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公开(公告)号:US20120111374A1
公开(公告)日:2012-05-10
申请号:US13291342
申请日:2011-11-08
申请人: Joseph R. Despres , James V. McManus , Richard D. Chism , Edward E. Jones , Joseph D. Sweeney , Steven G. Sergi , Ying Tang , Michael J. Wodjenski , Richard S. Ray , Barry Lewis Chambers
发明人: Joseph R. Despres , James V. McManus , Richard D. Chism , Edward E. Jones , Joseph D. Sweeney , Steven G. Sergi , Ying Tang , Michael J. Wodjenski , Richard S. Ray , Barry Lewis Chambers
CPC分类号: H01L21/67028 , H01J37/02 , H01J37/3171 , H01J2237/006 , H01J2237/022
摘要: Apparatus and methods for cleaning ion implanters and/or components thereof are described, utilizing cleaning agents reacted with residue deposits to effect removal thereof. An endpoint detection apparatus and method are also disclosed, which may be integrated in the cleaning apparatus and methods to provide highly efficient utilization of the cleaning agent and avoidance of deleterious effects that otherwise can occur when cleaning agents are continued to be exposed to an implanter or components thereof after cleaning has been completed.
摘要翻译: 描述了用于清洁离子注入机和/或其组分的装置和方法,利用与残余物沉积物反应以清除其的清洁剂。 还公开了端点检测装置和方法,其可以集成在清洁装置和方法中,以提供清洁剂的高效利用并避免当清洁剂继续暴露于注入机时可能发生的有害影响,或 清洁后的部件已经完成。