摘要:
An insulated gate thyristor includes a first-conductivity-type base layer having a high resistivity, first and second second-conductivity-type base regions formed in a surface layer of the first-conductivity-type base layer, a first-conductivity-type source region formed in a surface layer of the first second-conductivity-type base region, and a first-conductivity-type emitter region formed in a surface layer of the second second-conductivity-type base region. The thyristor further includes a gate electrode layer formed on an insulating film over the first second-conductivity-type base region, an exposed portion of the first-conductivity-type base layer and the second second-conductivity-type base region, a first main electrode that contacts both the first second-conductivity-type base layer and first-conductivity-type source region, a second-conductivity-type emitter layer formed on the first-conductivity-type base layer, a second main electrode that contacts the second-conductivity-type emitter layer, a gate electrode that contacts the gate electrode layer, and an insulating film covering entire areas of surfaces of the second second-conductivity-type base region and first-conductivity-type emitter region. In this insulated gate thyristor, the first-conductivity-type base layer includes a locally narrowed portion which is interposed between the first and second second-conductivity-type base regions.
摘要:
An insulated gate thyristor is provided which includes: a first-conductivity-type base layer, first and second-conductivity-type base regions formed in the base layer, a first-conductivity-type source region formed in the first base region, a first-conductivity-type emitter region formed in the second base region, and a gate electrode layer formed on a gate insulating film over the first base region, first-conductivity-type base layer, and second base region, which are interposed between the first-conductivity-type source region and the first-conductivity-type emitter region. The thyristor further includes a first main electrode that contacts with both the first base region and the first-conductivity-type source region, a second-conductivity-type emitter layer formed on the other surface of the first-conductivity-type base layer, a second main electrode that contacts with the second-conductivity-type emitter layer, a gate electrode connected to the gate electrode layer; and an insulating film covering entire surface areas of the second second-conductivity-type base region and the first-conductivity-type emitter region. In this insulated gate thyristor, an exposed surface portion of the first second-conductivity-type base region that is interposed between the first-conductivity-type base layer and the first-conductivity-type source region has a smaller width than an exposed surface portion of the second second-conductivity-type base region interposed between the first-conductivity-type base layer and the first-conductivity-type emitter region.
摘要:
An insulated gate thyristor includes a first-conductivity-type base layer having a high resistivity, first and second second-conductivity-type base regions formed in a surface layer of the first-conductivity-type base layer, a first-conductivity-type source region formed in a surface layer of the first second-conductivity-type base region, and a first-conductivity-type emitter region formed in a surface layer of the second second-conductivity-type base region. The thyristor further includes a gate electrode formed through an insulating film on the first second-conductivity-type base region, an exposed portion of the first-conductivity-type base layer and the second second-conductivity-type base region, a first main electrode that contacts both the first second-conductivity-type base layer and first-conductivity-type source region, a second-conductivity-type emitter layer formed on the first-conductivity-type base layer, a second main electrode that contacts the second-conductivity-type emitter layer, and an insulating film covering entire areas of surfaces of the second second-conductivity-type base region and first-conductivity-type emitter region. The second second-conductivity-type base region has a diffusion depth that is greater than a larger one of diffusion depths of the first second-conductivity-type base region and a second-conductivity-type well region included in the first second-conductivity-type base region.
摘要:
An insulated gate thyristor is provided which includes: a first-conductivity-type base layer, first and second second-conductivity-type base regions formed in the base layer, a first-conductivity-type source region formed in the first base region, a first-conductivity-type emitter region formed in the second base region, and a gate electrode layer formed on a gate insulating film over the first base region, first-conductivity-type base layer, and second base region, which are interposed between the first-conductivity-type source region and the first-conductivity-type emitter region. The thyristor further includes a first main electrode that contacts with both the first base region and the first-conductivity-type source region, a second-conductivity-type emitter layer formed on the other surface of the first-conductivity-type base layer, a second main electrode that contacts with the second-conductivity-type emitter layer, a gate electrode connected to the gate electrode layer; and an insulating film covering entire surface areas of the second second-conductivity-type base region and the first-conductivity-type emitter region. In this insulated gate thyristor, an exposed surface portion of the first second-conductivity-type base region that is interposed between the first-conductivity-type base layer and the first-conductivity-type source region has a smaller width than an exposed surface portion of the second second-conductivity-type base region interposed between the first-conductivity-type base layer and the first-conductivity-type emitter region.
摘要:
A semiconductor device is provided which includes a first unipolar transistor provided in a front stage of the device, second unipolar transistor provided in the front stage, and a bipolar transistor provided in a rear stage of the device. In this semiconductor device, drain and the source of the first unipolar transistor are connected to collector and the base of the bipolar transistor, respectively, and drain and the source of the second unipolar transistor are connected to emitter and base of the bipolar transistor, respectively.
摘要:
An insulated gate thyristor is provided which includes a first-conductivity-type base layer of high resistivity, first and second second-conductivity-type base regions formed in a surface layer of a first major surface of the first-conductivity-type base layer, a first-conductivity-type source region formed in a surface layer of the first second-conductivity-type base region, a first-conductivity-type emitter region formed in a surface layer of the second second-conductivity-type base region, a gate electrode formed on surfaces of the first second-conductivity-type base region, the first-conductivity-type base layer, and the second second-conductivity-type base region, which surfaces are interposed between the first-conductivity-type source region and the first-conductivity-type emitter region, an insulating film interposed between the gate electrode and these surface of the base regions and layer, a first main electrode in contact with both the first second-conductivity-type base region and the first-conductivity-type source region, a second-conductivity-type emitter layer formed on a second major surface of the first-conductivity-type base layer, and a second main electrode in contact with the second-conductivity-type emitter layer. The entire surface areas of the second second-conductivity-type base region and the first-conductivity-type emitter region are covered with the insulating film.