公开(公告)号：US5247329A

公开(公告)日：1993-09-21

申请号：US813002

申请日：1991-12-24

申请人： Yoshitada Oshida ,  Toshiei Kurosaki ,  Akira Inagaki ,  Yoshihiko Aiba

发明人： Yoshitada Oshida ,  Toshiei Kurosaki ,  Akira Inagaki ,  Yoshihiko Aiba

IPC分类号： G03F1/44 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7023 ,  G03F7/70241

摘要： A projection type exposure apparatus and method comprising an exposure illumination light source, an exposure illumination system, a mask or reticle on which an original pattern to be projected on the exposed matter is drawn, an optical projection system, a stage for retaining the exposed matter and a mechanism for finely moving the stage along the exposure optical axis. The apparatus is provided with an exposure detection pattern area on the mask, detection illumination means for projecting on the exposure detection pattern area a light ray which is the same or almost the same in wavelength as exposure light having a desired directivity, exposure detection means for detecting the transmitted or reflected light diffracted by 1 degree after the light carrying the image formed on the exposed matter by the light passed through the above-noted optical projection system after projection by the detection illumination means onto the exposure pattern and then diffracted goes in reverse through the above-noted optical projection system and forms an image again on the exposure pattern on the above-noted mask and a control circuit for driving and controlling the above-noted fine movement mechanism by using the signal obtained by the exposure detection means.

摘要翻译： 一种投影式曝光装置和方法，包括曝光照明光源，曝光照明系统，掩模或掩模版，其上将要投射在暴露物体上的原始图案被拉出，光学投影系统，用于保持暴露物质的台 以及用于沿着曝光光轴精细地移动台的机构。 该设备在掩模上设置曝光检测图案区域，检测照明装置用于在曝光检测图案区域上投射与具有所需方向性的曝光光相同或几乎相同的波长的光线，曝光检测装置 在通过检测照明装置投影到曝光图案上之后，在通过上述光学投影系统的光在携带在曝光物体上形成的图像的光之后，将被发射或反射的光衍射1度，然后衍射反向 通过上述光学投影系统并在上述掩模上的曝光图案上再次形成图像，以及通过使用由曝光检测装置获得的信号来驱动和控制上述微动机构的控制电路。

公开(公告)号：US5153916A

公开(公告)日：1992-10-06

申请号：US688285

申请日：1991-04-22

申请人： Akira Inagaki ,  Masataka Shiba ,  Yoshihiko Aiba

发明人： Akira Inagaki ,  Masataka Shiba ,  Yoshihiko Aiba

IPC分类号： G02B7/36 ,  G02B7/28 ,  G03B27/34 ,  G03F1/44 ,  G03F1/76 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/66

CPC分类号： G03F7/70591 ,  G03F7/70641 ,  G03F9/70

摘要： A method and apparatus measures an image plane of a test pattern projected onto a surface of a sample disposed on a stage to precisely detect the image plane to thereby obtain a precise alignment therebetween for subsequent exposure. The test pattern is provided on a member having a conjugate surface with an upper surface of an illumination detecting unit having at least three optical sensors at different positions thereof and disposed on the stage. The upper surface of the illumination detecting unit has an analogous pattern to the test pattern on each optical sensor and, by moving the stage three dimensionally, outputs of the optical sensors are processed to obtain amounts of light and peak values thereof from which the image plane is obtained.

摘要翻译： 一种方法和装置测量投影到设置在台架上的样品表面上的测试图案的图像平面，以精确地检测图像平面，从而在其间获得精确的对准以用于随后的曝光。 测试图案设置在具有共轭表面的构件上，照明检测单元的上表面在其不同位置处具有至少三个光学传感器并且设置在平台上。 照明检测单元的上表面具有与每个光学传感器上的测试图案类似的图案，并且通过三维地移动台，对光学传感器的输出进行处理，以获得其光像和峰值的量， 获得。