Systems and methods for monitoring integrated circuit internal states
    3.
    发明授权
    Systems and methods for monitoring integrated circuit internal states 失效
    监控集成电路内部状态的系统和方法

    公开(公告)号:US07009416B1

    公开(公告)日:2006-03-07

    申请号:US09984325

    申请日:2001-10-29

    IPC分类号: G01R31/02 G01R31/26

    CPC分类号: G01R31/3177

    摘要: A system for monitoring internal states of an integrated circuit includes logic nodes, selection logic and a monitor unit. The logic nodes are disposed within the integrated circuit and the selection logic is coupled to monitor pins externally accessible on the integrated circuit. The selection logic retrieves internal states of select logic nodes based on signals applied via the monitor pins. The monitor unit reads the internal states of the select logic nodes via the monitor pins.

    摘要翻译: 用于监视集成电路的内部状态的系统包括逻辑节点,选择逻辑和监视器单元。 逻辑节点设置在集成电路内,并且选择逻辑耦合到集成电路上外部可访问的监视引脚。 选择逻辑基于通过监视器引脚施加的信号来检索选择逻辑节点的内部状态。 监视器单元通过监视器引脚读取选择逻辑节点的内部状态。

    Power bus and method for generating power slits therein
    4.
    发明授权
    Power bus and method for generating power slits therein 失效
    电源总线及其中产生电力狭缝的方法

    公开(公告)号:US06233721B1

    公开(公告)日:2001-05-15

    申请号:US09270738

    申请日:1999-03-16

    IPC分类号: G06F1500

    摘要: A method for manufacturing a power bus on a chip, where the power bus has slits generated therein. The present invention relates to a method to manufacture a power bus in which the reference to a layout data base shows the coordinate location of the power buses in the chip. A height and width for the power bus is calculated based on its coordinates. Based on the height and width of the power buses and the predetermined size and spacing between power slits, a number of power slits to be generated is determined. These power slits are then generated by adding the power slits to the power bus in the coordinates of the layout database. The method of the present invention also generates power slits for use in manufacturing power buses on a chip for cases in which the power buses overlap.

    摘要翻译: 一种在芯片上制造电力总线的方法,其中电源总线上产生狭缝。 本发明涉及一种制造电源总线的方法,其中对布线数据库的参考表示芯片中电源总线的坐标位置。 电源总线的高度和宽度根据其坐标进行计算。 基于电源总线的高度和宽度以及功率狭缝之间的预定尺寸和间隔,确定要产生的多个功率狭缝。 然后通过在布局数据库的坐标中将功率狭缝添加到电源总线来产生这些功率狭缝。 本发明的方法还产生用于在电源总线重叠的情况下制造芯片上的电源总线的电源插槽。

    Method for manufacturing a power bus on a chip
    5.
    发明授权
    Method for manufacturing a power bus on a chip 失效
    在芯片上制造电源总线的方法

    公开(公告)号:US07516436B2

    公开(公告)日:2009-04-07

    申请号:US11483638

    申请日:2006-07-11

    IPC分类号: G06F17/50

    摘要: A method for manufacturing a power bus on a chip, where the power bus has slits generated therein. The present invention relates to a method to manufacture a power bus in which the reference to a layout data base shows the coordinate location of the power buses in the chip. A height and width for the power bus is calculated based on its coordinates. Based on the height and width of the power buses and the predetermined size and spacing between power slits, a number of power slits to be generated is determined. These power slits are then generated by adding the power slits to the power bus in the coordinates of the layout database. The method of the present invention also generates power slits for use in manufacturing power buses on a chip for cases in which the power buses overlap.

    摘要翻译: 一种在芯片上制造电力总线的方法,其中电源总线上产生狭缝。 本发明涉及一种制造电源总线的方法,其中参考布局数据库显示芯片中电源总线的坐标位置。 电源总线的高度和宽度根据其坐标进行计算。 基于电源总线的高度和宽度以及功率狭缝之间的预定尺寸和间隔,确定要产生的多个功率狭缝。 然后通过在布局数据库的坐标中将功率狭缝添加到电源总线来产生这些功率狭缝。 本发明的方法还产生用于在电源总线重叠的情况下制造芯片上的电源总线的电源插槽。

    Method for manufacturing a power bus on a chip
    7.
    发明申请
    Method for manufacturing a power bus on a chip 失效
    在芯片上制造电源总线的方法

    公开(公告)号:US20050086625A1

    公开(公告)日:2005-04-21

    申请号:US10973896

    申请日:2004-10-27

    IPC分类号: G06F17/50 H01L23/528

    摘要: A method for manufacturing a power bus on a chip, where the power bus has slits generated therein. The present invention relates to a method to manufacture a power bus in which the reference to a layout data base shows the coordinate location of the power buses in the chip. A height and width for the power bus is calculated based on its coordinates. Based on the height and width of the power buses and the predetermined size and spacing between power slits, a number of power slits to be generated is determined. These power slits are then generated by adding the power slits to the power bus in the coordinates of the layout database. The method of the present invention also generates power slits for use in manufacturing power buses on a chip for cases in which the power buses overlap.

    摘要翻译: 一种在芯片上制造电力总线的方法,其中电源总线上产生狭缝。 本发明涉及一种制造电源总线的方法,其中对布线数据库的参考表示芯片中电源总线的坐标位置。 电源总线的高度和宽度根据其坐标进行计算。 基于电源总线的高度和宽度以及功率狭缝之间的预定尺寸和间隔,确定要产生的多个功率狭缝。 然后通过在布局数据库的坐标中将功率狭缝添加到电源总线来产生这些功率狭缝。 本发明的方法还产生用于在电源总线重叠的情况下制造芯片上的电源总线的电源插槽。

    Method for manufacturing a power bus on a chip

    公开(公告)号:US20060253826A1

    公开(公告)日:2006-11-09

    申请号:US11483638

    申请日:2006-07-11

    IPC分类号: G06F17/50

    摘要: A method for manufacturing a power bus on a chip, where the power bus has slits generated therein. The present invention relates to a method to manufacture a power bus in which the reference to a layout data base shows the coordinate location of the power buses in the chip. A height and width for the power bus is calculated based on its coordinates. Based on the height and width of the power buses and the predetermined size and spacing between power slits, a number of power slits to be generated is determined. These power slits are then generated by adding the power slits to the power bus in the coordinates of the layout database. The method of the present invention also generates power slits for use in manufacturing power buses on a chip for cases in which the power buses overlap.