公开(公告)号：US20180181169A1

公开(公告)日：2018-06-28

申请号：US15391400

申请日：2016-12-27

申请人： CHENG-CHING SHENG ,  JYNN-YU WANG ,  TE-YANG CHEN ,  WEN-CHIN SUNG

发明人： CHENG-CHING SHENG ,  JYNN-YU WANG ,  TE-YANG CHEN ,  WEN-CHIN SUNG

IPC分类号： G06F1/20 ,  H05K7/20

CPC分类号： G06F1/20 ,  G06F1/181

摘要： A cooling device for a case has a case and an air cooling box mounted inside of the case. An air inlet and an air outlet are respectively mounted on two opposite side walls of the air cooling box, and the air inlet is larger than the air outlet in area. A compression region is disposed in the air cooling box, and communicates with the air inlet and the air outlet. The cooling device can lower the temperature of the air out of the air cooling box via the different areas of the air outlet and the air inlet. External air must pass through the air cooling box to enter the case, and the air outlet is smaller than the air inlet, such that most of the dust is gathered and accumulates in the air cooling box, facilitating ease in cleaning.

公开(公告)号：US20120244785A1

公开(公告)日：2012-09-27

申请号：US13198729

申请日：2011-08-05

申请人： Yu-Piao Wang ,  Jen-Feng Cheng ,  Te-Yang Chen ,  Ya-Ling Chen

发明人： Yu-Piao Wang ,  Jen-Feng Cheng ,  Te-Yang Chen ,  Ya-Ling Chen

IPC分类号： B24B1/00

CPC分类号： B24B37/042 ,  B24B37/105 ,  B24B37/26

摘要： A polishing method and a polishing system are provided. By means of adjusting a rotational center of a polishing article corresponding to positions of a polishing pad or polishing pads, a polishing rate of the polishing article surface has a better uniformity, resulted from compensation of polishing rates at the rotational center of the polishing article.

摘要翻译： 提供了抛光方法和抛光系统。 通过调整与抛光垫或抛光垫的位置相对应的研磨制品的旋转中心，抛光物品表面的抛光速率由抛光物品的旋转中心的抛光速率的补偿得到更好的均匀性。

公开(公告)号：US09393665B2

公开(公告)日：2016-07-19

申请号：US13198729

申请日：2011-08-05

申请人： Yu-Piao Wang ,  Jen-Feng Cheng ,  Te-Yang Chen ,  Ya-Ling Chen

发明人： Yu-Piao Wang ,  Jen-Feng Cheng ,  Te-Yang Chen ,  Ya-Ling Chen

IPC分类号： B24B1/00 ,  B24B37/04 ,  B24B37/10 ,  B24B37/26

CPC分类号： B24B37/042 ,  B24B37/105 ,  B24B37/26

摘要： A polishing method and a polishing system are provided. By means of adjusting a rotational center of a polishing article corresponding to positions of a polishing pad or polishing pads, a polishing rate of the polishing article surface has a better uniformity, resulted from compensation of polishing rates at the rotational center of the polishing article.

摘要翻译： 提供了抛光方法和抛光系统。 通过调整与抛光垫或抛光垫的位置相对应的研磨制品的旋转中心，抛光物品表面的抛光速率由抛光物品的旋转中心的抛光速率的补偿得到更好的均匀性。