公开(公告)号：US20100230631A1

公开(公告)日：2010-09-16

申请号：US12438143

申请日：2008-07-16

申请人： Tsuguhiro Tago ,  Tomotake Matsuda ,  Mayumi Kimura ,  Tetsuo Aoyama

发明人： Tsuguhiro Tago ,  Tomotake Matsuda ,  Mayumi Kimura ,  Tetsuo Aoyama

IPC分类号： C09K13/06

CPC分类号： H01L21/32134 ,  C23F1/20 ,  H01L21/32139

摘要： A metal film such as an aluminum film or an aluminum alloy film is etched with good controllability, preventing a resist from bleeding, to have a proper taper configuration and superior flatness.A water solution containing a phosphoric acid, a nitric acid, and an organic acid salt is used as an etching liquid composition used to etch the metal film on a substrate.The organic acid salt is composed of one kind selected from a group consisting of an aliphatic monocarboxylic acid, an aliphatic polycarboxylic acid, an aliphatic oxicarboxylic acid, an aromatic monocarboxylic acid, an aromatic polycarboxylic acid and an aromatic oxycarboxylic acid, and one kind selected from a group consisting of an ammonium salt, an amine salt, a quaternary ammonium salt, and an alkali metal salt.In addition, a concentration of the organic acid salt ranges from 0.1% to 20% by weight.In addition, the etching liquid composition according to the present invention is used when the metal film is formed of aluminum or an aluminum alloy.

摘要翻译： 蚀刻具有良好可控性的铝膜或铝合金膜等金属膜，防止抗蚀剂渗色，具有适当的锥形构造和优异的平坦度。 使用含有磷酸，硝酸和有机酸盐的水溶液作为用于蚀刻基板上的金属膜的蚀刻液组合物。 有机酸盐由脂肪族一元羧酸，脂肪族多元羧酸，脂肪族二羧酸，芳香族单羧酸，芳香族多元羧酸，芳香族羟基羧酸等组成的组中选出的一种， 由铵盐，胺盐，季铵盐和碱金属盐组成的组。 另外，有机酸盐的浓度为0.1〜20重量％。 此外，当金属膜由铝或铝合金形成时，使用根据本发明的蚀刻液组合物。

公开(公告)号：US08545716B2

公开(公告)日：2013-10-01

申请号：US12438143

申请日：2008-07-16

申请人： Tsuguhiro Tago ,  Tomotake Matsuda ,  Mayumi Kimura ,  Tetsuo Aoyama

发明人： Tsuguhiro Tago ,  Tomotake Matsuda ,  Mayumi Kimura ,  Tetsuo Aoyama

IPC分类号： C09K13/06

CPC分类号： H01L21/32134 ,  C23F1/20 ,  H01L21/32139

摘要： A metal film such as an aluminum film or an aluminum alloy film is etched with good controllability, preventing a resist from bleeding, to have a proper taper configuration and superior flatness.A water solution containing a phosphoric acid, a nitric acid, and an organic acid salt is used as an etching liquid composition used to etch the metal film on a substrate.The organic acid salt is composed of one kind selected from a group consisting of an aliphatic monocarboxylic acid, an aliphatic polycarboxylic acid, an aliphatic oxicarboxylic acid, an aromatic monocarboxylic acid, an aromatic polycarboxylic acid and an aromatic oxycarboxylic acid, and one kind selected from a group consisting of an ammonium salt, an amine salt, a quaternary ammonium salt, and an alkali metal salt.In addition, a concentration of the organic acid salt ranges from 0.1% to 20% by weight.In addition, the etching liquid composition according to the present invention is used when the metal film is formed of aluminum or an aluminum alloy.

摘要翻译： 蚀刻具有良好可控性的铝膜或铝合金膜等金属膜，防止抗蚀剂渗色，具有适当的锥形构造和优异的平坦度。 使用含有磷酸，硝酸和有机酸盐的水溶液作为用于蚀刻基板上的金属膜的蚀刻液组合物。 有机酸盐由脂肪族一元羧酸，脂肪族多元羧酸，脂肪族二羧酸，芳香族单羧酸，芳香族多元羧酸，芳香族羟基羧酸等组成的组中选出的一种， 由铵盐，胺盐，季铵盐和碱金属盐组成的组。 另外，有机酸盐的浓度为0.1〜20重量％。 此外，当金属膜由铝或铝合金形成时，使用根据本发明的蚀刻液组合物。