公开(公告)号：US08208123B2

公开(公告)日：2012-06-26

申请号：US10927531

申请日：2004-08-27

Applicant: Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

Inventor： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

IPC: G03B27/54

CPC classification number: G03F7/70966 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70983 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

公开(公告)号：US20050094119A1

公开(公告)日：2005-05-05

申请号：US10927531

申请日：2004-08-27

Applicant: Erik Loopstra ,  Johannes Baselmans ,  Marcel Mathijs Theodore Dierichs ,  Johannes Jasper ,  Hendricus Meijer ,  Uwe MicKan ,  Johannes Catharinus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

Inventor： Erik Loopstra ,  Johannes Baselmans ,  Marcel Mathijs Theodore Dierichs ,  Johannes Jasper ,  Hendricus Meijer ,  Uwe MicKan ,  Johannes Catharinus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

IPC: H01L21/027 ,  G02B1/10 ,  G03F7/20 ,  G03B27/54

CPC classification number: G03F7/70966 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70983 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract translation: 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF 2 2的双组分最终光学元件。