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公开(公告)号：US20230185208A1
公开(公告)日：2023-06-15
申请号：US18062080
申请日：2022-12-06
Applicant: CANON KABUSHIKI KAISHA
Inventor： SATORU JIMBO , KAZUHIKO MISHIMA
CPC classification number: G03F9/7088 , G03F9/7023 , G06T7/001 , G06T7/74 , G06T2207/20081 , G06T2207/30148 , G06T2207/30204
Abstract: A measurement apparatus that measures position information of a measurement target is provided. The apparatus includes a scope configured to generate an image by capturing an image of the measurement target, and a processor configured to obtain position information of the measurement target based on the image. The processor is configured to generate a plurality of image components using a statistical technique from a plurality of images generated by the scope, output the plurality of generated image components, perform processing based on the plurality of image components, and determine the position information based on a result of the processing.
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公开(公告)号：US20230152089A1
公开(公告)日：2023-05-18
申请号：US18098215
申请日：2023-01-18
Applicant: Carl Zeiss SMT GmbH
Inventor： Christof Baur , Tilo Sielaff , Arne Adams
CPC classification number: G01B15/00 , G01B11/0608 , G03F9/7088 , G03F9/7023
Abstract: The present invention relates to a method for determining an alignment of a photomask on a sample stage which is displaceable along at least one axis that is parallel to a chuck surface of the sample stage, and is rotatable about at least one axis that is perpendicular to the chuck surface, which method comprises the following step:
rotating the sample stage by a predefined angle and measuring a height change of the photomask during rotation at a predetermined, non-vanishing distance with respect to the rotation axis for the purpose of determining the alignment of the photomask on the sample stage.-
3.发明授权Imprint apparatus in which alignment control of a mold and a substrate is effected 有权对模具和基板进行对准控制的压印装置公开(公告)号：US09579843B2
公开(公告)日：2017-02-28
申请号：US13804973
申请日：2013-03-14
Applicant: CANON KABUSHIKI KAISHA
Inventor： Shingo Okushima , Nobuhito Suehira , Junichi Seki , Kazuyuki Kasumi
CPC classification number: G03F7/0002 , B05C11/00 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F9/7023 , G03F9/703 , G03F9/7042
Abstract: An imprint apparatus performs alignment control of a mold and a substrate. A pattern formed on the mold is transferred onto a pattern forming layer on the substrate. A mold holding portion holds the mold, a substrate holding portion holds the substrate, and a control portion effects control so that the mold and the substrate are brought near to each other during the alignment control. The mold and the pattern forming layer are brought into contact with each other and then the pattern forming layer is cured. The control portion changes a driving profile for the alignment control after the alignment control is started and at least one of before and after the mold contacts the pattern forming layer. The driving profile used to move at least one of the mold holding portion and the substrate holding portion to a target position, and includes at least one of acceleration, speed, driving voltage, and driving current.
Abstract translation: 压印装置执行模具和基板的对准控制。 在模具上形成的图案被转印到基板上的图案形成层上。 模具保持部保持模具，基板保持部保持基板，并且控制部分进行控制，使得模具和基板在对准控制期间彼此靠近。 模具和图案形成层彼此接触，然后图案形成层固化。 在开始对准控制之后，控制部分改变对准控制的驱动轮廓，并且在模具接触图形形成层之前和之后的至少一个。 用于将模具保持部分和基板保持部分中的至少一个移动到目标位置的驱动轮廓，并且包括加速度，速度，驱动电压和驱动电流中的至少一个。
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4.发明授权Imprinting method and process for producing a member in which a mold contacts a pattern forming layer 有权用于制造其中模具与图案形成层接触的构件的印刷方法和方法公开(公告)号：US09573319B2
公开(公告)日：2017-02-21
申请号：US12088340
申请日：2008-02-05
Applicant: Shingo Okushima , Nobuhito Suehira , Junichi Seki , Kazuyuki Kasumi
Inventor： Shingo Okushima , Nobuhito Suehira , Junichi Seki , Kazuyuki Kasumi
CPC classification number: G03F7/0002 , B05C11/00 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F9/7023 , G03F9/703 , G03F9/7042
Abstract: An imprinting method in which alignment control of a mold and a substrate is effected and a pattern formed on the mold is transferred onto a pattern forming layer provided on the substrate. The imprinting method includes a step in which the mold and the substrate are brought near to each other while effecting the alignment control, after the alignment control is started, to bring the mold and the pattern forming layer into contact with each other, and then, the pattern forming layer is cured, and a step in which the gap between the mold and the substrate is increased, after the pattern forming layer is cured. Further, the alignment control is stopped after the alignment control is started, and at least one of before and after the mold contacts the pattern forming layer.
Abstract translation: 实现了模具和基板的对准控制并且在模具上形成的图案转印到设置在基板上的图案形成层上的压印方法。 压印方法包括在进行取向控制的同时使模具和基板彼此靠近的步骤，在对准控制开始之后，使模具和图案形成层彼此接触，然后， 图案形成层被固化，并且在图案形成层固化之后，模具和基板之间的间隙增加的步骤被增加。 此外，在开始对准控制之后停止对准控制，并且在模具接触图案形成层之前和之后的至少一个。
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5.发明授权公开(公告)号：US07846624B2
公开(公告)日：2010-12-07
申请号：US11676959
申请日：2007-02-20
Applicant: Adlai H. Smith , Robert O. Hunter, Jr.
Inventor： Adlai H. Smith , Robert O. Hunter, Jr.
CPC classification number: G03F9/7023 , G03B27/68 , G03F7/70083 , G03F7/70191 , G03F7/705 , G03F7/70633 , G03F7/70641
Abstract: An apparatus and method for the simultaneous determination of focus and source boresighting error for photolithographic steppers and scanners is described. A reticle containing custom arrays of box-in-box test structures specifically designed for performing source or exit pupil division using an aperture plate is exposed onto a resist coated wafer several times. The resulting exposure patterns are measured with a conventional overlay tool. The overlay data is processed with a slope-shift algorithm for the simultaneous determination of both focus and source telecentricity as a function of field position. Additionally, methods for ameliorating metrology induced effects and methods for producing precision Bossung curves are also described. This Abstract is provided for the sole purpose of complying with the Abstract requirement rules, it shall not be used to interpret or to limit the scope or the meaning of the claims.
Abstract translation: 描述了用于光刻步进机和扫描仪同时确定焦距和光源瞄准误差的装置和方法。 包含专门设计用于使用孔板执行光源或出射光瞳划分的盒装盒测试结构的定制阵列的掩模版被暴露在抗蚀剂涂覆的晶片上多次。 所得到的曝光图案用传统的覆盖工具测量。 覆盖数据用斜率移位算法处理，用于同时确定作为场位置的函数的焦点和源远心。 此外，还描述了用于改善计量学诱导效应的方法和用于产生精确Bossung曲线的方法。 本摘要仅用于遵守抽象要求规则，不得用于解释或限制权利要求的范围或含义。
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Patent Agency Ranking
公开(公告)号：US20100270705A1
公开(公告)日：2010-10-28
申请号：US12088340
申请日：2008-02-05
Applicant: Shingo Okushima , Nobuhito Suehira , Junichi Seki , Kazuyuki Kasumi
Inventor： Shingo Okushima , Nobuhito Suehira , Junichi Seki , Kazuyuki Kasumi
CPC classification number: G03F7/0002 , B05C11/00 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F9/7023 , G03F9/703 , G03F9/7042
Abstract: An imprint method for imprinting an imprint pattern provided to a mold onto a pattern forming layer formed on a substrate is constituted by a first step of effecting alignment between the substrate and the mold with feedback control; a second step of bringing the mold and the pattern forming layer into contact with each other; a third step of curing the pattern forming layer; and a fourth step of increasing a gap between the substrate and the mold. The imprint method further includes a step of stopping the feedback control between the first step and the second step and/or between the second step and the third step.
Abstract translation: 用于将提供给模具的印模图案压印到形成在基板上的图案形成层上的印记方法由通过反馈控制来实现基板和模具之间的对准的第一步骤构成; 使模具和图案形成层彼此接触的第二步骤; 固化图案形成层的第三步骤; 以及增加基板和模具之间的间隙的第四步骤。 压印方法还包括停止第一步骤和第二步骤之间和/或在第二步骤和第三步骤之间的反馈控制的步骤。
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7.发明授权Immersion lithography proximity sensor having a nozzle shroud with flow curtain 失效浸没光刻接近传感器具有带流幕的喷嘴罩公开(公告)号：US07140233B2
公开(公告)日：2006-11-28
申请号：US11353007
申请日：2006-02-14
Applicant: Herman Vogel
Inventor： Herman Vogel
IPC: G01B13/08
CPC classification number: G03F7/70933 , G03F7/70341 , G03F9/7023
Abstract: The present invention is directed to an immersion lithography proximity sensor having a nozzle shroud with a flow curtain. The immersion lithography proximity sensor includes a shroud that affixes to the nozzle. A plenum is located inside the shroud that holds a shroud liquid, which is fed into the plenum through one or more intake holes. The shroud liquid is emitted out through a series of openings, such as holes or slots, along a bottom surface of the shroud in a direction away from the nozzle. The shroud liquid that is emitted forms a curtain around the nozzle to prevent cross currents from impacting the flow of liquid out of the nozzle.
Abstract translation: 本发明涉及一种具有带流幕的喷嘴罩的浸没式光刻接近传感器。 浸没光刻接近传感器包括固定在喷嘴上的护罩。 一个充气室位于护罩内，其中保持了一个护罩液体，该护罩液体通过一个或多个进气孔进入通气室。 护罩液体沿远离喷嘴的方向沿护罩的底表面通过一系列开口（例如孔或狭槽）排出。 被排出的护罩液体围绕喷嘴形成帘子，以防止交叉电流撞击喷嘴流出液体。
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公开(公告)号：US20030184719A1
公开(公告)日：2003-10-02
申请号：US10402978
申请日：2003-04-01
Applicant: Canon Kabushiki Kaisha
Inventor： Shinichi Shima , Kohei Maeda
IPC: G03B027/68
CPC classification number: G03F9/7003 , G03F7/703 , G03F7/70308 , G03F7/70358 , G03F9/7023
Abstract: An exposure apparatus includes a projection optical system for projecting a pattern formed a mask onto an object to be exposed, a correction optical element, provided between the mask and the projection optical system, for reducing a deformation of the pattern, and a detector of an oblique light projection system, provided at a side of a pattern surface of the mask, for detecting a surface shape of the mask through the correction optical element.
Abstract translation: 曝光装置包括投影光学系统，用于将形成掩模的图案投射到待曝光的物体上，设置在掩模和投影光学系统之间的校正光学元件，用于减小图案的变形;以及检测器 倾斜光投射系统，设置在掩模的图案表面的一侧，用于通过校正光学元件检测掩模的表面形状。
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公开(公告)号：US5272980A
公开(公告)日：1993-12-28
申请号：US752010
申请日：1991-08-29
Applicant: Satoshi Takeuchi , Kenji Asaka
Inventor： Satoshi Takeuchi , Kenji Asaka
CPC classification number: G03F9/7023 , G03F9/00 , H01L21/681 , H05K3/0079 , H05K1/0269 , H05K2201/09918 , Y10S101/36
Abstract: While a pattern side register mark provided on a pattern transferring plate provided with a transfer pattern and a work side register mark provided on a work are optically observed by means of an observation optical system, at least one of the pattern transferring plate and a work surface plate carrying thereon the work is moved in a non-contact state in accordance with information provided by the observation optical system to effect registration between the transfer pattern and the work, so that the pattern transferring plate is pressed to the work thereby to transfer the transfer pattern onto the work.
Abstract translation: 虽然通过观察光学系统光学地观察设置在设置有工件的转印图案和工件侧对准标记的图案转印板上的图案侧对准标记，但是至少一个图案转印板和工作表面 携带工件的板根据观察光学系统提供的信息在非接触状态下移动，以实现转印图案和工件之间的对准，使得图案转印板被压到工件上，从而转印转印 模式上的工作。
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10.发明授权Alignment and exposure apparatus and method for manufacture of integrated circuits 失效对准和曝光装置及集成电路的制造方法
公开(公告)号：US5050111A
公开(公告)日：1991-09-17
申请号：US542653
申请日：1990-06-25
Applicant: Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
Inventor： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
CPC classification number: G03F9/7088 , G03F7/70058 , G03F7/70725 , G03F9/7023 , G03F9/7057
Abstract: An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, an alignment apparatus includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.
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