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1.发明授权Infrared sensitive photosensitive composition and lithographic plate fabricated by using same 有权红外敏感光敏组合物和使用它们制造的平版印刷版公开(公告)号：US08722309B2
公开(公告)日：2014-05-13
申请号：US13696802
申请日：2011-12-23
Applicant: Qinghai Yang , Fangqian Teng , Xiaowei Song , Hecheng Li , Zhaoyang Wu , Junjun Wu , Xiaohong Chen , Dongli Liu
Inventor： Qinghai Yang , Fangqian Teng , Xiaowei Song , Hecheng Li , Zhaoyang Wu , Junjun Wu , Xiaohong Chen , Dongli Liu
CPC classification number: G03F7/035 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/08 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , B41M3/06 , G03F7/033 , G03F7/0388 , G03F7/3035 , G03F7/3057 , Y10T428/24942 , Y10T428/31573
Abstract: An infrared sensitive and chemical treatment free photosensitive composition, includes, based on weight percentage, 30-70% of a water soluble thermally cross-linking resin, 1-20% of a water-soluble photocross-linking polymerized resin, 10-50% of a photopolymerizable oligomer, 1-30% of a multifunctional monomer, 1-20% of a cationic photopolymerization initiator, and 1-20% of an infrared irradiation absorption dye. The photosensitive composition of the present invention is useful for preparation of an infrared sensitive and chemical treatment free lithographic plate. The lithographic plate of the present invention has a high sensitivity and a good mesh point reduction, and after exposure to an infrared light source, can be printed directly after being washed with tapped water or without any washing and processing step, and has a long run length.
Abstract translation: 一种红外线敏感和化学处理的光敏组合物，以重量百分比计，含有30-70％的水溶性热交联树脂，1-20％的水溶性光交联聚合树脂，10-50％ 的可光聚合低聚物，1-30％的多官能单体，1-20％的阳离子光聚合引发剂和1-20％的红外辐射吸收染料。 本发明的光敏组合物可用于制备红外线敏感和无化学处理的平版印刷版。 本发明的平版印刷板具有高灵敏度和良好的网眼点降低，并且在暴露于红外光源之后，可以在用轻敲的水洗涤或没有任何洗涤和加工步骤之后直接印刷，并且具有长时间 长度。
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2.发明申请公开(公告)号：US20130052436A1
公开(公告)日：2013-02-28
申请号：US13696802
申请日：2011-12-23
Applicant: Qinghai Yang , Fangqian Teng , Xiaowei Song , Hecheng Li , Zhaoyang Wu , Junjun Wu , Xiaohong Chen , Dongli Liu
Inventor： Qinghai Yang , Fangqian Teng , Xiaowei Song , Hecheng Li , Zhaoyang Wu , Junjun Wu , Xiaohong Chen , Dongli Liu
CPC classification number: G03F7/035 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/08 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , B41M3/06 , G03F7/033 , G03F7/0388 , G03F7/3035 , G03F7/3057 , Y10T428/24942 , Y10T428/31573
Abstract: An infrared sensitive and chemical treatment free photosensitive composition, includes, based on weight percentage, 30-70% of a water soluble thermally cross-linking resin, 1-20% of a water-soluble photocross-linking polymerized resin, 10-50% of a photopolymerizable oligomer, 1-30% of a multifunctional monomer, 1-20% of a cationic photopolymerization initiator, and 1-20% of an infrared irradiation absorption dye. The photosensitive composition of the present invention is useful for preparation of an infrared sensitive and chemical treatment free lithographic plate. The lithographic plate of the present invention has a high sensitivity and a good mesh point reduction, and after exposure to an infrared light source, can be printed directly after being washed with tapped water or without any washing and processing step, and has a long run length.
Abstract translation: 一种红外线敏感和化学处理的光敏组合物，以重量百分比计，含有30-70％的水溶性热交联树脂，1-20％的水溶性光交联聚合树脂，10-50％ 的可光聚合低聚物，1-30％的多官能单体，1-20％的阳离子光聚合引发剂和1-20％的红外辐射吸收染料。 本发明的光敏组合物可用于制备红外线敏感和无化学处理的平版印刷版。 本发明的平版印刷板具有高灵敏度和良好的网眼点降低，并且在暴露于红外光源之后，可以在用轻敲的水洗涤或没有任何洗涤和加工步骤之后直接印刷，并且具有长时间 长度。
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