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1.发明申请Forming method of pattern film with narrower width and thin-film magnetic head having magnetic pole layer with narrower width 有权具有较窄宽度的图案薄膜的形成方法和具有较窄宽度的磁极层的薄膜磁头公开(公告)号：US20070223141A1
公开(公告)日：2007-09-27
申请号：US11723946
申请日：2007-03-22
申请人： Hirotaka Gomi , Mitsuharu Isobe , Noriyuki Ito , Hiroaki Funada , Takeshi Yamana , Makoto Terasawa , Yasuhiro Hasegawa
发明人： Hirotaka Gomi , Mitsuharu Isobe , Noriyuki Ito , Hiroaki Funada , Takeshi Yamana , Makoto Terasawa , Yasuhiro Hasegawa
CPC分类号： G11B5/313 , G11B5/1278 , G11B5/315 , G11B5/3163 , Y10T29/49037 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching is provided. The method comprises the steps of: forming a first frame layer having end surfaces facing each other across a space having a width W1; forming a second frame layer having end surfaces facing each other across a space having a width W2 that is larger than the width W1, the space having the width W2 being located right above the space having the width W1; forming a trench-forming film provided with a trench having a minimum width W3 that is smaller than the width W1 so as to fill at least a part of the spaces having the width W1 and the width W2 respectively; and forming a pattern film so as to fill at least a part of the trench.
摘要翻译： 提供了形成具有比曝光机的分辨率窄的宽度的图案膜和独立于蚀刻使用的抗蚀剂的方法。 该方法包括以下步骤：形成第一框架层，其具有横跨具有宽度W 1的空间的彼此面对的端表面; 形成第二框架层，所述第二框架层具有横向宽度大于宽度W 1 1的宽度W 2 2的空间彼此相对的端面，所述空间具有宽度W 2 位于具有宽度W 1的空间的正上方; 形成具有沟槽的沟槽形成膜，所述槽具有小于宽度W 1 1 N的最小宽度W 3 N以便填充至少一部分具有 分别宽度W 1和宽度W 2 2; 以及形成图案膜以填充沟槽的至少一部分。
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公开(公告)号：US07866029B2
公开(公告)日：2011-01-11
申请号：US11723946
申请日：2007-03-22
申请人： Hirotaka Gomi , Mitsuharu Isobe , Noriyuki Ito , Hiroaki Funada , Takeshi Yamana , Makoto Terasawa , Yasuhiro Hasegawa
发明人： Hirotaka Gomi , Mitsuharu Isobe , Noriyuki Ito , Hiroaki Funada , Takeshi Yamana , Makoto Terasawa , Yasuhiro Hasegawa
CPC分类号： G11B5/313 , G11B5/1278 , G11B5/315 , G11B5/3163 , Y10T29/49037 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching is provided. The method comprises the steps of: forming a first frame layer having end surfaces facing each other across a space having a width W1; forming a second frame layer having end surfaces facing each other across a space having a width W2 that is larger than the width W1, the space having the width W2 being located right above the space having the width W1; forming a trench-forming film provided with a trench having a minimum width W3 that is smaller than the width W1 so as to fill at least a part of the spaces having the width W1 and the width W2 respectively; and forming a pattern film so as to fill at least a part of the trench.
摘要翻译： 提供了形成具有比曝光机的分辨率窄的宽度的图案膜和独立于蚀刻使用的抗蚀剂的方法。 该方法包括以下步骤：形成具有彼此面对的具有宽度W1的空间的端表面的第一框架层; 形成具有宽度W2大于宽度W1的空间的彼此面对的端面的第二框架层，宽度W2位于具有宽度W1的空间的正上方的空间; 形成沟槽形成膜，该沟槽形成膜设置有具有小于宽度W1的最小宽度W3的沟槽，以分别填充宽度W1和宽度W2的至少一部分空间; 以及形成图案膜以填充沟槽的至少一部分。
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公开(公告)号：US20050273607A1
公开(公告)日：2005-12-08
申请号：US11196816
申请日：2005-08-03
CPC分类号： H04L63/083 , G06F21/31 , G06F2221/2115 , G06F2221/2143 , H04W12/06 , H04W84/12
摘要： User information stored in a second server as a proxy authentification device is deleted from a first server performing authentification of the network connection. Accordingly, it is possible to easily and surely delete the user information stored in one of the plurality of second servers from the first server. That is, it is possible to delete user information stored in a server such as a proxy server acting for authentification in a short period of time.
摘要翻译： 存储在作为代理认证装置的第二服务器中的用户信息从执行网络连接认证的第一服务器中删除。 因此，可以从第一服务器容易且可靠地删除存储在多个第二服务器之一中的用户信息。 也就是说，可以在短时间内删除存储在诸如用于认证的代理服务器的服务器中的用户信息。
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