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公开(公告)号：US5025570A
公开(公告)日：1991-06-25
申请号：US600530
申请日：1990-10-19
申请人： William A. Moffat
发明人： William A. Moffat
CPC分类号： H01L21/67109 , F26B21/003 , F26B21/14 , F26B25/06
摘要： An oven employing a group of identical modular oven units, each unit divided into a main cavity with a first upper auxiliary chamber and a second lower auxiliary chamber. A barrier plate separating the upper chamber from the main cavity is gas pervious and serves as a filter to separate micron size particles and larger from entering the main chamber as the particles are carried by heated inert gas or air passing into the main cavity. The barrier plate separating the lower chamber from the main cavity is also gas pervious and serves as a sink to adsorb particles of sizes up to 100 microns. The group of modular ovens is partially surrounded by a heat transfer wall which allows heat to be rejected from the modular ovens and removed by a fluid coolant in contact with the wall.
摘要翻译： 使用一组相同的模块化烤箱单元的烘箱，每个单元分成具有第一上辅助室和第二下辅助室的主腔。 将上室与主腔分开的隔板是透气性的，并且用作过滤器以分离微米尺寸的颗粒，并且当颗粒被加热的惰性气体或空气通入主腔中时，进入主室。 将下腔室与主腔分离的隔板也是气体可透过的，并且用作吸收器以吸附尺寸高达100微米的颗粒。 一组模块化烤箱被传热壁部分地包围，其允许热量从模块化烤箱中排出并且通过与壁接触的流体冷却剂除去。
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2.发明授权公开(公告)号：US08252375B2
公开(公告)日：2012-08-28
申请号：US11148543
申请日：2005-06-08
IPC分类号： C23C16/00
CPC分类号： B05D1/60
摘要： A process for the coating of substrates comprising insertion of a substrate into a process oven, plasma cleaning of the substrate, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a gas plasma generator, a metered chemical withdrawal subsystem, and a vaporization subsystem.
摘要翻译： 一种用于涂覆基材的方法，包括将基材插入工艺烘箱，基板的等离子体清洗，基板的脱水，从一个或多个化学储存器中取出计量的一种或多种化学品，将取出的化学品蒸发 一个或多个蒸气室，并将蒸发的化学品转移到工艺烘箱中，从而与基底反应。 一种用于涂覆基材的设备，包括工艺烘箱，气体等离子体发生器，计量化学清除子系统和蒸发子系统。
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3.发明授权Method for efficient coating of substrates including plasma cleaning and dehydration 有权用于有效涂覆基材的方法，包括等离子体清洗和脱水公开(公告)号：US08361548B2
公开(公告)日：2013-01-29
申请号：US12229307
申请日：2008-08-20
CPC分类号： B05D1/60
摘要： A process for the coating of substrates comprising insertion of a substrate into a process oven, plasma cleaning of the substrate, rehydration of the substrate, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a gas plasma generator, a metered chemical withdrawal subsystem, and a vaporization subsystem.
摘要翻译： 一种用于涂覆基材的方法，包括将基材插入工艺烘箱，基板的等离子体清洗，基材的再水化，基材脱水，从一个或多个化学储存器中取出计量的一种或多种化学品， 在一个或多个蒸气室中蒸发所取出的化学物质，并将蒸发的化学物质转移到工艺烘箱中，从而与衬底反应。 一种用于涂覆基材的设备，包括工艺烘箱，气体等离子体发生器，计量化学清除子系统和蒸发子系统。
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公开(公告)号：US06267075B1
公开(公告)日：2001-07-31
申请号：US09350322
申请日：1999-07-09
IPC分类号： C23C16509
CPC分类号： B08B7/0035 , H01L21/67028
摘要： A plasma cleaning apparatus for cleaning lead frames or other items comprised of a chamber adapted for containing a plasma, a magazine positioned in the chamber for holding the lead frames, a first active electrode positioned in the chamber on one side of the magazine and a second active electrode positioned in the chamber on the other side of the magazine. A first grounded electrode is positioned between the first active electrode and the magazine and a second grounded electrode is positioned between the second active electrode and the magazine. The magazine is held at the same voltage as the first and second active electrodes and a plasma is generated which extends from the first active electrode to the second active electrode.
摘要翻译： 一种用于清洁引线框架或其他物品的等离子体清洁装置，其包括适于容纳等离子体的腔室，定位在腔室中用于保持引线框架的盒子，位于盒体一侧的腔室中的第一有效电极， 有源电极位于盒的另一侧的腔室中。 第一接地电极定位在第一有源电极和盒之间，并且第二接地电极位于第二有源电极和盒之间。 保持盒与第一和第二有源电极相同的电压，并且产生从第一有源电极延伸到第二有源电极的等离子体。
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5.发明申请Apparatus for the Efficient Coating of Subtrates Including Plasma Cleaning 审中-公开用于包括等离子体清洁的底物的高效涂层的装置公开(公告)号：US20130000557A1
公开(公告)日：2013-01-03
申请号：US13487521
申请日：2012-06-04
IPC分类号： C23C16/50 , C23C16/505
CPC分类号： B05D1/60
摘要： A process for the coating of substrates comprising insertion of a substrate into a process oven, plasma cleaning of the substrate, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a gas plasma generator, a metered chemical withdrawal subsystem, and a vaporization subsystem.
摘要翻译： 一种用于涂覆基材的方法，包括将基材插入工艺烘箱，基板的等离子体清洗，基板的脱水，从一个或多个化学储存器中取出计量的一种或多种化学品，将取出的化学品蒸发 一个或多个蒸气室，并将蒸发的化学品转移到工艺烘箱中，从而与基底反应。 一种用于涂覆基材的设备，包括工艺烘箱，气体等离子体发生器，计量化学清除子系统和蒸发子系统。
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6.发明申请Method for efficient coating of substrates including plasma cleaning and dehydration 有权用于有效涂覆基材的方法，包括等离子体清洗和脱水公开(公告)号：US20100203260A1
公开(公告)日：2010-08-12
申请号：US12229307
申请日：2008-08-20
CPC分类号： B05D1/60
摘要： A process for the coating of substrates comprising insertion of a substrate into a process oven, plasma cleaning of the substrate, rehydration of the substrate, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a gas plasma generator, a metered chemical withdrawal subsystem, and a vaporization subsystem.
摘要翻译： 一种用于涂覆基材的方法，包括将基材插入工艺烘箱，基板的等离子体清洗，基材的再水化，基材脱水，从一个或多个化学储存器中取出计量的一种或多种化学品， 在一个或多个蒸气室中蒸发所取出的化学物质，并将蒸发的化学物质转移到工艺烘箱中，从而与衬底反应。 一种用于涂覆基材的设备，包括工艺烘箱，气体等离子体发生器，计量化学清除子系统和蒸发子系统。
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公开(公告)号：US06198075B1
公开(公告)日：2001-03-06
申请号：US09449062
申请日：1999-11-24
申请人： William A. Moffat
发明人： William A. Moffat
IPC分类号： F27B514
CPC分类号： H01L21/67109 , C30B31/10
摘要： An oven for processing semiconductor wafers comprised of a first cylindrical canister, a second cylindrical canister that surrounds the first canister, and a third cylindrical canister that surrounds the second canister. The first canister is comprised of thin stainless steel so that it can be heated and cooled rapidly by band heaters positioned around its exterior. The second canister is comprised of stainless that it thermally insulates the first canister. The third canister is comprised of stainless steel that is thicker than the second canister so that the third canister can hold a sufficient vacuum for processing the wafers.
摘要翻译： 一种用于处理半导体晶片的烤箱，包括第一圆柱形罐，围绕第一罐的第二圆柱形罐和围绕第二罐的第三圆柱形罐。 第一罐由薄不锈钢组成，使其可以通过围绕其外部的带式加热器快速加热和冷却。 第二罐由不锈钢组成，它使第一罐热绝缘。 第三罐由比第二罐更厚的不锈钢组成，使得第三罐可以保持足够的真空来处理晶片。
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公开(公告)号：US5171393A
公开(公告)日：1992-12-15
申请号：US737455
申请日：1991-07-29
申请人： William A. Moffat
发明人： William A. Moffat
IPC分类号： H01L21/00 , H01L21/02 , H01L21/306
CPC分类号： H01L21/02054 , H01L21/67023 , H01L21/67207
摘要： A semiconductor wafer processing station comprising a plasma etching unit, a wet processing spin-spray unit, a robotic wafer transfer arm, and a central control computer all contained in a single housing. The apparatus is designed to perform manufacturing tasks especially related to photoresist processing: photoresist developing, descumming, baking and hardening, and stripping. The apparatus follows preprogrammed instructions which allow the station to automatically perform wafer processing routines by removing wafers from a storage cassette, then transferring the wafers to the processing unit with the robotic arm. Custom processing procedures are programmable, allowing practical small-scale low volume wafer development. Wafer processing routines envisioned include photoresist application and developing, plasma etching and descumming, and procedures involving multiple processing steps utilizing both the plasma/oven unit and the wet chemical spin-spray unit. Such routines would perform precision etching or serve to remove contaminants produced in the photoresist processing procedures.
摘要翻译： 一种半导体晶片处理站，包括等离子体蚀刻单元，湿式处理旋转喷射单元，机器人晶片传送臂和中央控制计算机，它们都包含在单个外壳中。 该设备被设计成执行与光致抗蚀剂处理特别相关的制造任务：光致抗蚀剂显影，除光，烘烤和硬化以及剥离。 该设备遵循预编程指令，其允许站通过从存储盒移除晶片来自动执行晶片处理程序，然后使用机器人臂将晶片传送到处理单元。 定制加工程序是可编程的，允许实际的小规模小批量晶圆开发。 设想的晶片处理程序包括光致抗蚀剂施加和显影，等离子体蚀刻和除尘，以及涉及使用等离子体/烘箱单元和湿式化学旋涂单元的多个处理步骤的程序。 这样的程序将执行精密蚀刻或用于去除在光致抗蚀剂加工程序中产生的污染物。
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公开(公告)号：US07727588B2
公开(公告)日：2010-06-01
申请号：US10656840
申请日：2003-09-05
CPC分类号： B05D1/60
摘要： A process for the coating of substrates comprising insertion of a substrate into a process oven, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a metered chemical withdrawal subsystem, and a vaporization subsystem.
摘要翻译： 一种用于涂覆基材的方法，包括将基材插入工艺烘箱，将基材脱水，从一个或多个化学储存器中取出计量的一种或多种化学品，将一个或多个蒸气室中排出的化学品汽化， 并将蒸发的化学品转移到工艺烘箱中，从而与基底反应。 一种用于涂覆基材的设备，包括工艺烘箱，计量化学清除子系统和蒸发子系统。
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