公开(公告)号：US5690745A

公开(公告)日：1997-11-25

申请号：US544158

申请日：1995-10-17

申请人： Heinrich Grunwald ,  Hermann Kloberdanz ,  Roland Lacher ,  Siang-Hong Boll

发明人： Heinrich Grunwald ,  Hermann Kloberdanz ,  Roland Lacher ,  Siang-Hong Boll

IPC分类号： B05D3/04 ,  B05D7/02 ,  B05D7/22 ,  B05D7/24 ,  B29C59/14 ,  B60K15/03 ,  C08F2/52 ,  C08J7/00 ,  H05H1/46 ,  C23C16/00

CPC分类号： B05D1/62 ,  B05D7/227 ,  B29C59/142 ,  B60K15/03177 ,  H05H1/46

摘要： A treatment chamber (1) evacuable by vacuum pumps (13,13') has a mounting (26,26', . . .) bearing the hollow body (4) in the treatment chamber (1), and a line (9,9') for the admission of a process gas into the treatment chamber (1). A microwave conductor (20,20' . . .) is connected with a generator (19,19' . . .) for igniting a plasma in the area of channels formed by a sheet-metal shroud (2,2') matching the configuration of the hollow body (4). A closure (7,7') is provided through which the filler opening (6, 6') of the hollow body (4) can be closed pressure-tight, and a line (9,9') for the process gas passes through the closure.

摘要翻译： 由真空泵（13,13'）排空的处理室（1）具有在处理室（1）中承载空心体（4）的安装件（26,26'）， 9'），用于将处理气体进入处理室（1）。 微波导体（20,20'）与发生器（19,19'）连接，用于点燃由与金属外壳（2,2'）相匹配的金属板（2,2'）形成的通道区域中的等离子体 中空体（4）的构造。 提供一个封闭件（7,7'），中空体（4）的填料开口（6,6'）通过该封闭件可以被压缩密封，并且用于工艺气体的管线（9,9'）通过 关闭。

公开(公告)号：US6007875A

公开(公告)日：1999-12-28

申请号：US20715

申请日：1998-02-09

申请人： Heinrich Grunwald ,  Michael Jung ,  Wilfried Dicken ,  Stefan Kunkel ,  Klaus Nauenburg

发明人： Heinrich Grunwald ,  Michael Jung ,  Wilfried Dicken ,  Stefan Kunkel ,  Klaus Nauenburg

IPC分类号： C08L83/02 ,  B05D7/24 ,  C08F2/00 ,  C08F2/52 ,  C08G77/02 ,  C23C14/12 ,  C23C14/56 ,  F21V7/22 ,  G02B1/10 ,  C08J7/18

CPC分类号： B05D1/62 ,  C23C14/566 ,  C23C14/568 ,  F21V7/22 ,  G02B1/105

摘要： A process for applying a protective coating on the reflective layer of projector reflectors by means of plasma polymerization is provided, where a first protective layer which was applied on the reflective layer in a vacuum chamber by plasma polymerization of an organic silicon compound, is provided by means of a plasma in the same processing chamber, under uninterrupted vacuum conditions, with a second, hydrophilic layer substantially composed of a hydrocarbon skeleton and polar functional groups linked thereto, use is made of an apparatus which comprises a plurality of treatment stations (8, 9, 10) held by a fixed, circular cylindrical vacuum chamber wall (16) and a rotatable inner wall cylinder (17) which is enclosed by said vacuum chamber wall (16) and which holds four substrate chambers (12 through 15) and where the wall of the vacuum chamber (16) is provided with four openings (3 through 6) with which the substrate chambers (3 through 6) can be aligned and through which openings the treatment material can act upon the substrates (2, 2', . . . ), with an outer wall (21, 21', . . . ) which encloses the vacuum chamber wall (16) from the outside and extends radially outward from said vacuum chamber wall (16) and joins together the three treatment stations (8, 9, 10) and the loading/unloading station (11), where at least one of the outer chambers (17 through 20) provided between the outer wall, the vacuum chamber wall and the treatment stations (8, 9, 10) is connected on the one hand with the adjoining treatment station and on the other hand with a gas source or an initial substance source (30 through 33).

摘要翻译： 提供了通过等离子体聚合在投影仪反射体的反射层上施加保护涂层的方法，其中通过有机硅化合物的等离子体聚合在真空室中施加在反射层上的第一保护层由 在不间断的真空条件下，在相同处理室中的等离子体的装置，具有基本上由烃骨架和与其连接的极性官能团的第二亲水层，使用包括多个处理站（8， 9，10）由固定的圆柱形真空室壁（16）和可旋转的内壁圆筒（17）保持，该内壁圆柱体（17）由所述真空室壁（16）包围并保持四个基板室（12至15） 真空室（16）的壁设置有四个开口（3至6），基板室（3至6）可通过该开口对准，通过该开口 处理材料可以作用在基板（2,2'，...）上。 。 。 ），其具有从外部包围真空室壁（16）并从所述真空室壁（16）径向向外延伸的外壁（21,21'...），并将三个处理站（8， 9，10）和装卸站（11），其中设置在外壁，真空室壁和处理站（8,9,10）之间的至少一个外室（17至20）连接 一方面与毗邻的处理站，另一方面与气源或初始物质来源（30至33）。

公开(公告)号：US6126792A

公开(公告)日：2000-10-03

申请号：US363850

申请日：1999-07-30

申请人： Heinrich Grunwald ,  Michael Liehr

发明人： Heinrich Grunwald ,  Michael Liehr

IPC分类号： G02C7/02 ,  C23C14/34 ,  C23C14/56 ,  C23C16/44 ,  C23C16/455 ,  C23C16/50 ,  C23C16/511 ,  C23C16/54 ,  C23C17/34

CPC分类号： C23C16/4558 ,  C23C14/228 ,  C23C14/34 ,  C23C14/568 ,  C23C16/511 ,  C23C16/54

摘要： For the application of a scratch protection layer on plastic substrates, a plasma is produced by the plasma CVD method, away from the individual plastic substrate, in an excitation gas, and this excitation gas is supplied through a tube to the plastic substrate. Subsequently, an antireflection layer is applied by means of a gas flow sputter source. The apparatus provided for this has a plasma CVD chamber (1) and a gas flow sputter chamber (2), next to one another. The plastic substrates (7,8) to be coated are transported from the plasma CVD chamber (2) to the gas flow sputter chamber (1) with the aid of a transporting device (3), designed as a turning plate.

摘要翻译： 为了在塑料基板上施加刮擦保护层，通过等离子体CVD方法在激发气体中离开各个塑料基板产生等离子体，并且该激发气体通过管道供应到塑料基板。 随后，通过气流溅射源施加抗反射层。 为此提供的装置具有彼此相邻的等离子体CVD室（1）和气体流动溅射室（2）。 待涂覆的塑料基板（7,8）借助于设计为转板的输送装置（3）从等离子体CVD室（2）输送到气流溅射室（1）。

公开(公告)号：US07244381B2

公开(公告)日：2007-07-17

申请号：US10472370

申请日：2002-02-28

申请人： Dominique Chatard ,  Heinrich Grunwald ,  Wilhelm Lothar ,  Hanno Käss

发明人： Dominique Chatard ,  Heinrich Grunwald ,  Wilhelm Lothar ,  Hanno Käss

IPC分类号： B29C49/16 ,  B29C49/46

CPC分类号： B05D1/60 ,  B05D7/227 ,  B29B2911/1402 ,  B29B2911/14026 ,  B29B2911/14033 ,  B29B2911/1404 ,  B29B2911/14053 ,  B29B2911/14066 ,  B29B2911/1408 ,  B29B2911/14093 ,  B29B2911/14106 ,  B29B2911/14113 ,  B29B2911/14133 ,  B29B2911/1414 ,  B29B2911/1424 ,  B29C37/0028 ,  B29C49/04 ,  B29C49/06 ,  B29C49/16 ,  B29C49/46 ,  B29C2049/027 ,  B29C2049/4647 ,  B29C2049/4688 ,  B29K2067/00 ,  B29K2995/0067 ,  B29L2031/7158

摘要： The invention relates to a method for blow forming a container (1) from a parison (2) made of plastic. After heating, said container is preformed by a gas injected into the container (1, 2) at a low pressure of 5 bar and by expanding the inner volume of said container. The final shape of the container can then be achieved by igniting an inflammable gas injected into the container, whereby the combustion generates a higher blowing pressure, or by injecting an additional gas with a higher blowing pressure of approximately 40 bar into the container after pre-blowing. The invention aims at improving known blow forming methods in such a way that a barrier layer impervious to gases, aromatic substances or the like is produced on the inner side of the container without having to use big machines. To this end, a precursor gas is added to and mixed with the inflammable gas, the mixture is then ignited and a coating is formed on the inner surface of the container by the combustion. Alternatively, an inflammable precursor gas is injected into the shaped, stress-relieved container that has been formed by means of classical stretch blow forming. Said gas is then ignited and once again the coating is formed on the inner surface of the precursor gas by the combustion.

摘要翻译： 本发明涉及一种从塑料制成的型坯（2）吹塑成型容器（1）的方法。 在加热之后，所述容器通过以5巴的低压注射到容器（1,2）中的气体并且通过膨胀所述容器的内部容积来预先形成。 然后可以通过点燃注入到容器中的可燃气体来实现容器的最终形状，由此燃烧产生更高的吹送压力，或者通过在预处理之后将具有大约40巴的较高吹送压力的附加气体注入容器中， 吹。 本发明的目的在于改进已知的吹塑成型方法，使得在容器的内侧不会使用大型机器，在容器的内侧产生不透气体，芳香族物质等的阻挡层。 为此，将前体气体加入并与可燃气体混合，然后点燃混合物，并通过燃烧在容器的内表面上形成涂层。 或者，将可燃性前体气体注入到通过经典的拉伸吹塑成形形成的成形的，应力释放的容器中。 然后点燃所述气体，再次通过燃烧在前体气体的内表面上形成涂层。

公开(公告)号：US4863549A

公开(公告)日：1989-09-05

申请号：US214450

申请日：1988-07-01

申请人： Heinrich Grunwald

发明人： Heinrich Grunwald

IPC分类号： C23C16/50 ,  C23C16/515 ,  C23F4/00 ,  H01J37/32

CPC分类号： H01J37/32082 ,  C23C16/515 ,  H01J37/32165 ,  H01J37/32174 ,  H01J37/32706 ,  H01J2237/3348

摘要： The invention concerns apparatus for coating or etching by means of a plasma. Herein a first electrode (5) is connected to a high frequency voltage which produces plasma from a gas. A second electrode (6), on which the substrate (7) to be coated or etched is disposed, is connected to a medium frequency voltage which accelerates the ions of the plasma to the substrate (7). According to the invention, this medium frequency voltage consists of unipolar pulses that have the same amplitude for a predeterminable time interval. The number of ions impinging on the substrate (7) is thereby decoupled from the amplitude of the applied medium frequency voltage. It is determined solely by the frequency or width of these pulses.

摘要翻译： 本发明涉及通过等离子体进行涂覆或蚀刻的设备。 这里，第一电极（5）连接到从气体产生等离子体的高频电压。 在其上设置待涂覆或蚀刻的衬底（7）的第二电极（6）连接到将等离子体的离子加速到衬底（7）的中频电压。 根据本发明，该中频电压由对预定时间间隔具有相同幅度的单极性脉冲组成。 因此，撞击在衬底（7）上的离子的数量与所施加的中频电压的幅度分离。 它仅由这些脉冲的频率或宽度决定。