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1.发明申请(METH)ACRYLATE COMPOUND, CURABLE COMPOSITION USING THE SAME, CURABLE COMPOSITION FOR PHOTO-NANOIMPRINTS, CURED PRODUCT OF CURABLE COMPOSITION AND METHOD FOR MANUFACTURING CURED PRODUCT 失效（METH）丙烯酸酯化合物，使用其的可固化组合物，光固化组合物的固化组合物，可固化组合物的固化产物和制备固化产品的方法公开(公告)号：US20110003909A1
公开(公告)日：2011-01-06
申请号：US12921081
申请日：2009-03-04
IPC分类号： C08F2/46 , C07C69/767 , B29C59/16
CPC分类号： C08F2/48 , B82Y10/00 , B82Y40/00 , C07C69/90 , C07C69/94 , C07C2601/16 , C08F222/1006 , G03F7/0002 , G03F7/027
摘要： It's object is to provide a (meth)acrylate compound excellent in photocurability, a curable composition comprising the compound and excellent in all of pattern accuracy, peelability, surface hardness, elasticity recovery and solvent resistance, an optical nanoimprint composition and a cured product of the curable composition and a method for producing it, especially to provide a composition favorable for a permanent film for flat panel displays, etc. A (meth)acrylate compound represented by the following formula (1): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a substituent having carbon atoms of 2 to 6 and having a carbon-carbon double bond, X represents an organic group having carbon atoms of 1 to 10, m and n each are an integer of 1 to 3.
摘要翻译： 本发明的目的是提供一种光固化性优异的（甲基）丙烯酸酯化合物，包含该化合物的固化性组合物，并且具有优异的图案精度，剥离性，表面硬度，弹性恢复和耐溶剂性，光学纳米压印组合物和固化产物 固化性组合物及其制造方法，特别是提供有利于平板显示器用永久膜的组合物等。下式（1）表示的（甲基）丙烯酸酯化合物：其中，R1表示氢原子或甲基 基团，R 2表示碳原子数为2〜6，具有碳 - 碳双键的取代基，X表示碳原子数为1〜10的有机基团，m和n分别为1〜3的整数。
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公开(公告)号：US08883065B2
公开(公告)日：2014-11-11
申请号：US13132717
申请日：2009-12-02
CPC分类号： C08F222/20 , B05D5/00 , B29C59/005 , B29K2033/04 , B29K2105/0085 , B82Y10/00 , B82Y40/00 , C08F2/48 , C08F220/18 , C08F222/14 , C08F222/24 , C09D4/00 , G03F7/0002 , G03F7/004
摘要： Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.
摘要翻译： 提供了具有良好的图案性和耐干蚀刻性的用于印痕的可固化组合物。 公开了一种用于印痕的可固化组合物，其包含具有芳基且具有100以上分子量的取代基的可聚合单体（Ax）和光聚合引发剂。
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3.发明授权(Meth)acrylate compound, curable composition using the same, curable composition for photo-nanoimprints, cured product of curable composition and method for manufacturing cured product 失效（甲基）丙烯酸酯化合物，使用其的固化性组合物，光敏纳米压印用固化性组合物，固化性组合物的固化物和固化物的制造方法公开(公告)号：US08282872B2
公开(公告)日：2012-10-09
申请号：US12921081
申请日：2009-03-04
CPC分类号： C08F2/48 , B82Y10/00 , B82Y40/00 , C07C69/90 , C07C69/94 , C07C2601/16 , C08F222/1006 , G03F7/0002 , G03F7/027
摘要： It's object is to provide a (meth)acrylate compound excellent in photocurability, a curable composition comprising the compound and excellent in all of pattern accuracy, peelability, surface hardness, elasticity recovery and solvent resistance, an optical nanoimprint composition and a cured product of the curable composition and a method for producing it, especially to provide a composition favorable for a permanent film for flat panel displays, etc. A (meth)acrylate compound represented by the following formula (1): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a substituent having carbon atoms of 2 to 6 and having a carbon-carbon double bond, X represents an organic group having carbon atoms of 1 to 10, m and n each are an integer of 1 to 3.
摘要翻译： 本发明的目的是提供一种光固化性优异的（甲基）丙烯酸酯化合物，包含该化合物的固化性组合物，并且具有优异的图案精度，剥离性，表面硬度，弹性恢复和耐溶剂性，光学纳米压印组合物和固化产物 固化性组合物及其制造方法，特别是提供有利于平板显示器用永久膜的组合物等。下式（1）表示的（甲基）丙烯酸酯化合物：其中，R1表示氢原子或甲基 基团，R 2表示碳原子数为2〜6，具有碳 - 碳双键的取代基，X表示碳原子数为1〜10的有机基团，m和n分别为1〜3的整数。
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4.发明授权Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated pattern 有权树脂图案，图案的制造方法，MEMS结构的制造方法，半导体装置的制造方法以及制造电镀图案的方法公开(公告)号：US08728716B2
公开(公告)日：2014-05-20
申请号：US13416870
申请日：2012-03-09
IPC分类号： G03F7/26
CPC分类号： G03F7/40
摘要： There is provided that a method for producing a resin pattern, and the method includes at least the steps (1) to (7) in this order; (1) a coating step of coating a photosensitive resin composition on a substrate; (2) a solvent removal step of removing the solvent from the applied photosensitive resin composition; (3) an exposure step of patternwise exposing the photosensitive resin composition from which the solvent has been removed, to an active radiation; (4) a development step of developing the exposed photosensitive resin composition using an aqueous developer liquid; (5) an overcoating step of providing an overcoat layer on the developed photosensitive resin composition; (6) a heat-treating step of heat-treating the photosensitive resin composition on which the overcoat layer has been provided; and (7) a removal step of removing the overcoat layer.
摘要翻译： 提供树脂图案的制造方法，该方法至少包括步骤（1）至（7）; （1）将感光性树脂组合物涂布在基材上的涂布工序; （2）从涂布的感光性树脂组合物中除去溶剂的溶剂除去工序; （3）将从其中除去溶剂的感光性树脂组合物图案化地曝光到活性辐射的曝光步骤; （4）使用含水显影液显影曝光的感光性树脂组合物的显影步骤; （5）在显影的感光性树脂组合物上设置外涂层的外涂层工序; （6）对其上设置有外涂层的感光性树脂组合物进行热处理的热处理工序; 和（7）去除外涂层的去除步骤。
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5.发明申请PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS 审中-公开光敏树脂组合物，用于生产图案的方法，MEMS结构，用于生产结构的方法，用于干蚀刻的方法，用于湿蚀刻的方法，MEMS快门装置和图像显示装置公开(公告)号：US20120107563A1
公开(公告)日：2012-05-03
申请号：US13286742
申请日：2011-11-01
CPC分类号： G03F7/0392 , G03F7/0397 , G03F7/40 , Y10T428/24479 , Y10T428/24802
摘要： There is provided a method for producing a pattern, and the method includes forming a film by removing the solvent from a photosensitive resin composition containing (Component A) a polymer including a monomer unit (a1) having a residue of a carboxyl group or a phenolic hydroxyl group protected with an acid-decomposable group, and a monomer unit (a2) having an epoxy group and/or an oxetanyl group; (Component B) a photo acid generator; and (Component C) a solvent; exposing the film patternwise to an active radiation; developing the exposed film with an aqueous developer liquid to form a pattern; and baking the pattern by heating.
摘要翻译： 提供了一种图案的制造方法，该方法包括通过从含有（组分A）的包含具有羧基残基的单体单元（a1）的聚合物或酚类的聚合物的感光性树脂组合物中除去溶剂来形成膜 用酸可分解基团保护的羟基和具有环氧基和/或氧杂环丁烷基的单体单元（a2）; （组分B）光酸产生剂; 和（组分C）溶剂; 将膜图案曝光到主动辐射; 用含水显影液显影曝光的薄膜以形成图案; 并通过加热烘烤图案。
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6.发明申请CURABLE COMPOSITION FOR PHOTOIMPRINT, AND METHOD FOR PRODUCING CURED PRODUCT USING SAME 审中-公开用于光印的可固化组合物，以及使用其制造固化的产品的方法公开(公告)号：US20100244328A1
公开(公告)日：2010-09-30
申请号：US12729870
申请日：2010-03-23
CPC分类号： C08J3/28 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/027 , G03F7/0751 , G03F7/0755
摘要： A curable composition for photoimprints comprising a photopolymerizable monomer, a polymerization initiator and a compound of the following formula (1), wherein the content of compounds having a molecular weight of at least 1000 is at most 10% by mass of all the solid content therein, and the content of the compound of the formula (1) is from 0.3 to 10.0% by mass of all the solid content therein: wherein Z represents an aliphatic hydrocarbon group; R1 and R2 represent a hydrogen atom or a substituent; R3 and R4 represent a methyl group, an ethyl group, a methoxy group or an ethoxy group; and R5 represents a methoxy group or an ethoxy group.
摘要翻译： 包含可光聚合单体，聚合引发剂和下式（1）的化合物的光密胶可固化组合物，其中分子量至少为1000的化合物的含量至多为其所有固体含量的10质量％ ，式（1）的化合物的含量为其固体成分全部为0.3〜10.0质量％：其中Z表示脂肪族烃基; R1和R2表示氢原子或取代基; R3和R4表示甲基，乙基，甲氧基或乙氧基; R5表示甲氧基或乙氧基。
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7.发明申请CURABLE COMPOSITION FOR PHOTOIMPRINT, AND METHOD FOR PRODUCING CURED PRODUCT USING SAME 审中-公开用于光印的可固化组合物，以及使用其制造固化的产品的方法公开(公告)号：US20100133728A1
公开(公告)日：2010-06-03
申请号：US12629625
申请日：2009-12-02
CPC分类号： G03F7/027 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A curable composition for photoimprints containing a photopolymerizable monomer and a photopolymerization initiator, wherein the proportion of the compound having a molecular weight of at most 190 in the composition is at most 20% by mass, and the viscosity of the composition is from 3 to 50 mPa·s at 25° C., is excellent in patterning accuracy.
摘要翻译： 一种含有光聚合性单体和光聚合引发剂的光敏印刷用固化性组合物，其中，组合物中分子量至多为190的化合物的比例为20质量％以下，组合物的粘度为3〜50 在25℃下的mPa·s，图案精度优异。
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公开(公告)号：US20110236595A1
公开(公告)日：2011-09-29
申请号：US13132717
申请日：2009-12-02
CPC分类号： C08F222/20 , B05D5/00 , B29C59/005 , B29K2033/04 , B29K2105/0085 , B82Y10/00 , B82Y40/00 , C08F2/48 , C08F220/18 , C08F222/14 , C08F222/24 , C09D4/00 , G03F7/0002 , G03F7/004
摘要： Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.
摘要翻译： 提供了具有良好的图案性和耐干蚀刻性的用于印痕的可固化组合物。 公开了一种用于印痕的可固化组合物，其包含具有芳基且具有100以上分子量的取代基的可聚合单体（Ax）和光聚合引发剂。
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公开(公告)号：US6060860A
公开(公告)日：2000-05-09
申请号：US271322
申请日：1999-03-18
申请人： Junichi Itoh , Hidetoshi Umida , Hiroyuki Yonezawa
发明人： Junichi Itoh , Hidetoshi Umida , Hiroyuki Yonezawa
摘要： A control apparatus for variably controlling a speed of an induction motor includes a voltage generator, adders, a rotating speed calculating device, a rotating direction detecting device, and a multiplier. The voltage generator is operated for a predetermined period of time at the start or restart of the induction motor to cause self-excited oscillation in a control system including the voltage generator, the induction motor and the PWM inverter. The rotating speed calculating device obtains the rotating speed data, and the rotating direction detecting device detects the rotating direction of the induction motor based on the .alpha.- and .beta.-axis components, on the stationary coordinate, of the primary current of the induction motor. And, the PWM inverter is started based on the obtained rotating speed data and rotating direction. The control apparatus facilitates starting the PWM inverter that supplies electric power to the induction motor or restarting the PWM inverter after the AC electric power supply to the PWM inverter has recovered from a momentary service interruption.
摘要翻译： 用于可变地控制感应电动机的速度的控制装置包括电压发生器，加法器，转速计算装置，旋转方向检测装置和乘法器。 在感应电动机的启动或重启时，电压发生器工作一段预定时间，在包括电压发生器，感应电动机和PWM逆变器的控制系统中引起自激振荡。 旋转速度计算装置获得旋转速度数据，并且旋转方向检测装置基于感应电动机的初级电流的固定坐标上的α和β轴分量来检测感应电动机的旋转方向。 并且，基于获得的转速数据和旋转方向启动PWM逆变器。 控制装置有助于启动向逆变器提供电力的PWM逆变器或在PWM逆变器的交流电源从瞬时服务中断恢复之后重新起动PWM逆变器。
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10.发明申请RESIN PATTERN, METHOD FOR PRODUCING THE PATTERN, METHOD FOR PRODUCING MEMS STRUCTURE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING PLATED PATTERN 有权树脂图案，用于生产图案的方法，用于制造MEMS结构的方法，制造半导体器件的方法以及用于生产电镀图案的方法公开(公告)号：US20120231396A1
公开(公告)日：2012-09-13
申请号：US13416870
申请日：2012-03-09
IPC分类号： G03F7/20 , H01L21/312
CPC分类号： G03F7/40
摘要： There is provided that a method for producing a resin pattern, and the method includes at least the steps (1) to (7) in this order; (1) a coating step of coating a photosensitive resin composition on a substrate; (2) a solvent removal step of removing the solvent from the applied photosensitive resin composition; (3) an exposure step of patternwise exposing the photosensitive resin composition from which the solvent has been removed, to an active radiation; (4) a development step of developing the exposed photosensitive resin composition using an aqueous developer liquid; (5) an overcoating step of providing an overcoat layer on the developed photosensitive resin composition; (6) a heat-treating step of heat-treating the photosensitive resin composition on which the overcoat layer has been provided; and (7) a removal step of removing the overcoat layer.
摘要翻译： 提供树脂图案的制造方法，该方法至少包括步骤（1）至（7）; （1）将感光性树脂组合物涂布在基材上的涂布工序; （2）从涂布的感光性树脂组合物中除去溶剂的溶剂除去工序; （3）将从其中除去溶剂的感光性树脂组合物图案化地曝光到活性辐射的曝光步骤; （4）使用含水显影液显影曝光的感光性树脂组合物的显影步骤; （5）在显影的感光性树脂组合物上设置外涂层的外涂层工序; （6）对其上设置有外涂层的感光性树脂组合物进行热处理的热处理工序; 和（7）去除外涂层的去除步骤。
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