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1.
公开(公告)号:US5690745A
公开(公告)日:1997-11-25
申请号:US544158
申请日:1995-10-17
IPC分类号: B05D3/04 , B05D7/02 , B05D7/22 , B05D7/24 , B29C59/14 , B60K15/03 , C08F2/52 , C08J7/00 , H05H1/46 , C23C16/00
CPC分类号: B05D1/62 , B05D7/227 , B29C59/142 , B60K15/03177 , H05H1/46
摘要: A treatment chamber (1) evacuable by vacuum pumps (13,13') has a mounting (26,26', . . .) bearing the hollow body (4) in the treatment chamber (1), and a line (9,9') for the admission of a process gas into the treatment chamber (1). A microwave conductor (20,20' . . .) is connected with a generator (19,19' . . .) for igniting a plasma in the area of channels formed by a sheet-metal shroud (2,2') matching the configuration of the hollow body (4). A closure (7,7') is provided through which the filler opening (6, 6') of the hollow body (4) can be closed pressure-tight, and a line (9,9') for the process gas passes through the closure.
摘要翻译: 由真空泵(13,13')排空的处理室(1)具有在处理室(1)中承载空心体(4)的安装件(26,26'), 9'),用于将处理气体进入处理室(1)。 微波导体(20,20')与发生器(19,19')连接,用于点燃由与金属外壳(2,2')相匹配的金属板(2,2')形成的通道区域中的等离子体 中空体(4)的构造。 提供一个封闭件(7,7'),中空体(4)的填料开口(6,6')通过该封闭件可以被压缩密封,并且用于工艺气体的管线(9,9')通过 关闭。