Semiconductor Optical Amplifier Having a Non-Uniform Injection Current Density
    2.
    发明申请
    Semiconductor Optical Amplifier Having a Non-Uniform Injection Current Density 有权
    具有不均匀注入电流密度的半导体光放大器

    公开(公告)号:US20090046354A1

    公开(公告)日:2009-02-19

    申请号:US12103088

    申请日:2008-04-15

    IPC分类号: H01S3/00

    摘要: A semiconductor optical amplifier (SOA) with efficient current injection is described. Injection current density is controlled to be higher in some areas and lower in others to provide, e.g., improved saturation power and/or noise figure. Controlled injection current can be accomplished by varying the resistivity of the current injection electrode. This, in turn, can be accomplished by patterning openings in the dielectric layer above the current injection metallization in a manner which varies the series resistance along the length of the device.

    摘要翻译: 描述了一种具有高效电流注入的半导体光放大器(SOA)。 注入电流密度在一些区域被控制得更高,而另一些区域的注入电流密度更低,以提供例如改善的饱和功率和/或噪声系数。 控制注入电流可以通过改变电流注入电极的电阻率来实现。 这又可以通过以沿设备长度改变串联电阻的方式在电流注入金属化之上的电介质层中图案化开口来实现。

    Semiconductor optical amplifier having a non-uniform injection current density
    4.
    发明授权
    Semiconductor optical amplifier having a non-uniform injection current density 有权
    半导体光放大器具有不均匀的注入电流密度

    公开(公告)号:US07359113B2

    公开(公告)日:2008-04-15

    申请号:US11346526

    申请日:2006-02-02

    IPC分类号: H01S3/00

    摘要: A semiconductor optical amplifier (SOA) with efficient current injection is described. Injection current density is controlled to be higher in some areas and lower in others to provide, e.g., improved saturation power and/or noise figure. Controlled injection current can be accomplished by varying the resistivity of the current injection electrode. This, in turn, can be accomplished by patterning openings in the dielectric layer above the current injection metallization in a manner which varies the series resistance along the length of the device.

    摘要翻译: 描述了一种具有高效电流注入的半导体光放大器(SOA)。 注入电流密度在一些区域被控制得更高,而另一些区域的注入电流密度更低,以提供例如改善的饱和功率和/或噪声系数。 控制注入电流可以通过改变电流注入电极的电阻率来实现。 这又可以通过以沿设备长度改变串联电阻的方式在电流注入金属化之上的电介质层中图案化开口来实现。

    Use of an organic dielectric as a sacrificial layer
    5.
    发明授权
    Use of an organic dielectric as a sacrificial layer 失效
    使用有机电介质作为牺牲层

    公开(公告)号:US06905613B2

    公开(公告)日:2005-06-14

    申请号:US09902116

    申请日:2001-07-10

    IPC分类号: B81B3/00 B44C1/22 C23F1/00

    CPC分类号: B81C1/00476 B81C2201/0108

    摘要: A method for using an organic dielectric as a sacrificial layer for forming suspended or otherwise spaced structures. The use of an organic dielectric has a number of advantages, including allowing use of an organic solvent or etch to remove the sacrificial layer. Organic solvents only remove organic materials, and thus do not affect or otherwise damage non-organic layers such as metal layers. This may reduce or eliminate the need for the rinsing and drying steps often associated with the use of acidic etchants such as Hydrofluoric Acid.

    摘要翻译: 一种使用有机电介质作为牺牲层的方法,用于形成悬浮或其他间隔结构。 有机电介质的使用具有许多优点,包括允许使用有机溶剂或蚀刻去除牺牲层。 有机溶剂仅除去有机物质,因此不会影响或以其他方式损坏金属层等非有机层。 这可以减少或消除通常与使用酸性蚀刻剂如氢氟酸相关的漂洗和干燥步骤的需要。