公开(公告)号：US08996390B2

公开(公告)日：2015-03-31

申请号：US12372253

申请日：2009-02-17

Applicant: Takashi Miyata

Inventor： Takashi Miyata

IPC: G06Q30/02 ,  G06Q10/10 ,  G06Q10/06 ,  G06Q30/06 ,  G06Q10/08

CPC classification number: G06Q10/06

Abstract: A computer readable medium storing a program causing a computer to execute a process for controlling a plurality of operations, the process including: accepting a change request to change an operation result of an operation executed prior to a current execution-permitted operation which an execution is permitted based on an operation procedure for the operations; assuming an operation for which the change request is accepted in the accepting step as a starting point; and identifying an operation permitted to be executed with reference to the starting point based on the operation procedure.

Abstract translation: 一种存储使计算机执行用于控制多个操作的处理的程序的计算机可读介质，所述处理包括：接受改变请求，以改变在当前执行允许操作之前执行的操作的操作结果，执行是 基于操作的操作程序允许; 假设在接受步骤中接受改变请求的操作作为起点; 并且基于操作过程来识别参考起始点允许执行的操作。

公开(公告)号：US08686613B2

公开(公告)日：2014-04-01

申请号：US13284167

申请日：2011-10-28

Applicant: Takashi Miyata

Inventor： Takashi Miyata

IPC: H02N1/00

CPC classification number: H02N1/08

Abstract: A power generating device includes a first substrate having a first electrode and a first positioning electrode being chargeable with a first polarity on a first surface, and a second substrate movable within a predetermined range from a static position in the planar direction of the first substrate and having a second electrode and a second positioning electrode being chargeable with a second polarity opposite to the first polarity on a second surface opposing the first surface. Overlapping the first positioning electrode and the second positioning electrode at least partially in plan view of the first substrate in the static position can cause the second substrate to return to the static position due to electrostatic attraction generated between the first positioning electrode and the second positioning electrode.

Abstract translation: 一种发电装置，包括具有第一电极和第一定位电极的第一基板，所述第一电极和第一定位电极可在第一表面上以第一极性充电;以及第二基板，其可在距所述第一基板的平面方向上的静态位置在预定范围内移动; 具有第二电极和第二定位电极，所述第二电极和第二定位电极在与所述第一表面相对的第二表面上具有与所述第一极性相反的第二极性。 至少部分地在静止位置的第一基板的平面图中重叠第一定位电极和第二定位电极可以由于在第一定位电极和第二定位电极之间产生的静电吸引而使第二基板返回静态位置 。

公开(公告)号：US07858272B2

公开(公告)日：2010-12-28

申请号：US12206592

申请日：2008-09-08

Applicant: Takashi Miyata

Inventor： Takashi Miyata

IPC: G03F1/00

CPC classification number: H01L29/78621 ,  G03F1/50 ,  H01L29/66757

Abstract: An exposure mask includes a transparent substrate; a first pattern portion formed on the transparent substrate using at least one light-shielding pattern having a predetermined shape; and a translucent layer which is formed at a section including a first pattern region having the first pattern portion, which allows exposure light to pass therethrough, and which has a transmittance greater than that of the light-shielding pattern.

Abstract translation: 曝光掩模包括透明基板; 使用至少一个具有预定形状的遮光图案形成在所述透明基板上的第一图案部分; 以及形成在包括具有第一图案部分的第一图案区域的部分的透光层，其允许曝光光通过，并且其透射率大于遮光图案的透射率。

公开(公告)号：US20100042819A1

公开(公告)日：2010-02-18

申请号：US12372253

申请日：2009-02-17

Applicant: Takashi MIYATA

Inventor： Takashi MIYATA

IPC: G06F9/30 ,  G06F9/38

CPC classification number: G06Q10/06

Abstract: A computer readable medium storing a program causing a computer to execute a process for controlling a plurality of operations, the process including: accepting a change request to change an operation result of an operation executed prior to a current execution-permitted operation which an execution is permitted based on an operation procedure for the operations; assuming an operation for which the change request is accepted in the accepting step as a starting point; and identifying an operation permitted to be executed with reference to the starting point based on the operation procedure.

Abstract translation: 一种存储使计算机执行用于控制多个操作的处理的程序的计算机可读介质，所述处理包括：接受改变请求，以改变在当前执行允许操作之前执行的操作的操作结果，执行是 基于操作的操作程序允许; 假设在接受步骤中接受改变请求的操作作为起点; 并且基于操作过程来识别参考起始点允许执行的操作。

公开(公告)号：US20090111251A1

公开(公告)日：2009-04-30

申请号：US12206592

申请日：2008-09-08

Applicant: Takashi MIYATA

Inventor： Takashi MIYATA

IPC: H01L21/265 ,  G03F1/14

CPC classification number: H01L29/78621 ,  G03F1/50 ,  H01L29/66757

Abstract: An exposure mask includes a transparent substrate; a first pattern portion formed on the transparent substrate using at least one light-shielding pattern having a predetermined shape; and a translucent layer which is formed at a section including a first pattern region having the first pattern portion, which allows exposure light to pass therethrough, and which has a transmittance greater than that of the light-shielding pattern.

Abstract translation: 曝光掩模包括透明基板; 使用至少一个具有预定形状的遮光图案形成在所述透明基板上的第一图案部分; 以及形成在包括具有第一图案部分的第一图案区域的部分的透光层，其允许曝光光通过，并且其透射率大于遮光图案的透射率。

公开(公告)号：US07456575B2

公开(公告)日：2008-11-25

申请号：US11384346

申请日：2006-03-21

Applicant: Takashi Miyata ,  Masaru Nishimura ,  Shunsuke Itakura

Inventor： Takashi Miyata ,  Masaru Nishimura ,  Shunsuke Itakura

IPC: H01J17/49

CPC classification number: H01J11/40 ,  H01J9/02 ,  H01J11/12

Abstract: The discharge space defined between the front glass substrate and the back glass substrate is filled with a discharge gas including 10 or more vol % of xenon. A MgO layer including MgO crystals causing a cathode-luminescence emission having a peak within a wavelength range of 200 nm to 300 nm upon excitation by an electron beam is provided in a position facing the discharge cell formed in the discharge space.

Abstract translation: 在前玻璃基板和后玻璃基板之间限定的放电空间填充有包含10个以上的氙的体积的放电气体。 在与放电空间形成的放电单元相对的位置上，设有包含MgO晶体的MgO层，该氧化物晶体在通过电子束激励时产生具有200nm〜300nm的波长范围内的峰值的阴极发光发光。

公开(公告)号：US20070228980A1

公开(公告)日：2007-10-04

申请号：US11727679

申请日：2007-03-28

Applicant: Takashi Miyata ,  Tetsuya Matsumoto ,  Yukihiko Sugio ,  Yoshihiko Kamo

Inventor： Takashi Miyata ,  Tetsuya Matsumoto ,  Yukihiko Sugio ,  Yoshihiko Kamo

IPC: H01J17/49

CPC classification number: H01J11/12 ,  H01J11/40 ,  H01J11/42

Abstract: In a gas discharge display apparatus, a dielectric layer overlies the row electrode pairs provided between the opposing front and back glass substrates placed across the discharge space. A protective layer for the dielectric layer includes a crystalline MgO layer that has a property causing a cathode-luminescence emission having a peak within a wavelength range of 200 nm to 300 nm upon excitation by electron beams. A red phosphor layer generating visible light by being excited by vacuum ultraviolet light includes a mixed phosphor of a first phosphor of (Y, Gd)BO3:Eu or the like which is a borate-system red phosphor and a second phosphor of Y(V, P)O4:Eu which is a phos-vana system red phosphor.

Abstract translation: 在气体放电显示装置中，电介质层位于设置在放电空间之间的相对的前后玻璃基板之间的行电极对。 用于电介质层的保护层包括结晶MgO层，其具有通过电子束激发时具有在200nm至300nm的波长范围内具有峰值的阴极发光发射的性质。 通过真空紫外线激发产生可见光的红色荧光体层包括（Y，Gd）BO 3：Eu等的第一荧光体的混合荧光体，其为硼酸盐系红色荧光体 以及作为磷光体系红色荧光体的Y（V，P）O 4：Eu的第二荧光体。

公开(公告)号：US20060004943A1

公开(公告)日：2006-01-05

申请号：US11167181

申请日：2005-06-28

Applicant: Takashi Miyata ,  Nobuo Yagi ,  Shisei Fujiwara

Inventor： Takashi Miyata ,  Nobuo Yagi ,  Shisei Fujiwara

IPC: G06F12/00

CPC classification number: G06F12/0607

Abstract: Destination registers are provided in a chipset and node information is set in the destination registers. The destination address is selected in accordance with a physical address to be accessed to thereby decided a node provided with a memory to be accessed. The magnitude of the load of the memory access to the node can be changed in accordance with setting of the node information in the destination registers. Optimum node information can be set in the destination registers in accordance with the number of nodes increased and the transfer speed and the capacity of the memory to thereby increase the flexibility and uniform the throughput of memory access to each node.

Abstract translation: 目标寄存器在芯片组中提供，节点信息设置在目标寄存器中。 根据要访问的物理地址选择目的地地址，从而确定设置有要访问的存储器的节点。 可以根据目的地寄存器中的节点信息的设置来改变对节点的存储器访问的负载的大小。 可以根据增加的节点数量和传输速度以及存储器的容量在目标寄存器中设置最优节点信息，从而增加对每个节点的存储器访问的灵活性和统一的吞吐量。

公开(公告)号：US6131432A

公开(公告)日：2000-10-17

申请号：US424301

申请日：1999-11-22

Applicant: Takashi Miyata ,  Tsutomu Matsubara ,  Yasuhiro Yamaguchi ,  Akinobu Kamimaru ,  Masaharu Saisu

Inventor： Takashi Miyata ,  Tsutomu Matsubara ,  Yasuhiro Yamaguchi ,  Akinobu Kamimaru ,  Masaharu Saisu

IPC: B21B1/28 ,  B21B1/40 ,  B21B27/00 ,  B21B39/20

CPC classification number: B21B1/40 ,  B21B1/28 ,  B21B27/00

Abstract: A process for manufacturing a metal foil by effecting rolling with a high efficiency without making any defectively shaped product. A metal foil having a thickness of 0.2 mm or less is manufactured after a plurality of passes of cold rolling by using soft work rolls from the first pass to the pass preceding the kissing pass during which the kissing of rolls is likely to occur, using hard work rolls for carrying out the kissing pass with a reduction in thickness of over 30%, and using soft work rolls for carrying out the last, or the last two passes with a reduction of 20% or less. Judgment is made again as to the likelihood of any roll kissing when hard rolls are used, and the pressure to be applied for the kissing pass is controlled in accordance with the result of such judgment.

Abstract translation: PCT No.PCT / JP99 / 01444 Sec。 一九九九年十一月二十二日 102（e）1999年11月22日PCT PCT 1999年3月23日PCT公布。 公开号WO99 /​​ 48627 日期1999年9月30日一种通过高效率地进行轧制而不产生任何形状不良的产品来制造金属箔的方法。 通过使用软工作辊从第一次通过到接吻前的通过期间在多次冷轧之后制造厚度为0.2mm以下的金属箔，在此期间可能发生辊的接吻，使用硬 用于进行厚度超过30％的接吻的工作辊，并且使用软工作辊进行最后的或最后的两次通过，减少20％或更少。 再次判断当使用硬卷时是否有任何滚动接吻的可能性，并且根据这种判断的结果来控制用于接吻的压力。

公开(公告)号：US07939229B2

公开(公告)日：2011-05-10

申请号：US12244284

申请日：2008-10-02

Applicant: Hiroshi Sera ,  Takashi Miyata

Inventor： Hiroshi Sera ,  Takashi Miyata

IPC: G03F1/00 ,  G03F7/00

CPC classification number: G03F1/50

Abstract: A photomask includes a light-blocking section that blocks light and also includes a light intensity difference section that controls the intensity of light. The light-blocking section is disposed between the light intensity difference section and a light-transmissive region transmitting light.

Abstract translation: 光掩模包括阻挡光的遮光部分，并且还包括控制光强度的光强差异部分。 遮光部分设置在光强差异部分和透光区域之间。