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公开(公告)号：US08705838B2
公开(公告)日：2014-04-22
申请号：US11885095
申请日：2006-02-04
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G03F7/7065 , G03F7/70666
摘要： The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.
摘要翻译： 本发明涉及一种掩模检查方法，可用于设计和生产掩模，以便早期检测相关的弱点并进行纠正。 根据所述掩模检查方法，基于转换为掩模布局的掩模设计，进行空中图像模拟，优选全面的空间图像模拟，以便确定热点列表。 通过AIMS工具分析掩模/测试掩模，从而产生真实的航空图像并与模拟的航空图像进行比较。 使用确定的空间图像之间的差异来改进掩模设计。 本发明的布置使得能够进行用于掩模设计和掩模生产的掩模检查的方法。 直接在掩模生产过程中使用AIMS工具基本上加快了掩模生产，同时降低了错误率和成本。
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公开(公告)号：US20080247632A1
公开(公告)日：2008-10-09
申请号：US11885095
申请日：2006-02-04
IPC分类号： G03F7/20
CPC分类号： G03F1/84 , G03F7/7065 , G03F7/70666
摘要： The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.
摘要翻译： 本发明涉及一种掩模检查方法，可用于设计和生产掩模，以便早期检测相关的弱点并进行纠正。 根据所述掩模检查方法，基于转换为掩模布局的掩模设计，进行空中图像模拟，优选全面的空间图像模拟，以便确定热点列表。 通过AIMS工具分析掩模/测试掩模，从而产生真实的航空图像并与模拟的航空图像进行比较。 使用确定的空间图像之间的差异来改进掩模设计。 本发明的布置使得能够进行用于掩模设计和掩模生产的掩模检查的方法。 直接在掩模生产过程中使用AIMS工具基本上加快了掩模生产，同时降低了错误率和成本。
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