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1.发明授权Large-area shower electron beam irradiator with field emitters as an electron source 失效大面积淋浴电子束照射器，具有场发射体作为电子源公开(公告)号：US07671522B2
公开(公告)日：2010-03-02
申请号：US10591894
申请日：2005-03-09
申请人： Byung-Cheol Lee , Young-Kyung Lim , Young-Hwan Han , Young-Uk Jung , Seong-Hee Park , Cheol-Jin Lee , Tae-Jae Lee
发明人： Byung-Cheol Lee , Young-Kyung Lim , Young-Hwan Han , Young-Uk Jung , Seong-Hee Park , Cheol-Jin Lee , Tae-Jae Lee
摘要： An electron beam irradiator capable of performing electron beam irradiation in a wide area at a high current density with a field emitter tip. The electron beam irradiator comprises: a vacuum chamber having a beam irradiation window formed longitudinally in an outer periphery of the vacuum chamber; a cathode placed centrally and longitudinally inside the vacuum chamber, and having a field emitter tip formed on the cathode, corresponding to the beam irradiation window; and a high voltage supply placed at one end of the vacuum chamber, and adapted to apply high voltage toward the cathode. The electron beam irradiation can be made in a wide area without using an electromagnet as well as in a high current density without using a heater such as a filament or an additional power supply, thereby to ensure a simplified structure as well as a reduced size.
摘要翻译： 一种电子束照射器，其能够利用场发射器尖端以高电流密度在广泛的区域中进行电子束照射。 电子束照射器包括：真空室，具有在真空室的外周纵向形成的光束照射窗口; 阴极，位于真空室的中央并纵向放置，并且具有形成在阴极上的对应于光束照射窗的场发射极尖端; 以及设置在真空室的一端的高压电源，并且适于向阴极施加高电压。 电子束照射可以在不使用电磁体以及高电流密度的情况下在广泛的区域进行，而不使用诸如灯丝或附加电源的加热器，从而确保简化的结构以及减小的尺寸。
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2.发明申请Large-Area Shower Electron Beam Irradiator With Field Emitters As An Electron Source 失效大面积淋浴电子束辐射器作为电子源的场发射器公开(公告)号：US20070278928A1
公开(公告)日：2007-12-06
申请号：US10591894
申请日：2005-03-09
申请人： Byung-Cheol Lee , Young-Kyung Lim , Young-Hwan Han , Young-Uk Jung , Seong-Hee Park , Cheol-Jin Lee , Tae-Jae Lee
发明人： Byung-Cheol Lee , Young-Kyung Lim , Young-Hwan Han , Young-Uk Jung , Seong-Hee Park , Cheol-Jin Lee , Tae-Jae Lee
IPC分类号： H01J31/02
摘要： An electron beam irradiator capable of performing electron beam irradiation in a wide area at a high current density with a field emitter tip. The electron beam irradiator comprises: a vacuum chamber having a beam irradiation window formed longitudinally in an outer periphery of the vacuum chamber; a cathode placed centrally and longitudinally inside the vacuum chamber, and having a field emitter tip formed on the cathode, corresponding to the beam irradiation window; and a high voltage supply placed at one end of the vacuum chamber, and adapted to apply high voltage toward the cathode. The electron beam irradiation can be made in a wide area without using an electromagnet as well as in a high current density without using a heater such as a filament or an additional power supply, thereby to ensure a simplified structure as well as a reduced size.
摘要翻译： 一种电子束照射器，其能够利用场发射器尖端以高电流密度在广泛的区域中进行电子束照射。 电子束照射器包括：真空室，具有在真空室的外周纵向形成的光束照射窗口; 阴极，位于真空室的中央并纵向放置，并且具有形成在阴极上的对应于光束照射窗的场发射极尖端; 以及设置在真空室的一端的高压电源，并且适于向阴极施加高电压。 电子束照射可以在不使用电磁体以及高电流密度的情况下在广泛的区域进行，而不使用诸如灯丝或附加电源的加热器，从而确保简化的结构以及减小的尺寸。
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3.发明申请Method of Curing Color Filter for Electronic Display Using Electron-Beam and Method of Fabricating Color Filter for Electronic Display Using the Same 有权使用电子束固化电子显示器的彩色滤光片的方法和使用该电子显示器的彩色滤光片的制造方法公开(公告)号：US20100104957A1
公开(公告)日：2010-04-29
申请号：US12362514
申请日：2009-01-30
申请人： Jeong Seog Kim , Chae Il Cheon , Jung Min Cho , Kyoung Ho Lee , Young Hwan Han , Byoung Cheol Lee
发明人： Jeong Seog Kim , Chae Il Cheon , Jung Min Cho , Kyoung Ho Lee , Young Hwan Han , Byoung Cheol Lee
IPC分类号： G03F1/00
CPC分类号： G02B5/201 , G02B5/223 , G03F7/0007 , G03F7/027 , G03F7/2037 , G03F7/40
摘要： Disclosed herein is a method of curing a color filter for an electronic display using an electron beam at low temperature. A conventional method of curing the color filter by thermal-heating is not suitable for a process of fabricating next generation flexible displays. In the method of the invention, after a color resist pattern is formed on a substrate, the resist is cured by an electron beam at 100° C. or less. Hence, the method can minimize damage of the substrate while facilitating dimension control of the color pattern and achieving precision of a fine pattern. A method of fabricating a color filter for an electronic display using the method is also disclosed.
摘要翻译： 本文公开了一种使用电子束在低温下固化用于电子显示器的滤色器的方法。 通过热加热固化滤色器的常规方法不适用于制造下一代柔性显示器的工艺。 在本发明的方法中，在基板上形成抗彩图案之后，抗蚀剂通过100℃以下的电子束固化。 因此，该方法可以最小化衬底的损伤，同时有利于颜色图案的尺寸控制并实现精细图案的精度。 还公开了使用该方法制造用于电子显示器的滤色器的方法。
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4.发明授权Method of curing color filter for electronic display using electron-beam and method of fabricating color filter for electronic display using the same 有权使用电子束固化用于电子显示器的滤色器的方法和使用其制造用于电子显示器的滤色器的方法公开(公告)号：US08168353B2
公开(公告)日：2012-05-01
申请号：US12362514
申请日：2009-01-30
申请人： Jeong Seog Kim , Chae Il Cheon , Jung Min Cho , Kyoung Ho Lee , Young Hwan Han
发明人： Jeong Seog Kim , Chae Il Cheon , Jung Min Cho , Kyoung Ho Lee , Young Hwan Han
IPC分类号： G02B5/20
CPC分类号： G02B5/201 , G02B5/223 , G03F7/0007 , G03F7/027 , G03F7/2037 , G03F7/40
摘要： Disclosed herein is a method of curing a color filter for an electronic display using an electron beam at low temperature. A conventional method of curing the color filter by thermal-heating is not suitable for a process of fabricating next generation flexible displays. In the method of the invention, after a color resist pattern is formed on a substrate, the resist is cured by an electron beam at 100° C. or less. Hence, the method can minimize damage of the substrate while facilitating dimension control of the color pattern and achieving precision of a fine pattern. A method of fabricating a color filter for an electronic display using the method is also disclosed.
摘要翻译： 本文公开了一种使用电子束在低温下固化用于电子显示器的滤色器的方法。 通过热加热固化滤色器的常规方法不适用于制造下一代柔性显示器的工艺。 在本发明的方法中，在基板上形成抗彩图案之后，抗蚀剂通过100℃以下的电子束固化。 因此，该方法可以最小化衬底的损伤，同时有利于颜色图案的尺寸控制并实现精细图案的精度。 还公开了使用该方法制造用于电子显示器的滤色器的方法。
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