleaning substrate and substrate cleaning apparatus
    1.
    发明申请
    Two-fluid nozzle for cleaning substrate and substrate cleaning apparatus 有权
    用于清洁基板和基板清洁装置的双流体喷嘴

    公开(公告)号:US20070141849A1

    公开(公告)日:2007-06-21

    申请号:US10591474

    申请日:2005-03-09

    IPC分类号: B08B3/00 B41J2/05 H01L21/302

    摘要: An object of the present is to uniform particle diameters and speeds of liquid droplets in a two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate. The two-fluid nozzle for cleaning substrates has a gas supply passage for supplying gas, a liquid supply passage for supplying liquid, and a lead-out passage for leading out internally-formed liquid droplets, wherein an injection port for injecting liquid droplets to the outside is formed at the front end of the lead-out passage, and wherein a cross-sectional area Sb of the injection port is formed smaller than a cross-sectional area Sa of the lead-out passage, and a cross sectional area Sc of an exit of the gas supply passage is formed smaller than the cross-sectional area Sa of the lead-out passage.

    摘要翻译: 本发明的目的是在二流体喷嘴中用于清洁衬底的液滴的均匀的粒子直径和速度,这些衬底在内部混合气体和液体,并且用气体注入液滴以便清洁衬底。 用于清洁基板的双流体喷嘴具有用于供应气体的气体供应通道,用于供应液体的液体供应通道和用于引出内部形成的液滴的引出通道,其中用于将液滴注入到喷嘴 外部形成在引出通道的前端,并且其中注入口的横截面面积Sb形成为小于引出通道的横截面积Sa,横截面面积Sc 气体供给通道的出口形成为小于引出通道的横截面面积Sa。

    Two-fluid nozzle for cleaning substrate and substrate cleaning apparatus
    2.
    发明授权
    Two-fluid nozzle for cleaning substrate and substrate cleaning apparatus 有权
    用于清洁基板和基板清洁装置的双流体喷嘴

    公开(公告)号:US08037891B2

    公开(公告)日:2011-10-18

    申请号:US10591474

    申请日:2005-03-09

    IPC分类号: B08B3/04

    摘要: An object of the present is to uniform particle diameters and speeds of liquid droplets in a two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate. The two-fluid nozzle for cleaning substrates has a gas supply passage for supplying gas, a liquid supply passage for supplying liquid, and a lead-out passage for leading out internally-formed liquid droplets, wherein an injection port for injecting liquid droplets to the outside is formed at the front end of the lead-out passage, and wherein a cross-sectional area Sb of the injection port is formed smaller than a cross-sectional area Sa of the lead-out passage, and a cross sectional area Sc of an exit of the gas supply passage is formed smaller than the cross-sectional area Sa of the lead-out passage.

    摘要翻译: 本发明的目的是在二流体喷嘴中用于清洁衬底的液滴的均匀的粒子直径和速度,这些衬底在内部混合气体和液体,并且用气体注入液滴以便清洁衬底。 用于清洁基板的双流体喷嘴具有用于供应气体的气体供应通道,用于供应液体的液体供应通道和用于引出内部形成的液滴的引出通道,其中用于将液滴注入到喷嘴 外部形成在引出通道的前端,并且其中注入口的横截面面积Sb形成为小于引出通道的横截面积Sa,横截面面积Sc 气体供给通道的出口形成为小于引出通道的横截面面积Sa。