中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

25 records (took 0.016 seconds)

    Local bit select with suppression of fast read before write
    2.
    发明授权
    Local bit select with suppression of fast read before write 失效
    本地位选择与写入前禁止快速读取

    公开(公告)号：US07113433B2

    公开(公告)日：2006-09-26

    申请号：US11054402

    申请日：2005-02-09

    Applicant: Yuen H. Chan ,  Ryan T. Freese ,  Antonio R. Pelella ,  Arthur D. Tuminaro

    Inventor： Yuen H. Chan ,  Ryan T. Freese ,  Antonio R. Pelella ,  Arthur D. Tuminaro

    IPC: G11C7/00

    CPC classification number: G11C11/413 ,  G11C7/12 ,  G11C7/18 ,  G11C2207/002

    Abstract: A domino SRAM is provided with active pull-up PFET devices that overwhelm “slow to write but very fast to read” cells and allow the cells to recover from timing mismatch situations. This approach allows the traditional “bit select” clamp to actively control the “local select” through “wired-or” PFET pull-up transistors. Separate read and write global “bit line” pairs allow the read and write performance to be optimized independently.

    Abstract translation: 多米诺SRAM提供有有源上拉PFET器件，它们淹没“读写速度慢但读取速度非常快”，并允许单元从定时不匹配情况中恢复。 这种方法允许传统的“位选择”钳位通过“有线或”PFET上拉晶体管主动地控制“局部选择”。 单独的读写全局“位线”对可以独立优化读写性能。

    Method for inhibiting scale and controlling corrosion in cooling water systems
    3.
    发明授权
    Method for inhibiting scale and controlling corrosion in cooling water systems 失效
    在冷却水系统中抑制污垢和控制腐蚀的方法

    公开(公告)号：US5866013A

    公开(公告)日：1999-02-02

    申请号：US909802

    申请日：1997-08-12

    Applicant: Stephen M. Kessler ,  Donald T. Freese

    Inventor： Stephen M. Kessler ,  Donald T. Freese

    IPC: C02F5/12

    CPC classification number: C02F5/12 ,  C23F11/173 ,  C23F14/02

    Abstract: A method and composition for simultaneously controlling the deposition of scale and the formation of corrosion in a cooling water system comprising adding to the system a combination of (a) a water soluble copolymer having the structure: ##STR1## wherein R.sub.1 is H or lower (C.sub.1 -C.sub.4) alkyl, F is H.sub.2 or O, M is a water soluble cation, R.sub.2 is (CH.sub.2 --CH.sub.2 --O).sub.n, ##STR2## or mixture of both, n is an integer of from 1 to about 40, R.sub.3 is H, lower (C.sub.1 -C.sub.4) alkyl or an acetate, and (b) a water soluble polymer characterized by the structural formula: ##STR3## wherein R.sub.1 is H or lower alkyl (C.sub.1 -C.sub.3); R.sub.2 is OH, OM, or NH.sub.2 ; M is a water soluble cation; R.sub.3 is a hydroxy substituted alkyl or alkylene radical having from 1 to 6 carbon atoms or a non-substituted alkyl or alkylene radical having from 1 to about 6 carbon atoms; X is an anionic radical; Z is H or hydrogens or a water soluble cation or cations which together counterbalance the valence of X, and a is 0 or 1.

    Abstract translation: 一种用于同时控制水垢沉积和在冷却水体系中形成腐蚀的方法和组合物，包括向所述体系中加入（a）具有以下结构的水溶性共聚物的组合：其中R 1为H或更低（ C 1 -C 4烷基，F是H 2或O，M是水溶性阳离子，R 2是（CH 2 -CH 2 -O）n，两者的混合物，n是1至约40的整数，R 3 是H，低级（C 1 -C 4）烷基或乙酸酯，和（b）以结构式为特征的水溶性聚合物：H，OM或NH 2; M是水溶性阳离子; R3是具有1至6个碳原子的羟基取代的烷基或亚烷基或具有1至约6个碳原子的未取代的烷基或亚烷基; X是阴离子基团; Z是H或氢或水溶性阳离子或阳离子，它们一起平衡X的化合价，a为0或1。

    Inhibition of scale and corrosion in aqueous systems
    4.
    发明授权
    Inhibition of scale and corrosion in aqueous systems 失效
    在水系统中抑制垢和腐蚀

    公开(公告)号：US5616278A

    公开(公告)日：1997-04-01

    申请号：US635123

    申请日：1996-04-19

    Applicant: William S. Carey ,  Andrew Solov ,  Libardo A. Perez ,  Donald T. Freese

    Inventor： William S. Carey ,  Andrew Solov ,  Libardo A. Perez ,  Donald T. Freese

    IPC: C02F5/10 ,  C02F5/12 ,  C07C59/305 ,  C08G65/22 ,  C23F11/173 ,  C02F5/14

    CPC classification number: C23F11/173 ,  C02F5/10 ,  C02F5/12 ,  C07C59/305 ,  C08G65/22

    Abstract: A method and compounds for inhibiting the formation of scale, e.g., barium scale, and controlling corrosion is disclosed. The method is particularly effective at inhibiting or preventing corrosion of ferrous-based metals in contact with the aqueous systems such as cooling water systems. The method comprises introducing into the aqueous system a compound of the general formula: ##STR1## wherein R is hydrogen, alkyl, aryl, substituted alkyl or substituted aryl; R' and R" are each independently hydrogen, C.sub.1-4 alkyl or C.sub.1-4 substituted alkyl; Z is O, S, NH or NR, where R is as described above; n is a positive integer greater than 1; f is a positive integer; and M is hydrogen, a water soluble cation (e.g., NH.sub.4.sup.+, alkali metal), or a C.sub.1-3 alkyl group.

    Abstract translation: 公开了一种用于抑制鳞屑形成的方法和化合物，例如钡垢，并控制腐蚀。 该方法特别有效地抑制或防止与诸如冷却水系统的水性体系接触的铁基金属的腐蚀。 该方法包括向水性体系中引入以下通式的化合物：其中R是氢，烷基，芳基，取代的烷基或取代的芳基; R'和R“各自独立地为氢，C 1-4烷基或C 1-4取代的烷基; Z是O，S，NH或NR，其中R如上所述; n是大于1的正整数; f是正整数; 和M是氢，水溶性阳离子（例如NH 4 +，碱金属）或C 1-3烷基。

    Method for controlling scale formation and deposition
    5.
    发明授权
    Method for controlling scale formation and deposition 失效
    控制结垢和沉积的方法

    公开(公告)号：US5518630A

    公开(公告)日：1996-05-21

    申请号：US384990

    申请日：1995-02-07

    Applicant: Donald T. Freese ,  Libardo A. Perez

    Inventor： Donald T. Freese ,  Libardo A. Perez

    IPC: C02F5/10

    CPC classification number: C02F5/10

    Abstract: A method and composition for controlling the formation and deposition of scale imparting compounds in an aqueous system is disclosed. A treatment comprising a sulfonated polymer and a polymaleic acid is effective in controlling the formation and deposition of such compounds.

    Abstract translation: 公开了一种用于控制水性体系中水垢赋予化合物的形成和沉积的方法和组合物。 包含磺化聚合物和聚马来酸的处理在控制这些化合物的形成和沉积方面是有效的。

    Method and composition for inhibiting scale and controlling corrosion in cooling water systems
    8.
    发明授权
    Method and composition for inhibiting scale and controlling corrosion in cooling water systems 失效
    用于抑制水垢和控制冷却水系统腐蚀的方法和组成

    公开(公告)号：US6099755A

    公开(公告)日：2000-08-08

    申请号：US237729

    申请日：1999-01-26

    Applicant: Stephen M. Kessler ,  Donald T. Freese

    Inventor： Stephen M. Kessler ,  Donald T. Freese

    IPC: C02F5/12 ,  C09K3/32 ,  B01D33/00 ,  B01D35/18 ,  C02F1/68

    CPC classification number: C02F5/12 ,  C23F11/173 ,  C23F14/02

    Abstract: A method and composition for simultaneously controlling the deposition of scale and the formation of corrosion in a cooling water system comprising adding to the system a combination of (a) a water soluble copolymer having the structure: ##STR1## wherein R.sub.1 is H or lower (C.sub.1 -C.sub.4) alkyl, F is H.sub.2 or O, M is a water soluble cation, R.sub.2 is (CH.sub.2 --CH.sub.2 --O).sub.n, ##STR2## or mixture of both, n is an integer of from 1 to about 40, R.sub.3 is H, lower (C.sub.1 -C.sub.4) alkyl or an acetate, and (b) a water soluble polymer characterized by the structural formula: ##STR3## wherein R.sub.1 is H or lower alkyl (C.sub.1 -C.sub.3); R.sub.2 is OH, OM, or NH.sub.2 ; M is a water soluble cation; R.sub.3 is a hydroxy substituted alkyl or alkylene radical having from 1 to 6 carbon atoms or a non-substituted alkyl or alkylene radical having from 1 to about 6 carbon atoms; X is an anionic radical; Z is H or hydrogens or a water soluble cation or cations which together counterbalance the valence of X, and a is 0 or 1.

    Abstract translation: 一种用于同时控制水垢沉积和在冷却水体系中形成腐蚀的方法和组合物，包括向所述体系中加入（a）具有以下结构的水溶性共聚物的组合：其中R 1为H或更低（C 1 -C 4 ）烷基，F是H 2或O，M是水溶性阳离子，R 2是（CH 2 -CH 2 -O）n或两者的混合物，n是1至约40的整数，R3是H，低级（C1 -C4）烷基或乙酸酯，和（b）以下述结构式表征的水溶性聚合物：其中R1是H或低级烷基（C1-C3）; R2是OH，OM或NH2; M是水溶性阳离子; R3是具有1至6个碳原子的羟基取代的烷基或亚烷基或具有1至约6个碳原子的未取代的烷基或亚烷基; X是阴离子基团; Z是H或氢或水溶性阳离子或阳离子，它们一起平衡X的化合价，a为0或1。

    Composition for controlling scale formation in aqueous systems
    9.
    发明授权
    Composition for controlling scale formation in aqueous systems 失效
    用于控制含水体系中水垢形成的组合物

    公开(公告)号：US5866032A

    公开(公告)日：1999-02-02

    申请号：US972530

    申请日：1997-11-18

    Applicant: William S. Carey ,  Libardo A. Perez ,  Donald T. Freese ,  Judith L. Barron

    Inventor： William S. Carey ,  Libardo A. Perez ,  Donald T. Freese ,  Judith L. Barron

    IPC: C02F5/14

    CPC classification number: C02F5/14 ,  C02F2303/08

    Abstract: A composition for of controlling scale formation and deposition and corrosion in aqueous systems is described wherein a treatment solution of a substoichiometric amount of a composition comprising a scale/corrosion inhibitor in combination with a substituted alkylpolycarboxylate is employed. The scale/corrosion inhibitor can be a phosphonate such as hydroxyethylidene diphosphonic acid, 2-phosphonobutane-1,2,4-tricarboxylic acid, hydroxyphosphonoacetic acids, amino phosphonates; terpolymers, copolymers and homopolymers of acrylic acid, maleic acid, epoxysuccinic acids such as polyepoxysuccinic acid or mixtures thereof. The substituted alkylpolycarboxylates are compounds of the general structure: R--X.sub.m --Y.sub.n wherein R is a hydrocarbon functionality having 4 to 18 carbons; X, when present, is --NH--, --NY.sup.1 --, --N-->O, --N--OC--Y.sup.1, --O-- or --S--; n is greater than or equal to 1; m=O or 1; and Y and Y.sup.1 each independently represent a substituted or nonsubstituted carboxylic acid functionality such that said alkylpolycarboxylate has at least 2 carboxylic acid functional groups.

    Abstract translation: 描述了一种用于控制水性体系中的结垢和沉积和腐蚀的组合物，其中使用亚化学计量量的组合物的处理溶液，该组合物包含鳞片/腐蚀抑制剂与取代的烷基多羧酸盐的组合。 鳞片/腐蚀抑制剂可以是膦酸酯如羟基亚乙基二膦酸，2-膦酰基丁烷-1,2,4-三羧酸，羟基膦酰基乙酸，氨基膦酸酯; 丙烯酸，马来酸，环氧琥珀酸如聚环氧琥珀酸的三元共聚物，共聚物和均聚物或其混合物。 取代的烷基多羧酸盐是通式结构的化合物：R-Xm-Yn其中R是具有4至18个碳的烃官能团; 当存在时，X是-NH-，-NY 1 - ， - N - ，O - ， - OC-Y 1，-O-或-S-; n大于或等于1; m = 0或1; 并且Y和Y 1各自独立地表示取代或未取代的羧酸官能团，使得所述烷基多羧酸酯具有至少2个羧酸官能团。

Patent Agency Ranking