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1.发明授权Method for electronic memory management during estimation of average power consumption of an electronic circuit 失效在估计电子电路的平均功耗期间的电子存储器管理方法
公开(公告)号：US5682320A
公开(公告)日：1997-10-28
申请号：US458531
申请日：1995-06-02
IPC分类号： G06F17/50
CPC分类号： G06F17/5022 , G06F2217/78
摘要： This is a method of quickly computing the power dissipated by a digital circuit using information available at the gate library level. It estimates the short-circuit power by modeling the energy dissipated by the cell per input transition as a function of the transition time or edge rate, and multiplying that value by the number of transitions per second for that input.
摘要翻译： 这是一种使用门库级别可用的信息快速计算由数字电路消耗的功率的方法。 它通过对每个输入转换单元消耗的能量进行建模来估计短路功率，作为转换时间或边沿速率的函数，并将该值乘以该输入的每秒转换次数。
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2.发明授权Method and system for forming high accuracy patterns using charged particle beam lithography 有权使用带电粒子束光刻法形成高精度图案的方法和系统公开(公告)号：US08473875B2
公开(公告)日：2013-06-25
申请号：US13168954
申请日：2011-06-25
申请人： Akira Fujimura , Kazuyuki Hagiwara , Stephen F. Meier , Ingo Bork
发明人： Akira Fujimura , Kazuyuki Hagiwara , Stephen F. Meier , Ingo Bork
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F7/70441 , G06F17/5077 , G06F2217/12
摘要： A method and system for fracturing or mask data preparation for charged particle beam lithography are disclosed in which accuracy and/or edge slope of a pattern formed on a surface by a set of charged particle beam shots is enhanced by use of partially-overlapping shots. In some embodiments, dosages of the shots may vary with respect to each other before proximity effect correction. Particle beam simulation may be used to calculate the pattern and the edge slope. Enhanced edge slope can improve critical dimension (CD) variation and line-edge roughness (LER) of the pattern produced on the surface.
摘要翻译： 公开了一种用于压电或掩模用于带电粒子束光刻的数据准备的方法和系统，其中通过使用部分重叠的镜头来增强由一组带电粒子束照射在表面上形成的图案的精度和/或边缘斜率。 在一些实施例中，射击的剂量可以在邻近效应校正之前相对于彼此而变化。 可以使用粒子束模拟来计算图案和边缘坡度。 增强的边缘斜率可以改善表面上产生的图案的临界尺寸（CD）变化和线边缘粗糙度（LER）。
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3.发明申请METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY 审中-公开用于充电粒子束光刻的增强精度图案的设计方法和系统公开(公告)号：US20120221980A1
公开(公告)日：2012-08-30
申请号：US13037268
申请日：2011-02-28
申请人： Akira Fujimura , Kazuyuki Hagiwara , Stephen F. Meier , Ingo Bork
发明人： Akira Fujimura , Kazuyuki Hagiwara , Stephen F. Meier , Ingo Bork
IPC分类号： G06F17/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/68 , H01J37/3026 , H01J2237/31769 , H01J2237/31771 , H01J2237/31776
摘要： A method and system for fracturing or mask data preparation are presented in which overlapping shots are generated to increase dosage in selected portions of a pattern, thus improving the fidelity and/or the critical dimension variation of the transferred pattern. In various embodiments, the improvements may affect the ends of paths or lines, or square or nearly-square patterns. Simulation is used to determine the pattern that will be produced on the surface.
摘要翻译： 提出了一种用于压裂或掩模数据准备的方法和系统，其中产生重叠射击以增加图案的选定部分中的剂量，从而改善转印图案的保真度和/或临界尺寸变化。 在各种实施例中，改进可能影响路径或线的端部，或方形或近似正方形的图案。 模拟用于确定将在表面上产生的图案。
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4.发明授权Method and system for design of enhanced edge slope patterns for charged particle beam lithography 有权用于带电粒子束光刻的增强边缘坡度图案的设计方法和系统公开(公告)号：US09057956B2
公开(公告)日：2015-06-16
申请号：US13037270
申请日：2011-02-28
申请人： Akira Fujimura , Kazuyuki Hagiwara , Stephen F. Meier , Ingo Bork
发明人： Akira Fujimura , Kazuyuki Hagiwara , Stephen F. Meier , Ingo Bork
CPC分类号： G03F7/2061 , G03F1/36 , G03F1/68 , G03F1/70 , G03F7/2063 , H01J37/3026 , H01J37/3177 , H01J2237/31771
摘要： A method and system for fracturing or mask data preparation are presented in which overlapping shots are generated to increase dosage in selected portions of a pattern, thus improving the fidelity and/or the critical dimension variation of the transferred pattern. In various embodiments, the improvements may affect the ends of paths or lines, or square or nearly-square patterns. Simulation is used to determine the pattern that will be produced on the surface.
摘要翻译： 提出了一种用于压裂或掩模数据准备的方法和系统，其中产生重叠射击以增加图案的选定部分中的剂量，从而改善转印图案的保真度和/或临界尺寸变化。 在各种实施例中，改进可能影响路径或线的端部，或方形或近似正方形的图案。 模拟用于确定将在表面上产生的图案。
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公开(公告)号：US06714017B2
公开(公告)日：2004-03-30
申请号：US09727952
申请日：2000-11-30
IPC分类号： G01R3100
CPC分类号： G09G3/006 , G01R31/308
摘要： A method and system for detecting electrical short circuit defects in a plate structure of a flat panel display, for example, a field emission display (FED) is disclosed. In one embodiment, the process first applies a stimulation to the electrical conductors of the plate structure. Next, the process creates an infra-red thermal mapping of a cathode region of the FED. For example, an infra-red array may be used to snap a picture of the cathode of the FED. Then, the process analyzes the infra-red thermal mapping to determine a region of the FED which contains the electrical short circuit defect. Another embodiment localizes the defect to one sub-pixel by performing an infra-red mapping of the region which the previous IR mapping process determined to contain the electrical short circuit defect. Then, the process analyzes this infra-red mapping to determine a sub-pixel of the FED which contains the electrical short circuit defect.
摘要翻译： 公开了一种用于检测平板显示器的板结构中的电短路缺陷的方法和系统，例如场致发射显示器（FED）。 在一个实施例中，该过程首先对板结构的电导体施加刺激。 接下来，该过程创建FED的阴极区域的红外热映射。 例如，可以使用红外阵列来捕捉FED的阴极的图像。 然后，该过程分析红外热映射以确定包含电短路缺陷的FED的区域。 另一个实施例通过执行确定为包含电短路缺陷的先前IR映射处理的区域的红外映射来将缺陷定位到一个子像素。 然后，该过程分析该红外映射以确定包含电短路缺陷的FED的子像素。
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6.发明授权Method and apparatus for estimating internal power consumption of an electronic circuit represented as netlist 失效用于估计表示为网表的电子电路的内部功耗的方法和装置
公开(公告)号：US5696694A
公开(公告)日：1997-12-09
申请号：US461580
申请日：1995-06-02
CPC分类号： G06F17/5022 , G06F2217/78
摘要： This is a method of quickly computing the power dissipated by a digital circuit using information available at the gate library level. It estimates the short-circuit power by modeling the energy dissipated by the cell per input transition as a function of the transition time or edge rate, and multiplying that value by the number of transitions per second for that input.
摘要翻译： 这是一种使用门库级别可用的信息快速计算由数字电路消耗的功率的方法。 它通过对每个输入转换单元消耗的能量进行建模来估计短路功率，作为转换时间或边沿速率的函数，并将该值乘以该输入的每秒转换次数。
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7.发明申请METHOD AND SYSTEM FOR DESIGN OF ENHANCED EDGE SLOPE PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY 有权用于加载粒子束光刻的增强边坡图案的设计方法和系统公开(公告)号：US20120221981A1
公开(公告)日：2012-08-30
申请号：US13037270
申请日：2011-02-28
申请人： Akira Fujimura , Kazuyuki Hagiwara , Stephen F. Meier , Ingo Bork
发明人： Akira Fujimura , Kazuyuki Hagiwara , Stephen F. Meier , Ingo Bork
IPC分类号： G06F17/50
CPC分类号： G03F7/2061 , G03F1/36 , G03F1/68 , G03F1/70 , G03F7/2063 , H01J37/3026 , H01J37/3177 , H01J2237/31771
摘要： A method and system for fracturing or mask data preparation are presented in which overlapping shots are generated to increase dosage in selected portions of a pattern, thus improving the fidelity and/or the critical dimension variation of the transferred pattern. In various embodiments, the improvements may affect the ends of paths or lines, or square or nearly-square patterns. Simulation is used to determine the pattern that will be produced on the surface.
摘要翻译： 提出了一种用于压裂或掩模数据准备的方法和系统，其中产生重叠射击以增加图案的选定部分中的剂量，从而改善转印图案的保真度和/或临界尺寸变化。 在各种实施例中，改进可能影响路径或线的端部，或方形或近似正方形的图案。 模拟用于确定将在表面上产生的图案。
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8.发明申请Method and System for Forming High Accuracy Patterns Using Charged Particle Beam Lithography 有权使用带电粒子光刻法形成高精度图案的方法和系统公开(公告)号：US20120096412A1
公开(公告)日：2012-04-19
申请号：US13168954
申请日：2011-06-25
申请人： Akira Fujimura , Kazuyuki Hagiwara , Stephen F. Meier , Ingo Bork
发明人： Akira Fujimura , Kazuyuki Hagiwara , Stephen F. Meier , Ingo Bork
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F7/70441 , G06F17/5077 , G06F2217/12
摘要： A method and system for fracturing or mask data preparation for charged particle beam lithography are disclosed in which accuracy and/or edge slope of a pattern formed on a surface by a set of charged particle beam shots is enhanced by use of partially-overlapping shots. In some embodiments, dosages of the shots may vary with respect to each other before proximity effect correction. Particle beam simulation may be used to calculate the pattern and the edge slope. Enhanced edge slope can improve critical dimension (CD) variation and line-edge roughness (LER) of the pattern produced on the surface.
摘要翻译： 公开了一种用于压电或掩模用于带电粒子束光刻的数据准备的方法和系统，其中通过使用部分重叠的镜头来增强由一组带电粒子束照射在表面上形成的图案的精度和/或边缘斜率。 在一些实施例中，射击的剂量可以在邻近效应校正之前相对于彼此而变化。 可以使用粒子束模拟来计算图案和边缘坡度。 增强的边缘斜率可以改善表面上产生的图案的临界尺寸（CD）变化和线边缘粗糙度（LER）。
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9.发明授权Method and apparatus for estimating internal power consumption of an electronic circuit represented as netlist 有权用于估计表示为网表的电子电路的内部功耗的方法和装置公开(公告)号：US06345379B1
公开(公告)日：2002-02-05
申请号：US09369657
申请日：1999-08-05
IPC分类号： G06F1750
CPC分类号： G06F17/5022 , G06F2217/78
摘要： This is a method of quickly computing the power dissipated by a digital circuit using information available at the gate library level. It estimates the short-circuit power by modeling the energy dissipated by the cell per input transition as a function of the transition time or edge rate, and multiplying that value by the number of transitions per second for that input.
摘要翻译： 这是一种使用门库级别可用的信息快速计算由数字电路消耗的功率的方法。 它通过对每个输入转换单元消耗的能量进行建模来估计短路功率，作为转换时间或边沿速率的函数，并将该值乘以该输入的每秒转换次数。
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公开(公告)号：US6075932A
公开(公告)日：2000-06-13
申请号：US949676
申请日：1997-10-14
IPC分类号： G06F17/50
CPC分类号： G06F17/5022 , G06F2217/78
摘要： This is a method of quickly computing the power dissipated by a digital circuit using information available at the gate library level. It estimates the short-circuit power by modeling the energy dissipated by the cell per input transition as a function of the transition time or edge rate, and multiplying that value by the number of transitions per second for that input.
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