公开(公告)号：US20130112567A1

公开(公告)日：2013-05-09

申请号：US13810206

申请日：2011-07-21

申请人： Satoru Ozawa ,  Masatoshi Kamata ,  Katsuhiro Kojima ,  Tomohiro Masaki

发明人： Satoru Ozawa ,  Masatoshi Kamata ,  Katsuhiro Kojima ,  Tomohiro Masaki

IPC分类号： C25D17/02

CPC分类号： C25D17/02 ,  B29C33/424 ,  C25D1/006 ,  C25D11/005 ,  C25D11/08 ,  C25D11/10 ,  G02B1/118 ,  G02B27/0006

摘要： An apparatus for manufacturing a mold for nanoimprinting and a method of manufacturing a mold for nanoimprinting are provided. The apparatus for manufacturing the mold for nanoimprinting performs an anodic oxidation treatment to an aluminum substrate with an electrolytic solution and is characterized in that at least a material of a surface of a portion contacting with the electrolytic solution is a metal or an alloy thereof, having an eluted amount of 0.2 ppm/cm2 or less per unit area when immersed in 80 ml of the electrolytic solution at room temperature for 450 hours. The method of manufacturing the mold for nanoimprinting is characterized in using the apparatus for manufacturing the mold for nanoimprinting to carry out the anodic oxidation treatment. The manufacturing apparatus and manufacturing method of the invention suppress metal elution into the electrolytic solution during the anodic oxidation treatment.

摘要翻译： 提供一种用于制造用于纳米压印的模具的装置和一种制造用于纳米压印的模具的方法。 用于制造用于纳米压印的模具的装置用电解液对铝基板进行阳极氧化处理，其特征在于，至少与电解液接触的部分的表面的材料是金属或其合金，具有 在室温下浸渍在80ml电解液中450小时时，每单位面积的洗脱量为0.2ppm / cm 2以下。 制造用于纳米压印的模具的方法的特征在于使用用于制造用于纳米压印的模具的装置来进行阳极氧化处理。 本发明的制造装置和制造方法在阳极氧化处理中抑制电解液中的金属洗脱。