公开(公告)号：US20120055404A1

公开(公告)日：2012-03-08

申请号：US13293266

申请日：2011-11-10

申请人： Hubertus VON DER WAYDBRINK ,  Siegfried SCHEIBE ,  Jens MEYER ,  Andrej WOLF ,  Uwe TRAEBER ,  Michael HENTSCHEL

发明人： Hubertus VON DER WAYDBRINK ,  Siegfried SCHEIBE ,  Jens MEYER ,  Andrej WOLF ,  Uwe TRAEBER ,  Michael HENTSCHEL

IPC分类号： C23C16/458

CPC分类号： C23C16/54 ,  C23C16/4401

摘要： Apparatus for continuous coating has a chamber wall which forms a processing chamber, thermal insulation which forms a processing area within the chamber, a transportation device for substrates located in the processing area with a substrate transportation direction of the substrates lying in the lengthwise extension of the apparatus for continuous coating, and heating equipment which heats the substrates, is designed to minimize unwanted coating, in particular of parts of the apparatus, in order to minimize the expense of maintaining and servicing the apparatus A condensation element is positioned in the processing chamber, which extends into the processing area and binds the arising vapor through condensation.

摘要翻译： 用于连续涂布的装置具有形成处理室的室壁，在室内形成处理区域的热绝缘体，位于处理区域中的基板的输送装置，其中基板的基板输送方向位于 用于连续涂覆的装置和加热基板的加热设备被设计成使不需要的涂层，特别是装置的部件最小化，以便最小化维护和维修设备的费用。冷凝件位于处理室中， 其延伸到处理区域中并通过冷凝来结合产生的蒸气。

公开(公告)号：US20090050057A1

公开(公告)日：2009-02-26

申请号：US12197638

申请日：2008-08-25

申请人： Hubertus VON DER WAYDBRINK ,  Siegfried SCHEIBE ,  Jens MEYER ,  Andrej WOLF ,  Uwe TRAEBER ,  Michael HENTSCHEL

发明人： Hubertus VON DER WAYDBRINK ,  Siegfried SCHEIBE ,  Jens MEYER ,  Andrej WOLF ,  Uwe TRAEBER ,  Michael HENTSCHEL

IPC分类号： C23C16/54

CPC分类号： C23C16/54 ,  C23C16/4401

摘要： Apparatus for continuous coating has a chamber wall which forms a processing chamber, thermal insulation which forms a processing area within the chamber, a transportation device for substrates located in the processing area with a substrate transportation direction of the substrates lying in the lengthwise extension of the apparatus for continuous coating, and heating equipment which heats the substrates, is designed to minimize unwanted coating, in particular of parts of the apparatus, in order to minimize the expense of maintaining and servicing the apparatus A condensation element is positioned in the processing chamber, which extends into the processing area and binds the arising vapor through condensation.

摘要翻译： 用于连续涂布的装置具有形成处理室的室壁，在室内形成处理区域的热绝缘体，位于处理区域中的基板的输送装置，其中基板的基板输送方向位于 用于连续涂覆的装置和加热基板的加热设备被设计成使不需要的涂层，特别是装置的部件最小化，以便最小化维护和维修设备的费用。冷凝件位于处理室中， 其延伸到处理区域中并通过冷凝来结合产生的蒸气。

公开(公告)号：US08470094B2

公开(公告)日：2013-06-25

申请号：US13293266

申请日：2011-11-10

申请人： Hubertus Von Der Waydbrink ,  Siegfried Scheibe ,  Jens Meyer ,  Andrej Wolf ,  Uwe Traeber ,  Michael Hentschel

发明人： Hubertus Von Der Waydbrink ,  Siegfried Scheibe ,  Jens Meyer ,  Andrej Wolf ,  Uwe Traeber ,  Michael Hentschel

IPC分类号： C23C16/54

CPC分类号： C23C16/54 ,  C23C16/4401

摘要： Apparatus for continuous coating has a chamber wall which forms a processing chamber, thermal insulation which forms a processing area within the chamber, a transportation device for substrates located in the processing area with a substrate transportation direction of the substrates lying in the lengthwise extension of the apparatus for continuous coating, and heating equipment which heats the substrates, is designed to minimize unwanted coating, in particular of parts of the apparatus, in order to minimize the expense of maintaining and servicing the apparatus A condensation element is positioned in the processing chamber, which extends into the processing area and binds the arising vapor through condensation.

摘要翻译： 用于连续涂布的装置具有形成处理室的室壁，在室内形成处理区域的热绝缘体，位于处理区域中的基板的输送装置，其中基板的基板输送方向位于 用于连续涂覆的装置和加热基板的加热设备被设计成使不需要的涂层，特别是装置的部件最小化，以便最小化维护和维修设备的费用。冷凝件位于处理室中， 其延伸到处理区域中并通过冷凝来结合产生的蒸气。