-
1.发明授权Illumination-sensor calibration methods, and exposure methods and apparatus and device-manufacturing methods including same, and reflective masks used in same 有权照明传感器校准方法以及包括其的曝光方法以及装置和装置制造方法以及在其中使用的反射罩公开(公告)号：US08018577B2
公开(公告)日：2011-09-13
申请号：US11437595
申请日：2006-05-19
IPC分类号： G03B27/54
CPC分类号： G03F7/7085 , G03F7/70516 , G03F7/70558
摘要： Exposure apparatus are disclosed that can control, to high precision, exposure doses on a photosensitive substrate of a mask pattern defined on a reflective mask as the pattern is being exposed on the substrate using a projection-optical system. An exemplary apparatus includes a first illumination sensor for detecting light that is incident on a reflective mask from an illumination system and a second illumination sensor for detecting light that has propagated from the illumination system to a reference reflective surface on the reflective mask, reflected from the reference reflective surface, and arrived at an image surface of the projection-optical system. Calibration of the first sensor is performed based on detection data obtained by the first sensor and detection data obtained by the second sensor. Exposure of the substrate is controlled based on the detection data obtained by the calibrated first sensor.
摘要翻译： 公开了一种曝光装置，其可以使用投影光学系统在图案被曝光在基板上的同时，在限定在反射掩模上的掩模图案的感光基板上高精度地控制曝光量。 示例性装置包括用于检测从照明系统入射到反射掩模上的光的第一照明传感器和用于检测从照明系统传播到反射掩模上的参考反射表面的光的第二照明传感器， 参考反射表面，并到达投影光学系统的图像表面。 基于由第一传感器获得的检测数据和由第二传感器获得的检测数据执行第一传感器的校准。 基于由校准的第一传感器获得的检测数据来控制基板的曝光。
-
2.发明申请Illumination-sensor calibration methods, and exposure methods and apparatus and device-manufacturing methods including same, and reflective masks used in same 有权照明传感器校准方法以及包括其的曝光方法以及装置和装置制造方法以及在其中使用的反射罩公开(公告)号：US20060290916A1
公开(公告)日：2006-12-28
申请号：US11437595
申请日：2006-05-19
IPC分类号： G03B27/32
CPC分类号： G03F7/7085 , G03F7/70516 , G03F7/70558
摘要： Exposure apparatus are disclosed that can control, to high precision, exposure doses on a photosensitive substrate of a mask pattern defined on a reflective mask as the pattern is being exposed on the substrate using a projection-optical system. An exemplary apparatus includes a first illumination sensor for detecting light that is incident on a reflective mask from an illumination system and a second illumination sensor for detecting light that has propagated from the illumination system to a reference reflective surface on the reflective mask, reflected from the reference reflective surface, and arrived at an image surface of the projection-optical system. Calibration of the first sensor is performed based on detection data obtained by the first sensor and detection data obtained by the second sensor. Exposure of the substrate is controlled based on the detection data obtained by the calibrated first sensor.
摘要翻译： 公开了一种曝光装置，其可以使用投影光学系统在图案被曝光在基板上的同时，在限定在反射掩模上的掩模图案的感光基板上高精度地控制曝光量。 示例性装置包括用于检测从照明系统入射到反射掩模上的光的第一照明传感器和用于检测从照明系统传播到反射掩模上的参考反射表面的光的第二照明传感器， 参考反射表面，并到达投影光学系统的图像表面。 基于由第一传感器获得的检测数据和由第二传感器获得的检测数据执行第一传感器的校准。 基于由校准的第一传感器获得的检测数据来控制基板的曝光。
-
搜索结果
2 条记录 (耗时 0.008 秒)