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1.发明授权Method and apparatus for simultaneously forming a plurality of openings through a substrate 失效用于同时形成穿过基底的多个开口的方法和装置
公开(公告)号：US5105588A
公开(公告)日：1992-04-21
申请号：US580397
申请日：1990-09-10
摘要： An improved method and apparatus for abrasive jet machining. A special spray nozzle unit is provided which is mounted within a cavity in a retaining block. Each nozzle unit is preferably made of multiple components secured together within the cavity. Also, such unit includes at least two passageways therethrough. In a preferred embodiment, the unit is divided into two heads, each head being substantially triangular with a flattened apex. The retaining block has at least one port therethrough which communicates with the passageways in the heads. A flow of particulate materials into the block passes through the passageways in the heads, simultaneously producing multiple particulate streams. The multiple streams may then be directed toward a substrate in order to simultaneously produce a plurality of openings through the substrate.
摘要翻译： 一种用于磨料喷射加工的改进方法和装置。 提供了一种特殊的喷嘴单元，其被安装在保持块中的空腔内。 每个喷嘴单元优选地由在腔内固定在一起的多个部件制成。 而且，这种单元还包括至少两个通过其的通道。 在优选实施例中，该单元被分成两个头部，每个头部具有平坦的顶点的大致三角形。 保持块具有至少一个通过其的端口，其与头部中的通道连通。 流入块中的颗粒材料流过头部的通道，同时产生多个颗粒物流。 然后，多个流可以被引导到衬底，以便同时产生穿过衬底的多个开口。
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公开(公告)号：US06675476B2
公开(公告)日：2004-01-13
申请号：US09730263
申请日：2000-12-05
申请人： Timothy S. Hostetler
发明人： Timothy S. Hostetler
IPC分类号： G11B5127
CPC分类号： B41J2/1631 , B41J2/1603 , B41J2/1629 , B41J2/1632 , Y10T29/42 , Y10T29/49126 , Y10T29/49128 , Y10T29/49401 , Y10T29/49798
摘要： Techniques for fabricating an inkjet printhead include providing a printhead substrate, fabricating a thinfilm structure on the substrate, forming a break trench in a surface region of the substrate in which a feed slot is to be formed, and subsequently abrasively machining the substrate through the break trench to form the feed slot. The break trench can be formed by an etch process, prior to applying a barrier layer to the thinfilm structure in a preferred embodiment.
摘要翻译： 用于制造喷墨打印头的技术包括提供打印头基板，在基板上制造薄膜结构，在基板的表面区域中形成断裂沟槽，在该表面区域中将形成进料槽，然后通过断裂对基板进行磨蚀加工 沟槽形成进料槽。 在优选实施例中，在将薄膜结构施加阻挡层之前，可以通过蚀刻工艺形成断裂沟槽。
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公开(公告)号：US07277619B2
公开(公告)日：2007-10-02
申请号：US11072657
申请日：2005-03-04
CPC分类号： G03F7/0002 , B29D11/00663 , B82Y10/00 , B82Y20/00 , B82Y40/00 , G02B6/1225
摘要： This invention relates to a method for forming a nano-imprinted photonic crystal waveguide, comprising the steps of: preparing an optical film on a substrate; preparing a template having a plurality of protrusions of less than 500 nm in length such that the protrusions are spaced a predetermined distance from each other; heating the film; causing the template to press against the heated film such that a portion of the film is deformed by the protrusions; separating the template from the film; and etching the film to remove a residual layer of the film to form a nano-imprinted photonic crystal waveguide. Another embodiment of this invention fulfills these needs by providing a method for forming a nano-imprinted photonic crystal waveguide, comprising the steps of: a method for forming a nano-imprinted photonic crystal waveguide, comprising the steps of: preparing an optical film upon a substrate; preparing a template having a plurality of protrusions of less than 500 nm in length such that the protrusions are spaced a predetermined distance from each other; causing the template to modify a shape of the film; applying a UV light to the film and the template such that the film becomes polymerized; separating the template from the film; and etching the film to remove a residual layer of the film to form a nano-imprinted photonic crystal waveguide.
摘要翻译： 本发明涉及一种形成纳米压印光子晶体波导的方法，包括以下步骤：在衬底上制备光学膜; 制备具有长度小于500nm的多个突起的模板，使得突起彼此间隔预定距离; 加热薄膜; 使得模板压靠加热的膜，使得膜的一部分由突起变形; 将模板与胶片分开; 并蚀刻该膜以除去该膜的残留层以形成纳米压印的光子晶体波导。 本发明的另一实施例通过提供形成纳米压印光子晶体波导的方法来满足这些需要，包括以下步骤：形成纳米压印光子晶体波导的方法，包括以下步骤：在 基质; 制备具有长度小于500nm的多个突起的模板，使得突起彼此间隔预定距离; 导致模板修改胶片的形状; 对膜和模板施加UV光使得膜变得聚合; 将模板与胶片分开; 并蚀刻该膜以除去该膜的残留层以形成纳米压印的光子晶体波导。
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公开(公告)号：US06968617B2
公开(公告)日：2005-11-29
申请号：US10633098
申请日：2003-08-01
申请人： Timothy S. Hostetler
发明人： Timothy S. Hostetler
CPC分类号： B41J2/1631 , B41J2/1603 , B41J2/1629 , B41J2/1632 , Y10T29/42 , Y10T29/49126 , Y10T29/49128 , Y10T29/49401 , Y10T29/49798
摘要： In one example embodiment, a method of fabricating a fluid ejection device is provided. The method can including fabricating a thinflim structure on a device substrate and forming a peripheral break trench structure in a first surface of the substrate circumscribing a region in which a feed slot is to be formed through the substrate. Subsequently the substrate can be abrasively machined from a second surface of the substrate to the break trench structure to form the feed slot.
摘要翻译： 在一个示例性实施例中，提供了制造流体喷射装置的方法。 该方法可以包括在器件衬底上制造薄膜结构，并且在衬底的第一表面中形成外围断裂沟槽结构，该第一表面围绕要通过衬底形成馈电槽的区域。 随后，可以将衬底从衬底的第二表面磨蚀加工到断裂沟槽结构以形成馈送槽。
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