公开(公告)号：US20050094119A1

公开(公告)日：2005-05-05

申请号：US10927531

申请日：2004-08-27

申请人： Erik Loopstra ,  Johannes Baselmans ,  Marcel Mathijs Theodore Dierichs ,  Johannes Jasper ,  Hendricus Meijer ,  Uwe MicKan ,  Johannes Catharinus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

发明人： Erik Loopstra ,  Johannes Baselmans ,  Marcel Mathijs Theodore Dierichs ,  Johannes Jasper ,  Hendricus Meijer ,  Uwe MicKan ,  Johannes Catharinus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

IPC分类号： H01L21/027 ,  G02B1/10 ,  G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70966 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70983 ,  Y10S430/162

摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

摘要翻译： 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF 2 2的双组分最终光学元件。

公开(公告)号：US20070132970A1

公开(公告)日：2007-06-14

申请号：US11448990

申请日：2006-06-08

申请人： Joeri Lof ,  Erik Bijlaart ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Roelof Ritsema ,  Frank Van Schaik ,  Thimotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Bijlaart ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Roelof Ritsema ,  Frank Van Schaik ,  Thimotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US20050134820A1

公开(公告)日：2005-06-23

申请号：US10740830

申请日：2003-12-22

申请人： Heine Mulder ,  Antonius Johannes Van Dijsseldonk ,  Erik Loopstra ,  Uwe Mickan ,  Johannes Catharinus Mulkens ,  Harm-Jan Voorma

发明人： Heine Mulder ,  Antonius Johannes Van Dijsseldonk ,  Erik Loopstra ,  Uwe Mickan ,  Johannes Catharinus Mulkens ,  Harm-Jan Voorma

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70075 ,  G03F7/701 ,  G03F7/70425 ,  G03F7/70566

摘要： A method using a lithographic apparatus comprising a reflective integrator is claimed that optimizes the exposure of features on a target area of a substrate, when the features make an angle between 5 and 85 degrees with respect to the target area. The method comprises rotating the reflective integrator with respect to the target area providing a rotated mirror-symmetric pupil shape, which is implemented by either rotating the substrate or rotating the reflective integrator with respect to the machine or the patterning device. The patterning device comprises a maximum usable area and a patterned area which are rotated with respect to each other if a rotated substrate is employed. The method can be used in single exposure or double exposure mode. A further advantage of the method of using a rotated wafer is that it can be used for exposing features on a substrate in any direction even when the projection system of the lithographic apparatus shows a preferred polarization direction.

摘要翻译： 要求使用包括反射积分器的光刻设备的方法，当特征相对于目标区域形成5至85度的角度时，可优化基板目标区域上的特征的曝光。 该方法包括使反射积分器相对于目标区域旋转，从而提供旋转的对称瞳孔形状，其通过旋转基底或相对于机器或图案形成装置旋转反射积分器来实现。 如果使用旋转的衬底，则图案形成装置包括相对于彼此旋转的最大可用面积和图案化区域。 该方法可用于单次曝光或双曝光模式。 使用旋转晶片的方法的另一个优点是，即使当光刻设备的投影系统显示优选的偏振方向时，其可以用于在任何方向上曝光衬底上的特征。

公开(公告)号：US20050263068A1

公开(公告)日：2005-12-01

申请号：US10966110

申请日：2004-10-18

申请人： Christiaan Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Mulkens ,  Erik Theodorus Bijlaart ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Jeroen Johannes Sophia Mertens ,  Bernardus Slaghekke ,  Patricius Aloysius Tinnemans ,  Helmar Van Santen

发明人： Christiaan Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Mulkens ,  Erik Theodorus Bijlaart ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Jeroen Johannes Sophia Mertens ,  Bernardus Slaghekke ,  Patricius Aloysius Tinnemans ,  Helmar Van Santen

IPC分类号： G03F7/20 ,  B05C11/00 ,  G03B27/42 ,  G03B27/52 ,  H01L21/00 ,  H01L21/027

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。

公开(公告)号：US20070159613A1

公开(公告)日：2007-07-12

申请号：US11709834

申请日：2007-02-23

申请人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.

公开(公告)号：US20060119807A1

公开(公告)日：2006-06-08

申请号：US11001082

申请日：2004-12-02

申请人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.

摘要翻译： 公开了一种浸没式光刻设备，其包括液体供应系统，该液体供应系统具有被配置为将液体供应到光刻设备的投影系统与基板之间的空间的入口以及被构造成去除至少部分液体的出口，液体供应 系统构造成围绕基本上垂直于衬底的曝光平面的轴旋转入口，出口或两者。

公开(公告)号：US20060007419A1

公开(公告)日：2006-01-12

申请号：US10885489

申请日：2004-07-07

申请人： Bob Streefkerk ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens

发明人： Bob Streefkerk ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70866 ,  G03F9/7026 ,  G03F9/7034

摘要： In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

公开(公告)号：US20050219483A1

公开(公告)日：2005-10-06

申请号：US11092964

申请日：2005-03-30

申请人： Johannes Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： H01L21/027 ,  G03B27/52 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7096 ,  G03F7/70341

摘要： An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.

摘要翻译： 公开了一种浸没式光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充投影系统的最终元件和基板台之间的空间与第一液体，以及测量系统，其被配置为测量每个 多个点在基板上，测量系统布置成使得通过第二液体进行测量，第二液体不由液体供应系统供应。

公开(公告)号：US20060232756A1

公开(公告)日：2006-10-19

申请号：US11239480

申请日：2005-09-30

申请人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen ,  Sjoerd Nicolaas Donders

发明人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen ,  Sjoerd Nicolaas Donders

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。

公开(公告)号：US20060023189A1

公开(公告)日：2006-02-02

申请号：US11239493

申请日：2005-09-30

申请人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

发明人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.