公开(公告)号：US20130040410A1

公开(公告)日：2013-02-14

申请号：US13565589

申请日：2012-08-02

Applicant: Cha-Dong KIM ,  Sang Hyun Yun ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee ,  Sang-Tae Kim ,  Yong-Il Kim ,  Shi-Jin Sung ,  Eun-Sang Lee ,  Sung-Yeol Jin

Inventor： Cha-Dong KIM ,  Sang Hyun Yun ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee ,  Sang-Tae Kim ,  Yong-Il Kim ,  Shi-Jin Sung ,  Eun-Sang Lee ,  Sung-Yeol Jin

IPC: G03F7/022 ,  H01L33/08 ,  B44C1/22

CPC classification number: G03F7/0226 ,  G03F7/023 ,  G03F7/40 ,  Y10T428/1005

Abstract: A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.

Abstract translation: 公开了一种光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图案的方法，以及制造显示基板的方法。 光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物，多价酚类化合物和溶剂。 因此，可以改善波长在约392nm至约417nm范围内的光的光敏性，并且可以提高使用光致抗蚀剂组合物形成光图案和薄膜图案的可靠性。

公开(公告)号：US08968983B2

公开(公告)日：2015-03-03

申请号：US13565589

申请日：2012-08-02

Applicant: Cha-Dong Kim ,  Sang Hyun Yun ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee ,  Sang-Tae Kim ,  Yong-Il Kim ,  Shi-Jin Sung ,  Eun-Sang Lee ,  Sung-Yeol Jin

Inventor： Cha-Dong Kim ,  Sang Hyun Yun ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee ,  Sang-Tae Kim ,  Yong-Il Kim ,  Shi-Jin Sung ,  Eun-Sang Lee ,  Sung-Yeol Jin

IPC: G03F7/022 ,  G03F7/023 ,  G03F7/40

CPC classification number: G03F7/0226 ,  G03F7/023 ,  G03F7/40 ,  Y10T428/1005

Abstract: A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.

Abstract translation: 公开了一种光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图案的方法，以及制造显示基板的方法。 光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物，多价酚类化合物和溶剂。 因此，可以改善波长在约392nm至约417nm范围内的光的光敏性，并且可以提高使用光致抗蚀剂组合物形成光图案和薄膜图案的可靠性。

公开(公告)号：US20070207735A1

公开(公告)日：2007-09-06

申请号：US11706131

申请日：2007-02-14

Applicant: Sung-Yeol Jin

Inventor： Sung-Yeol Jin

IPC: H04B7/00

CPC classification number: H04W88/02 ,  H04M1/6066 ,  H04M2250/74 ,  H04W84/18

Abstract: Provided are a mobile communication terminal and a sound output control method thereof. The mobile communication terminal includes a Bluetooth® module for receiving a command signal for requesting to output a sound stored in the mobile communication terminal from an external Bluetooth® device, and a sound output unit for outputting the sound, if the command signal for requesting to output the sound is received. Accordingly, since a mobile communication terminal can be controlled to ring using Bluetooth® communication, the user can conveniently find the lost mobile communication terminal.

Abstract translation: 提供了一种移动通信终端及其声音输出控制方法。 移动通信终端包括蓝牙模块，用于从外部蓝牙装置接收用于请求输出存储在移动通信终端中的声音的命令信号，以及用于输出声音的声音输出单元，如果命令 接收请求输出声音的信号。 因此，由于可以通过使用蓝牙通信来控制移动通信终端振铃，所以用户可以方便地找到丢失的移动通信终端。

公开(公告)号：US20110236825A1

公开(公告)日：2011-09-29

申请号：US13010688

申请日：2011-01-20

Applicant: Jung-In PARK ,  Hi-Kuk Lee ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Shi-Jin Sung ,  Sung-Yeol Jin ,  Sang-Tae Kim ,  Yong-Il Kim ,  Eun-Sang Lee

Inventor： Jung-In PARK ,  Hi-Kuk Lee ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Shi-Jin Sung ,  Sung-Yeol Jin ,  Sang-Tae Kim ,  Yong-Il Kim ,  Eun-Sang Lee

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0226

Abstract: In a photoresist composition suitable for forming a photoresist pattern having a high profile angle, and a method of forming a photoresist pattern using the same, the photoresist composition includes an alkali-soluble resin, a quinone diazide containing compound, a compound represented by Formula 1, and a solvent: wherein R1, R2 and R3 are independently H, C1-4 alkyl, C2-4 alkenyl, C3-8 cycloalkyl, or C6-12 aryl.

Abstract translation: 在适于形成具有高轮廓角的光致抗蚀剂图案的光致抗蚀剂组合物中，以及使用其形成光致抗蚀剂图案的方法，光致抗蚀剂组合物包括碱溶性树脂，含醌二化合物，由式1表示的化合物 和溶剂：其中R 1，R 2和R 3独立地为H，C 1-4烷基，C 2-4烯基，C 3-8环烷基或C 6-12芳基。