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1.发明申请RESIN PATTERN, METHOD FOR PRODUCING THE PATTERN, METHOD FOR PRODUCING MEMS STRUCTURE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING PLATED PATTERN 有权树脂图案，用于生产图案的方法，用于制造MEMS结构的方法，制造半导体器件的方法以及用于生产电镀图案的方法公开(公告)号：US20120231396A1
公开(公告)日：2012-09-13
申请号：US13416870
申请日：2012-03-09
IPC分类号： G03F7/20 , H01L21/312
CPC分类号： G03F7/40
摘要： There is provided that a method for producing a resin pattern, and the method includes at least the steps (1) to (7) in this order; (1) a coating step of coating a photosensitive resin composition on a substrate; (2) a solvent removal step of removing the solvent from the applied photosensitive resin composition; (3) an exposure step of patternwise exposing the photosensitive resin composition from which the solvent has been removed, to an active radiation; (4) a development step of developing the exposed photosensitive resin composition using an aqueous developer liquid; (5) an overcoating step of providing an overcoat layer on the developed photosensitive resin composition; (6) a heat-treating step of heat-treating the photosensitive resin composition on which the overcoat layer has been provided; and (7) a removal step of removing the overcoat layer.
摘要翻译： 提供树脂图案的制造方法，该方法至少包括步骤（1）至（7）; （1）将感光性树脂组合物涂布在基材上的涂布工序; （2）从涂布的感光性树脂组合物中除去溶剂的溶剂除去工序; （3）将从其中除去溶剂的感光性树脂组合物图案化地曝光到活性辐射的曝光步骤; （4）使用含水显影液显影曝光的感光性树脂组合物的显影步骤; （5）在显影的感光性树脂组合物上设置外涂层的外涂层工序; （6）对其上设置有外涂层的感光性树脂组合物进行热处理的热处理工序; 和（7）去除外涂层的去除步骤。
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2.发明授权Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated pattern 有权树脂图案，图案的制造方法，MEMS结构的制造方法，半导体装置的制造方法以及制造电镀图案的方法公开(公告)号：US08728716B2
公开(公告)日：2014-05-20
申请号：US13416870
申请日：2012-03-09
IPC分类号： G03F7/26
CPC分类号： G03F7/40
摘要： There is provided that a method for producing a resin pattern, and the method includes at least the steps (1) to (7) in this order; (1) a coating step of coating a photosensitive resin composition on a substrate; (2) a solvent removal step of removing the solvent from the applied photosensitive resin composition; (3) an exposure step of patternwise exposing the photosensitive resin composition from which the solvent has been removed, to an active radiation; (4) a development step of developing the exposed photosensitive resin composition using an aqueous developer liquid; (5) an overcoating step of providing an overcoat layer on the developed photosensitive resin composition; (6) a heat-treating step of heat-treating the photosensitive resin composition on which the overcoat layer has been provided; and (7) a removal step of removing the overcoat layer.
摘要翻译： 提供树脂图案的制造方法，该方法至少包括步骤（1）至（7）; （1）将感光性树脂组合物涂布在基材上的涂布工序; （2）从涂布的感光性树脂组合物中除去溶剂的溶剂除去工序; （3）将从其中除去溶剂的感光性树脂组合物图案化地曝光到活性辐射的曝光步骤; （4）使用含水显影液显影曝光的感光性树脂组合物的显影步骤; （5）在显影的感光性树脂组合物上设置外涂层的外涂层工序; （6）对其上设置有外涂层的感光性树脂组合物进行热处理的热处理工序; 和（7）去除外涂层的去除步骤。
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