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1.发明申请公开(公告)号：US20070141849A1
公开(公告)日：2007-06-21
申请号：US10591474
申请日：2005-03-09
IPC分类号： B08B3/00 , B41J2/05 , H01L21/302
CPC分类号： H01L21/67051 , B01F3/04049 , B05B7/0433 , B08B3/02 , Y10S134/902
摘要： An object of the present is to uniform particle diameters and speeds of liquid droplets in a two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate. The two-fluid nozzle for cleaning substrates has a gas supply passage for supplying gas, a liquid supply passage for supplying liquid, and a lead-out passage for leading out internally-formed liquid droplets, wherein an injection port for injecting liquid droplets to the outside is formed at the front end of the lead-out passage, and wherein a cross-sectional area Sb of the injection port is formed smaller than a cross-sectional area Sa of the lead-out passage, and a cross sectional area Sc of an exit of the gas supply passage is formed smaller than the cross-sectional area Sa of the lead-out passage.
摘要翻译： 本发明的目的是在二流体喷嘴中用于清洁衬底的液滴的均匀的粒子直径和速度，这些衬底在内部混合气体和液体，并且用气体注入液滴以便清洁衬底。 用于清洁基板的双流体喷嘴具有用于供应气体的气体供应通道，用于供应液体的液体供应通道和用于引出内部形成的液滴的引出通道，其中用于将液滴注入到喷嘴 外部形成在引出通道的前端，并且其中注入口的横截面面积Sb形成为小于引出通道的横截面积Sa，横截面面积Sc 气体供给通道的出口形成为小于引出通道的横截面面积Sa。
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2.发明授权公开(公告)号：US08037891B2
公开(公告)日：2011-10-18
申请号：US10591474
申请日：2005-03-09
IPC分类号： B08B3/04
CPC分类号： H01L21/67051 , B01F3/04049 , B05B7/0433 , B08B3/02 , Y10S134/902
摘要： An object of the present is to uniform particle diameters and speeds of liquid droplets in a two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate. The two-fluid nozzle for cleaning substrates has a gas supply passage for supplying gas, a liquid supply passage for supplying liquid, and a lead-out passage for leading out internally-formed liquid droplets, wherein an injection port for injecting liquid droplets to the outside is formed at the front end of the lead-out passage, and wherein a cross-sectional area Sb of the injection port is formed smaller than a cross-sectional area Sa of the lead-out passage, and a cross sectional area Sc of an exit of the gas supply passage is formed smaller than the cross-sectional area Sa of the lead-out passage.
摘要翻译： 本发明的目的是在二流体喷嘴中用于清洁衬底的液滴的均匀的粒子直径和速度，这些衬底在内部混合气体和液体，并且用气体注入液滴以便清洁衬底。 用于清洁基板的双流体喷嘴具有用于供应气体的气体供应通道，用于供应液体的液体供应通道和用于引出内部形成的液滴的引出通道，其中用于将液滴注入到喷嘴 外部形成在引出通道的前端，并且其中注入口的横截面面积Sb形成为小于引出通道的横截面积Sa，横截面面积Sc 气体供给通道的出口形成为小于引出通道的横截面面积Sa。
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公开(公告)号：US07806989B2
公开(公告)日：2010-10-05
申请号：US11394337
申请日：2006-03-31
申请人： Kenji Sekiguchi , Noritaka Uchida , Satoru Tanaka , Hiroki Ohno
发明人： Kenji Sekiguchi , Noritaka Uchida , Satoru Tanaka , Hiroki Ohno
CPC分类号： H01L21/67051 , B08B3/02 , B08B3/024 , B08B3/04 , H01L21/6708 , Y10S134/902
摘要： A substrate (W) is processed with the use of a process liquid such as a deionized water. Then, a first fluid which is more volatile than the process liquid is supplied to an upper surface of the substrate (W) from a fluid nozzle (12) to form a liquid film. Next, a second fluid which is more volatile than the process liquid is supplied to the upper surface of the substrate (W) from the fluid nozzle (12), while the wafer (W) is being rotated. During this supply operation, a supply position (Sf) of the second fluid to the substrate (W) is moved radially outward from a rotational center (Po) of the substrate (W). As a result, it is possible to prevent the generation of particles on the substrate (W) after it is dried by using the first and second fluids.
摘要翻译： 使用诸如去离子水的工艺液体处理衬底（W）。 然后，从流体喷嘴（12）向基板（W）的上表面供给比处理液更易挥发的第一流体，形成液膜。 接下来，在晶片（W）旋转的同时，从流体喷嘴（12）向基板（W）的上表面供给比处理液更易挥发的第二流体。 在该供给动作中，第二流体与基板（W）的供给位置（Sf）从基板（W）的旋转中心（Po）向径向外侧移动。 结果，可以防止在通过使用第一和第二流体干燥基板（W）之后产生颗粒。
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4.发明申请Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method 有权基板清洁装置，基板清洗方法和用于该方法的记录程序的介质公开(公告)号：US20070175501A1
公开(公告)日：2007-08-02
申请号：US10593560
申请日：2005-04-05
申请人： Masaru Amai , Kenji Sekiguchi , Takehiko Orii , Hiroki Ohno , Satoru Tanaka , Takuya Mori
发明人： Masaru Amai , Kenji Sekiguchi , Takehiko Orii , Hiroki Ohno , Satoru Tanaka , Takuya Mori
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , B08B1/04 , H01L21/67046
摘要： In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. A process fluid formed of liquid droplets and a gas is sprayed by a two-fluid nozzle 5 onto the substrate W, and a cleaning position Sn of the two-fluid nozzle 5 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. During the movement of the cleaning position Sb of the brush 3 from the center part of the substrate W toward the peripheral part thereof, the cleaning position Sb of the two-fluid nozzle is positioned nearer to a center P0 than the cleaning position Sb of the brush 3. Since contaminations of the brush are prevented from adhering again to the wafer, it can be avoided that the wafer W is contaminated.
摘要翻译： 在根据本发明的基板清洗方法和基板清洗方法中，刷子3在旋转基板W的同时与基板W接触，并且刷子3的清洁位置Sb相对于基板W从 衬底W的中心部分朝向其周边部分。 由液滴和气体形成的工艺流体由双流体喷嘴5喷射到基板W上，并且双流体喷嘴5的清洁位置Sn相对于基板W从基板的中心部分移动 W朝向其周边部分。 在刷子3的清洁位置Sb从基板W的中心部朝向其周边部移动的过程中，双流体喷嘴的清洁位置Sb位于更靠近中心P 0 < >刷3的清洁位置Sb。 由于防止刷子的污染再次粘附到晶片上，所以可以避免晶片W被污染。
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公开(公告)号：US5695817A
公开(公告)日：1997-12-09
申请号：US512018
申请日：1995-08-07
申请人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
发明人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
摘要： A method of forming a coating film, in which the coating film is formed by supplying a coating liquid onto a surface of a substrate, while the substrate housed in a processing vessel is rotated together with the processing vessel, includes the steps of coating the surface of the substrate with a solvent, supplying the coating liquid to the substrate, rotating the substrate and the processing vessel at a first rotation speed to diffuse the coating liquid on the surface of the substrate, closing the processing vessel with a lid to seal the substrate in the processing vessel, and rotating the processing vessel with the lid and the substrate at a second rotation speed to uniform a film thickness of the coating film.
摘要翻译： 一种形成涂膜的方法，其中通过将涂覆液体供给到基材的表面上形成涂膜，同时容纳在处理容器中的基材与处理容器一起旋转，包括以下步骤：将表面 的溶剂，将涂布液供给到基板，以第一旋转速度旋转基板和处理容器，以将涂布液扩散到基板的表面上，用盖子封闭处理容器以密封基板 在处理容器中，并且以第二转速旋转具有盖和基板的处理容器以使涂膜的膜厚均匀。
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6.发明授权Substrate cleaning method, substrate cleaning apparatus, control program, and computer-readable storage medium 失效基板清洗方法，基板清洗装置，控制程序和计算机可读存储介质公开(公告)号：US08197606B2
公开(公告)日：2012-06-12
申请号：US12707098
申请日：2010-02-17
申请人： Tsukasa Watanabe , Naoki Shindo , Hiroki Ohno , Kenji Sekiguchi
发明人： Tsukasa Watanabe , Naoki Shindo , Hiroki Ohno , Kenji Sekiguchi
IPC分类号： B08B7/02
CPC分类号： H01L21/67051 , B24C7/0046 , H01L21/02057 , Y10S134/902
摘要： Disclosed is a substrate cleaning method for prevent damage to a pattern formed on a substrate. The substrate cleaning method includes cleaning the substrate by striking cleaning particulates carried in a flow of dry air or inert gas against a surface of the substrate, and removing the cleaning particulates.
摘要翻译： 公开了一种用于防止对在基板上形成的图案的损坏的基板清洗方法。 基板清洗方法包括通过将干燥空气或惰性气体中携带的清洁微粒冲击到基板的表面上并清除清洁颗粒来清洁基板。
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公开(公告)号：US20070223342A1
公开(公告)日：2007-09-27
申请号：US11578099
申请日：2005-10-12
申请人： Takehiko Orii , Kenji Sekiguchi , Noritaka Uchida , Satoru Tanaka , Hiroki Ohno
发明人： Takehiko Orii , Kenji Sekiguchi , Noritaka Uchida , Satoru Tanaka , Hiroki Ohno
IPC分类号： C23F1/00 , G11B31/00 , H01L21/306
CPC分类号： F26B5/005 , H01L21/02052 , H01L21/67034 , H01L21/67051 , H01L21/6708
摘要： A substrate processing apparatus according to the present invention is provided with a spin chuck (3) that holds a substrate (W) and rotates the same. A process liquid supply system (11, . . . ) is disposed to supply a process liquid to the substrate rotated by the spin chuck. There are disposed a fluid nozzle (12) that supplies to the substrate a drying fluid having a higher volatility than that of the process liquid, and an inert gas nozzle (13) that supplies an inert gas to the substrate. A nozzle moving mechanism (15, 52, . . . ) is disposed that moves the nozzles (12, 13) radially outward relative to a rotational center (Po) of the substrate, while maintaining the inert gas nozzle nearer to the rotational center of the substrate than the fluid nozzle.
摘要翻译： 根据本发明的基板处理装置设置有保持基板（W）并使其旋转的旋转卡盘（3）。 处理液体供应系统（11 ...）被设置成将处理液体提供给由旋转卡盘旋转的基板。 设置有一个流体喷嘴（12），其向基体提供具有比处理液体挥发性更高的挥发性的干燥流体;以及惰性气体喷嘴（13），该惰性气体喷嘴向基板供应惰性气体。 设置喷嘴移动机构（15,52 ...），其相对于基板的旋转中心（Po）径向向外移动喷嘴（12,13），同时保持惰性气体喷嘴更靠近基板的旋转中心 衬底比流体喷嘴。
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公开(公告)号：US07010826B2
公开(公告)日：2006-03-14
申请号：US09960413
申请日：2001-09-24
申请人： Keizo Hirose , Kenji Sekiguchi
发明人： Keizo Hirose , Kenji Sekiguchi
IPC分类号： B08B1/04
CPC分类号： H01L21/67057 , B08B1/04 , B08B3/04
摘要： A substrate cleaning tool having little particle sticking to the tool and a substrate cleaning apparatus having the substrate cleaning tool are provided. The substrate cleaning tool 23 has a plurality of thready brush members 46 in a bundle. The brush members 46 are capable of passing cleaning liquid through and ejecting the cleaning liquid through respective surfaces of the members 46. In operation, the substrate cleaning tool 23 is brought into contact with a substrate W in their relative movement in order to clean the substrate W. As the cleaning liquid is ejected from the surfaces of the brash members 46, particles are washed away from the surfaces of the brash members 46. Consequently, it is possible to eliminate a possibility that the particles etc. are transferred to the substrate W.
摘要翻译： 提供了具有很少的颗粒粘附到工具的基板清洁工具和具有基板清洁工具的基板清洁装置。 基板清洁工具23具有多个已经是一束的刷子构件46。 刷构件46能够将清洁液通过并通过构件46的相应表面喷射清洗液。 在操作中，基板清洁工具23在其相对运动中与基板W接触以便清洁基板W.随着清洁液体从刷毛构件46的表面喷射，颗粒被从表面 的刷子46。 因此，可以消除将颗粒等转移到基板W的可能性。
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公开(公告)号：US06745533B2
公开(公告)日：2004-06-08
申请号：US10202139
申请日：2002-07-24
申请人： Toshio Yamashita , Yoshimasa Tsuchiya , Kazuyuki Nakamura , Kiyoshi Nakamura , Kenji Sekiguchi , Hiroshi Murakami , Nobuaki Miura , Isao Kojima , Sadao Suzuki , Yasuyoshi Shimazaki , Yoichiro Takeuchi , Fumio Fujita
发明人： Toshio Yamashita , Yoshimasa Tsuchiya , Kazuyuki Nakamura , Kiyoshi Nakamura , Kenji Sekiguchi , Hiroshi Murakami , Nobuaki Miura , Isao Kojima , Sadao Suzuki , Yasuyoshi Shimazaki , Yoichiro Takeuchi , Fumio Fujita
IPC分类号： G21C1518
摘要： The present invention is provided for considerably shortening the construction time of a building that is applied to nuclear power plants. When constructing the building, megablocks having a height that extends to a plurality of floors are produced, and together with combining those megablocks, concrete is poured inside them to form a wall member composed of a megawall structure of steel plate reinforced concrete construction. Alternatively, in addition to the wall megablocks, floor megablocks for forming the floor member of the building are used, and together with combining those megablocks, concrete is poured inside or above them to form a structural member (wall member and floor member) composed of a megawall structure of steel plate reinforced concrete construction.
摘要翻译： 提供本发明大大缩短了应用于核电站的建筑物的施工时间。 制造建筑物时，产生高度延伸到多层的大块，并结合这些大块砖，将混凝土浇注在其中，形成由钢板钢筋混凝土结构的兆瓦结构构成的壁构件。 或者，除了墙壁大块之外，还使用了用于形成建筑物的地板构件的地板大块，并且将这些大块结合在一起，混凝土被浇注在其内部或上方，以形成由以下构成的结构构件（壁构件和地板构件） 钢板混凝土结构的兆瓦结构。
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公开(公告)号：US5803970A
公开(公告)日：1998-09-08
申请号：US753768
申请日：1996-11-29
申请人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
发明人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
摘要： A method of forming a coating film, in which the coating film is formed by supplying a coating liquid onto a surface of a substrate, while the substrate housed in a processing vessel is rotated together with the processing vessel, includes the steps of coating the surface of the substrate with a solvent, supplying the coating liquid to the substrate, rotating the substrate and the processing vessel at a first rotation speed to diffuse the coating liquid on the surface of the substrate, closing the processing vessel with a lid to seal the substrate in the processing vessel, and rotating the processing vessel with the lid and the substrate at a second rotation speed to uniform a film thickness of the coating film.
摘要翻译： 一种形成涂膜的方法，其中通过将涂覆液体供给到基材的表面上形成涂膜，同时容纳在处理容器中的基材与处理容器一起旋转，包括以下步骤：将表面 的溶剂，将涂布液供给到基板，以第一旋转速度旋转基板和处理容器，以将涂布液扩散到基板的表面上，用盖子封闭处理容器以密封基板 在处理容器中，并且以第二转速旋转具有盖和基板的处理容器以使涂膜的膜厚均匀。
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