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公开(公告)号:US4978594A
公开(公告)日:1990-12-18
申请号:US258530
申请日:1988-10-17
申请人: James A. Bruce , Michael L. Kerbaugh , Ranee W. Kwong , Tanya N. Lee , Harold G. Linde , Harbans S. Sachdev
发明人: James A. Bruce , Michael L. Kerbaugh , Ranee W. Kwong , Tanya N. Lee , Harold G. Linde , Harbans S. Sachdev
IPC分类号: H01L21/302 , G03F7/09 , G03F7/40 , H01L21/027 , H01L21/3065
摘要: A process for forming a pattern on a substrate utilizing photolithographic techniques. In this process a layer of polymeric material containing a fluorine-containing compound is applied over the substrate and cured. A layer of photoresist material is applied over the polymeric material imagewise exposed and developed to reveal the image on the underlying polymeric material. Thereafter, the photoresist is silylated, and the structure is reactive ion etched to transfer the pattern to the underlying substrate. The fluorine component provides an underlying structure free of residue and cracking.