公开(公告)号：US20070070325A1

公开(公告)日：2007-03-29

申请号：US11535284

申请日：2006-09-26

申请人： Toshiaki Suyama ,  Makoto Kawahara ,  Masaru Yamazaki ,  Takahiro Rokugawa

发明人： Toshiaki Suyama ,  Makoto Kawahara ,  Masaru Yamazaki ,  Takahiro Rokugawa

IPC分类号： G03B27/58

CPC分类号： H01L21/67051 ,  H01L21/6708 ,  H01L21/67706 ,  H01L21/6776

摘要： A substrate transfer apparatus has pluralities of pairs of substrate support mechanisms. The substrate support mechanism includes a first roller provided on a first rotary shaft and a second roller provided on a second rotary shaft, the substrate support mechanism transfers a substrate in a transfer direction while supporting the substrate between the first and second rollers in a thickness direction of the substrate. The pair of the substrate support mechanisms are disposed so as to oppose to each other in a width direction of the substrate and the pairs of the substrate support mechanisms are arranged along with the transfer direction. Further, a substrate position regulating member that regulates a position of the substrate by contacting with a side surface which is parallel to the transfer direction is provided on either of the first and second rotary shafts.

摘要翻译： 基板传送装置具有多对基板支撑机构。 衬底支撑机构包括设置在第一旋转轴上的第一辊和设置在第二旋转轴上的第二辊，衬底支撑机构沿着传送方向传送衬底，同时在第一和第二辊之间沿厚度方向支撑衬底 的基底。 一对基板支撑机构被布置成在基板的宽度方向上彼此相对，并且一对基板支撑机构与传送方向一起布置。 此外，通过与平行于传送方向的侧表面接触来调节基板的位置的基板位置调节构件设置在第一和第二旋转轴中的任一个上。

公开(公告)号：US07251021B2

公开(公告)日：2007-07-31

申请号：US11535284

申请日：2006-09-26

申请人： Toshiaki Suyama ,  Makoto Kawahara ,  Masaru Yamazaki ,  Takahiro Rokugawa

发明人： Toshiaki Suyama ,  Makoto Kawahara ,  Masaru Yamazaki ,  Takahiro Rokugawa

IPC分类号： G03B27/58 ,  G03B27/62 ,  B65G21/677

CPC分类号： H01L21/67051 ,  H01L21/6708 ,  H01L21/67706 ,  H01L21/6776

摘要： A substrate transfer apparatus has pluralities of pairs of substrate support mechanisms. The substrate support mechanism includes a first roller provided on a first rotary shaft and a second roller provided on a second rotary shaft, the substrate support mechanism transfers a substrate in a transfer direction while supporting the substrate between the first and second rollers in a thickness direction of the substrate. The pair of the substrate support mechanisms are disposed so as to oppose to each other in a width direction of the substrate and the pairs of the substrate support mechanisms are arranged along with the transfer direction. Further, a substrate position regulating member that regulates a position of the substrate by contacting with a side surface which is parallel to the transfer direction is provided on either of the first and second rotary shafts.

摘要翻译： 基板传送装置具有多对基板支撑机构。 衬底支撑机构包括设置在第一旋转轴上的第一辊和设置在第二旋转轴上的第二辊，衬底支撑机构沿着传送方向传送衬底，同时在第一和第二辊之间沿厚度方向支撑衬底 的基底。 一对基板支撑机构被布置成在基板的宽度方向上彼此相对，并且一对基板支撑机构与传送方向一起布置。 此外，通过与平行于传送方向的侧表面接触来调节基板的位置的基板位置调节构件设置在第一和第二旋转轴中的任一个上。