公开(公告)号：US20190306170A1

公开(公告)日：2019-10-03

申请号：US15940967

申请日：2018-03-30

申请人： Yanlin Wang ,  Weizhi Li

发明人： Yanlin Wang ,  Weizhi Li

IPC分类号： H04L29/06 ,  G06F21/55 ,  H04L29/08 ,  G06F21/60

摘要： Systems and methods for adaptive data collection using analytics agents for privileged access management. Embodiments of the invention deploy analytics agents to computer clients and servers at enterprise premises. Analytics agents collect event and contextual data of privileged users, record their computer access activities, and report the collected data to servers of analytics services. Analytics services produce entity behavior models and agent rules, and instruct analytics agents for adaptive data collection and session recording and uploading to the cloud storage. In an embodiment, an analytics agent is able to adjust the data collection scope dynamically and determine the session recording and uploading actions based on event entity behavior models and configured agent rules. Agent rules are automatically pushed to an analytics agent from analytics services and also can be set manually by system administrators.

公开(公告)号：US20230289560A1

公开(公告)日：2023-09-14

申请号：US17694463

申请日：2022-03-14

申请人： Weizhi Li ,  Vineet Abhishek ,  Jason Brewer ,  Roman Grachev ,  Rui Zhang

发明人： Weizhi Li ,  Vineet Abhishek ,  Jason Brewer ,  Roman Grachev ,  Rui Zhang

IPC分类号： G06N3/04 ,  G06N3/08

CPC分类号： G06N3/0454 ,  G06N3/08

摘要： Machine learning architectures may predict the likelihood of interaction by users with content items that are accessible using a client application. The machine learning architectures may include one or more feature interaction layers that are coupled with one or more extraction layers. Content items may be selected to provide to users of the client application based on probabilities of users performing one or more actions with respect to the content items, where the probabilities for each action are determined by the machine learning architectures.

公开(公告)号：US20190116193A1

公开(公告)日：2019-04-18

申请号：US15785430

申请日：2017-10-17

申请人： Yanlin Wang ,  Weizhi Li

发明人： Yanlin Wang ,  Weizhi Li

IPC分类号： H04L29/06 ,  G06N99/00

摘要： Methods and systems of risk assessment for network access control through data analytics. An embodiment of the invention employs well-known machine-learning clustering methods to learn normal entity behavior by looking for patterns in the events that stream in continuously. In an embodiment of the invention, normal entity behaviors are represented as clusters of event vectors. An embodiment of the invention evaluates the risk level for a new event of an entity by comparing the event with the entity's profile represented as clusters of event vectors. In an embodiment of the invention, the risk level is associated with a confidence level. Confidence level indicates how well the system knows about the entity. Embodiments of the invention do not need human administration in the process of building entity profile and assessing risk level of events associated with an entity.

公开(公告)号：US08425718B2

公开(公告)日：2013-04-23

申请号：US12724165

申请日：2010-03-15

申请人： Yadong Jiang ,  Zhiming Wu ,  Tao Wang ,  Weizhi Li ,  Xiaolin Han

发明人： Yadong Jiang ,  Zhiming Wu ,  Tao Wang ,  Weizhi Li ,  Xiaolin Han

IPC分类号： H01L21/306

CPC分类号： H01L21/67028 ,  B81C1/00571 ,  B81C2201/0133 ,  H01L21/32134 ,  H01L21/67086

摘要： The present invention provides a method of wet etching a silicon slice including a silicon substrate and a metal film layer thereon comprising steps of: performing lithographic process to the silicon slice forming a masked silicon slice comprising the silicon substrate and a partially masked metal film thereon; immersing the masked silicon slice into an etchant; rotating the masked silicon slice in the etchant; injecting high-purity nitrogen gas into the etchant for agitating the etchant; removing the masked silicon slice out of the etchant, upon completion of etching; and rinsing the masked silicon slice with deionized water.

摘要翻译： 本发明提供了一种湿式蚀刻包括硅衬底和金属膜层的硅片的方法，包括以下步骤：对形成包含硅衬底和部分掩蔽的金属膜的掩模硅片的硅片进行光刻处理; 将掩蔽的硅片浸入蚀刻剂中; 在蚀刻剂中旋转掩模的硅片; 将高纯度氮气注入蚀刻剂以搅拌蚀刻剂; 蚀刻完成后将掩模的硅片从蚀刻剂上除去; 并用去离子水冲洗掩蔽的硅片。

公开(公告)号：US20110223771A1

公开(公告)日：2011-09-15

申请号：US12724165

申请日：2010-03-15

申请人： Yadong Jiang ,  Zhiming Wu ,  Tao Wang ,  Weizhi Li ,  Xiaolin Han

发明人： Yadong Jiang ,  Zhiming Wu ,  Tao Wang ,  Weizhi Li ,  Xiaolin Han

IPC分类号： H01L21/306

CPC分类号： H01L21/67028 ,  B81C1/00571 ,  B81C2201/0133 ,  H01L21/32134 ,  H01L21/67086

摘要： The present invention provides a method of wet etching a silicon slice including a silicon substrate and a metal film layer thereon comprising steps of: performing lithographic process to the silicon slice forming a masked silicon slice comprising the silicon substrate and a partially masked metal film thereon; immersing the masked silicon slice into an etchant; rotating the masked silicon slice in the etchant; injecting high-purity nitrogen gas into the etchant for agitating the etchant; removing the masked silicon slice out of the etchant, upon completion of etching; and rinsing the masked silicon slice with deionized water.

摘要翻译： 本发明提供了一种湿式蚀刻包括硅衬底和金属膜层的硅片的方法，包括以下步骤：对形成包含硅衬底和部分掩蔽的金属膜的掩模硅片的硅片进行光刻处理; 将掩蔽的硅片浸入蚀刻剂中; 在蚀刻剂中旋转掩模的硅片; 将高纯度氮气注入蚀刻剂以搅拌蚀刻剂; 蚀刻完成后将掩模的硅片从蚀刻剂上除去; 并用去离子水冲洗掩蔽的硅片。