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1.
公开(公告)号:US20240314177A1
公开(公告)日:2024-09-19
申请号:US18636107
申请日:2024-04-15
申请人: Steve Hummel
发明人: Steve Hummel
IPC分类号: H04L9/40 , G06F16/953
CPC分类号: H04L63/30 , G06F16/953
摘要: Embodiments of the present invention provide a method and apparatus for remotely accessing a computer system or network to identify storage devices and to retrieve metadata from the storage devices that are respectively unique to files stored in the storage devices. The metadata provides information regarding each file stored on the storage devices and each metadata is associated with a respective file. A scanning tool compares the metadata retrieved from the computer system or network to a database or list of known metadata of known restricted content. Metadata retrieved from the computer system or network that matches metadata from the database or list of known restricted content is flagged and the file associated with the matching metadata is flagged and reported as potentially storing restricted content. During the scanning, restricted content itself is not scanned, not copied, not transferred and not stored.
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公开(公告)号:US07615752B2
公开(公告)日:2009-11-10
申请号:US11361710
申请日:2006-02-24
申请人: Chris Raymond , Steve Hummel
发明人: Chris Raymond , Steve Hummel
IPC分类号: G01F23/00
CPC分类号: G01B11/0616 , G01B11/24 , G01B11/30 , G01N21/21 , G01N21/274 , G01N21/47 , G01N21/9501 , G01N21/956 , G01N23/2251 , G01N2021/4792 , G03F7/70625
摘要: Scatterometers and methods of using scatterometry to determine several parameters of periodic microstructures, pseudo-periodic structures, and other very small structures having features sizes as small as 100 nm or less. Several specific embodiments of the present invention are particularly useful in the semiconductor industry to determine the width, depth, line edge roughness, wall angle, film thickness, and many other parameters of the features formed in microprocessors, memory devices, and other semiconductor devices. The scatterometers and methods of the invention, however, are not limited to semiconductor applications and can be applied equally well in other applications.
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3.
公开(公告)号:US07502101B2
公开(公告)日:2009-03-10
申请号:US11361673
申请日:2006-02-24
申请人: Chris Raymond , Steve Hummel , Sean Liu
发明人: Chris Raymond , Steve Hummel , Sean Liu
IPC分类号: G01N21/00
CPC分类号: G01B11/0616 , G01B11/24 , G01B11/30 , G01N21/21 , G01N21/274 , G01N21/47 , G01N21/9501 , G01N21/956 , G01N23/2251 , G01N2021/4792 , G03F7/70625
摘要: Scatterometers and methods of using scatterometry to determine several parameters of periodic microstructures, pseudo-periodic structures, and other very small structures having features sizes as small as 100 nm or less. Several specific embodiments of the present invention are particularly useful in the semiconductor industry to determine the width, depth, line edge roughness, wall angle, film thickness, and many other parameters of the features formed in microprocessors, memory devices, and other semiconductor devices. The scatterometers and methods of the invention, however, are not limited to semiconductor applications and can be applied equally well in other applications.
摘要翻译: 散射计和使用散射测定法确定周期性微结构,伪周期结构以及特征尺寸小至100nm或更小的其它非常小的结构的几个参数的方法。 本发明的几个特定实施例在半导体工业中特别有用,以确定在微处理器,存储器件和其它半导体器件中形成的特征的宽度,深度,线边缘粗糙度,壁角度,膜厚度以及许多其它参数。 然而,本发明的散射仪和方法不限于半导体应用,并且可以在其它应用中同样适用。
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公开(公告)号:US20070176119A1
公开(公告)日:2007-08-02
申请号:US11343500
申请日:2006-01-30
申请人: Steve Hummel
发明人: Steve Hummel
IPC分类号: G01J1/58
CPC分类号: G01N21/6489 , G01B11/24 , G01N21/9501 , G01N21/9505
摘要: Apparatuses and methods for analyzing semiconductor workpieces are disclosed herein. In one embodiment, for example, an apparatus for analyzing a semiconductor workpiece includes a first metrology unit configured to measure photoluminescence from the workpiece and a second metrology unit configured to determine a topographical profile of the workpiece. The apparatus can further include a control unit operatively coupled to the first metrology unit and the second metrology unit to receive and associate data regarding the photoluminescence and the topographical profile to produce an integrated map of the workpiece. The apparatus may have several different configurations. In one embodiment, for example, the first metrology unit and the second metrology unit can be housed in a single tool. In other embodiments, the first metrology unit and the second metrology unit may be in separate tools.
摘要翻译: 本文公开了用于分析半导体工件的装置和方法。 在一个实施例中,例如,用于分析半导体工件的装置包括被配置为测量来自工件的光致发光的第一测量单元和被配置为确定工件的形貌轮廓的第二测量单元。 该装置还可以包括可操作地耦合到第一测量单元和第二计量单元的控制单元,以接收和关联关于光致发光和形貌轮廓的数据,以产生工件的积分图。 该装置可以具有几种不同的配置。 在一个实施例中,例如,第一计量单元和第二计量单元可以容纳在单个工具中。 在其他实施例中,第一计量单元和第二计量单元可以在单独的工具中。
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5.
公开(公告)号:US20060289790A1
公开(公告)日:2006-12-28
申请号:US11361677
申请日:2006-02-24
申请人: Chris Raymond , Steve Hummel
发明人: Chris Raymond , Steve Hummel
IPC分类号: G01T1/10
CPC分类号: G01B11/0616 , G01B11/24 , G01B11/30 , G01N21/21 , G01N21/274 , G01N21/47 , G01N21/9501 , G01N21/956 , G01N23/2251 , G01N2021/4792 , G03F7/70625
摘要: Scatterometers and methods of using scatterometry to determine several parameters of periodic microstructures, pseudo-periodic structures, and other very small structures having features sizes as small as 100 nm or less. Several specific embodiments of the present Invention are particularly useful in the semiconductor industry to determine the width, depth, line edge roughness, wall angle, film thickness, and many other parameters of the features formed in microprocessors, memory devices, and other semiconductor devices. The scatterometers and methods of the invention, however, are not limited to semiconductor applications and can be applied equally well in other applications.
摘要翻译: 散射计和使用散射测定法确定周期性微结构,伪周期结构以及特征尺寸小至100nm或更小的其它非常小的结构的几个参数的方法。 本发明的几个具体实施方案在半导体工业中特别有用,以确定在微处理器,存储器件和其它半导体器件中形成的特征的宽度,深度,线边缘粗糙度,壁角度,膜厚度和许多其它参数。 然而,本发明的散射仪和方法不限于半导体应用,并且可以在其它应用中同样适用。
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公开(公告)号:US20060289788A1
公开(公告)日:2006-12-28
申请号:US11361669
申请日:2006-02-24
申请人: Chris Raymond , Steve Hummel , Sean Liu
发明人: Chris Raymond , Steve Hummel , Sean Liu
IPC分类号: G01T1/10
CPC分类号: G01B11/0616 , G01B11/24 , G01B11/30 , G01N21/21 , G01N21/274 , G01N21/47 , G01N21/9501 , G01N21/956 , G01N23/2251 , G01N2021/4792 , G03F7/70625
摘要: Scatterometers and methods of using scatterometry to determine several parameters of periodic microstructures, pseudo-periodic structures, and other very small structures having features sizes as small as 100 nm or less. Several specific embodiments of the present invention are particularly useful in the semiconductor industry to determine the width, depth, line edge roughness, wall angle, film thickness, and many other parameters of the features formed in microprocessors, memory devices, and other semiconductor devices. The scatterometers and methods of the invention, however, are not limited to semiconductor applications and can be applied equally well in other applications.
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7.
公开(公告)号:US20240356988A1
公开(公告)日:2024-10-24
申请号:US18637245
申请日:2024-04-16
申请人: Steve Hummel
发明人: Steve Hummel
IPC分类号: H04L9/40
CPC分类号: H04L63/30
摘要: Embodiments of the present invention provide a method and apparatus for remotely accessing a computer system or network to identify storage devices and to retrieve metadata from the storage devices that are respectively unique to files stored in the storage devices. An agent is executed by the computer system and receives scanning instructions from a server. A scanning tool compares the metadata retrieved from the computer system or network to a database or list of known metadata of known restricted content. Metadata retrieved from the computer system or network that matches metadata from the database or list of known restricted content is flagged and the file associated with the matching metadata is flagged and reported as potentially storing restricted content. During the scanning, restricted content itself is not scanned, not copied, not transferred and not stored.
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8.
公开(公告)号:US20200177640A1
公开(公告)日:2020-06-04
申请号:US16700908
申请日:2019-12-02
申请人: Steve Hummel
发明人: Steve Hummel
IPC分类号: H04L29/06 , G06F16/953
摘要: Embodiments of the present invention provide a method and apparatus for remotely accessing a computer system or network to identify storage devices and to retrieve metadata from the storage devices that are respectively unique to files stored in the storage devices. The metadata provides information regarding each file stored on the storage devices and each metadata is associated with a respective file. A scanning tool compares the metadata retrieved from the computer system or network to a database or list of known metadata of known restricted content. Metadata retrieved from the computer system or network that matches metadata from the database or list of known restricted content is flagged and the file associated with the matching metadata is flagged and reported as potentially storing restricted content. During the scanning, restricted content itself is not scanned, not copied, not transferred and not stored.
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公开(公告)号:US20060243912A1
公开(公告)日:2006-11-02
申请号:US11361710
申请日:2006-02-24
申请人: Chris Raymond , Steve Hummel
发明人: Chris Raymond , Steve Hummel
IPC分类号: G01F23/00
CPC分类号: G01B11/0616 , G01B11/24 , G01B11/30 , G01N21/21 , G01N21/274 , G01N21/47 , G01N21/9501 , G01N21/956 , G01N23/2251 , G01N2021/4792 , G03F7/70625
摘要: Scatterometers and methods of using scatterometry to determine several parameters of periodic microstructures, pseudo-periodic structures, and other very small structures having features sizes as small as 100 nm or less. Several specific embodiments of the present invention are particularly useful in the semiconductor industry to determine the width, depth, line edge roughness, wall angle, film thickness, and many other parameters of the features formed in microprocessors, memory devices, and other semiconductor devices. The scatterometers and methods of the invention, however, are not limited to semiconductor applications and can be applied equally well in other applications.
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10.
公开(公告)号:US11962625B2
公开(公告)日:2024-04-16
申请号:US16700908
申请日:2019-12-02
申请人: Steve Hummel
发明人: Steve Hummel
IPC分类号: H04L9/40 , G06F16/953
CPC分类号: H04L63/30 , G06F16/953
摘要: Embodiments of the present invention provide a method and apparatus for remotely accessing a computer system or network to identify storage devices and to retrieve metadata from the storage devices that are respectively unique to files stored in the storage devices. The metadata provides information regarding each file stored on the storage devices and each metadata is associated with a respective file. A scanning tool compares the metadata retrieved from the computer system or network to a database or list of known metadata of known restricted content. Metadata retrieved from the computer system or network that matches metadata from the database or list of known restricted content is flagged and the file associated with the matching metadata is flagged and reported as potentially storing restricted content. During the scanning, restricted content itself is not scanned, not copied, not transferred and not stored.
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