公开(公告)号：US20060158638A1

公开(公告)日：2006-07-20

申请号：US11312654

申请日：2005-12-21

Applicant: Koen Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Meijer ,  Joost Ottens ,  Marco Kluse ,  Jan Hopman

Inventor： Koen Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Meijer ,  Joost Ottens ,  Marco Kluse ,  Jan Hopman

IPC: G03B27/58

CPC classification number: G03F7/707 ,  G03F7/70708 ,  G03F7/70783

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.

公开(公告)号：US20050286029A1

公开(公告)日：2005-12-29

申请号：US10972755

申请日：2004-10-26

Applicant: Erik Ham ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Ellard Meijer ,  Hendricus Meijer ,  Hans Meiling ,  Bastiaan Mertens ,  Johannes Moors

Inventor： Erik Ham ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Ellard Meijer ,  Hendricus Meijer ,  Hans Meiling ,  Bastiaan Mertens ,  Johannes Moors

IPC: G03B27/52 ,  G03B27/62

CPC classification number: G03B27/52 ,  G03F7/70741

Abstract: According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.

Abstract translation: 根据实施例，用于传送平版印刷图案形成装置的盒被布置成与光刻设备配合。 运输箱可以设置有具有内部空间的容器部分，该内部空间具有用于存储图案形成装置的存储位置和用于图案形成装置的传送的开口。 在将图案形成装置从内部空间传送到装置之前，内部空间被加压。 箱子还可以包括用于关闭开口的封闭部分和/或用于将气体从箱体的内部空间排出和/或进气的通道系统。 其他实施例包括包括和/或配置为与这种盒配合的光刻设备。

公开(公告)号：US20070139855A1

公开(公告)日：2007-06-21

申请号：US11312651

申请日：2005-12-21

Applicant: Hubert Van Mierlo ,  Erik Ham ,  Hendricus Meijer ,  Hendrik Neerhof ,  Joost Ottens ,  Johannes Leijtens ,  Marco Kluse ,  Jan Hopman ,  Johannes Moors

Inventor： Hubert Van Mierlo ,  Erik Ham ,  Hendricus Meijer ,  Hendrik Neerhof ,  Joost Ottens ,  Johannes Leijtens ,  Marco Kluse ,  Jan Hopman ,  Johannes Moors

IPC: H01B13/00 ,  H01L21/683 ,  G03C5/00 ,  G21G5/00

CPC classification number: H01L21/6831 ,  G03F7/70708 ,  Y10T29/49117

Abstract: The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.

Abstract translation: 本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。 该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

公开(公告)号：US20050264778A1

公开(公告)日：2005-12-01

申请号：US10857614

申请日：2004-06-01

Applicant: Joeri Lof ,  Erik Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

Inventor： Joeri Lof ,  Erik Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Abstract translation: 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。

公开(公告)号：US20050018162A1

公开(公告)日：2005-01-27

申请号：US10833340

申请日：2004-04-28

Applicant: Martinus Leenders ,  Hendricus Meijer ,  Engelbertus Van Der Pasch ,  Michael Renkens ,  Theo Ruijl

Inventor： Martinus Leenders ,  Hendricus Meijer ,  Engelbertus Van Der Pasch ,  Michael Renkens ,  Theo Ruijl

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC classification number: G03F7/70258 ,  G03F7/7085

Abstract: In a lithographic projection apparatus, a measuring system configured to measure the position of the projection system relative to a reference frame includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table position. An angular encoder which sends light from a target down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system about its optical axis.

Abstract translation: 在光刻投影设备中，被配置为测量投影系统相对于参考框架的位置的测量系统包括相对于测量衬底台位置的测量系统的对应传感器刚性地安装的传感器。 使用角度编码器，其从目标向下发射具有相对于倾斜的灵敏度的两个光路的光，以测量投影系统绕其光轴的旋转。

公开(公告)号：US20050094119A1

公开(公告)日：2005-05-05

申请号：US10927531

申请日：2004-08-27

Applicant: Erik Loopstra ,  Johannes Baselmans ,  Marcel Mathijs Theodore Dierichs ,  Johannes Jasper ,  Hendricus Meijer ,  Uwe MicKan ,  Johannes Catharinus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

Inventor： Erik Loopstra ,  Johannes Baselmans ,  Marcel Mathijs Theodore Dierichs ,  Johannes Jasper ,  Hendricus Meijer ,  Uwe MicKan ,  Johannes Catharinus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

IPC: H01L21/027 ,  G02B1/10 ,  G03F7/20 ,  G03B27/54

CPC classification number: G03F7/70966 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70983 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract translation: 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF 2 2的双组分最终光学元件。

公开(公告)号：US20070268471A1

公开(公告)日：2007-11-22

申请号：US11710408

申请日：2007-02-26

Applicant: Joeri Lof ,  Hans Butler ,  Sjoerd Donders ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Roelof Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Helmar Santen

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Donders ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Roelof Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Helmar Santen

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US20070132970A1

公开(公告)日：2007-06-14

申请号：US11448990

申请日：2006-06-08

Applicant: Joeri Lof ,  Erik Bijlaart ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Roelof Ritsema ,  Frank Van Schaik ,  Thimotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

Inventor： Joeri Lof ,  Erik Bijlaart ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Roelof Ritsema ,  Frank Van Schaik ,  Thimotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US20060194123A1

公开(公告)日：2006-08-31

申请号：US11345629

申请日：2006-02-02

Applicant: Uwe Mickan ,  Hendricus Meijer

Inventor： Uwe Mickan ,  Hendricus Meijer

IPC: G03C5/00 ,  G03F9/00 ,  G03F1/00

CPC classification number: G03F7/70433 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70283 ,  G03F7/70666 ,  G03F9/7003 ,  G03F9/7076 ,  G03F9/7088

Abstract: A method of generating a photolithography patterning device for transferring a pattern formed in the patterning device onto a substrate utilizing a lithographic projection apparatus includes defining features within the pattern formed in the device, wherein the features have dimensions and orientations chosen to create a desired image on the substrate during pattern transfer; and adjusting the dimensions of the features to compensate the desired image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A measurement device for determining the position of a target image on or proximate a substrate in a lithographic projection apparatus, wherein the target image is formed by features on a patterning device, includes a detector configured to measure the position of the target image on or proximate the substrate, wherein the detector compensates the measured position of the target image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features of the patterning device during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A lithographic apparatus includes a measurement device.

Abstract translation: 使用光刻投影装置产生用于将形成在图案形成装置中的图案转印到基板上的光刻图案形成装置的方法包括限定在所述装置中形成的图案内的特征，其中所述特征具有选择的尺寸和取向以在 图案转印时的基板; 并且调整特征的尺寸以补偿在图案转印期间由辐射对特征的有效阴影角度引入的位移和尺寸误差所需的图像，或者与图案转印期间的曝光缝隙内的特征位置相关。 一种测量装置，用于在光刻投影设备中确定目标图像在基板上或其附近的位置，其中所述目标图像由图案形成装置上的特征形成，所述测量装置包括检测器，所述检测器被配置为测量所述目标图像在或近似的位置 所述基板，其中所述检测器补偿所述目标图像的测量位置，并且通过所述辐射的有效阴影角度在所述图案转印期间对所述图案形成装置的特征引入的尺寸误差或与所述曝光缝隙内的所述特征的位置相关联 在图案转移期间。 光刻设备包括测量装置。