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公开(公告)号:US08749756B2
公开(公告)日:2014-06-10
申请号:US13361545
申请日:2012-01-30
申请人: Yuri Johannes Gabrial Van De Vijver , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski , Tjarko Adriaan Rudolf Van Empel
发明人: Yuri Johannes Gabrial Van De Vijver , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski , Tjarko Adriaan Rudolf Van Empel
CPC分类号: G03F7/70033 , B82Y10/00 , G03F7/70841 , G03F7/70908 , G03F7/70916 , G03F7/70933 , H05G2/003 , H05G2/008
摘要: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.
摘要翻译: 公开了一种光刻设备,用于将图案从图案形成装置突出到衬底上。 光刻设备包括照明系统和连接到泵送系统的出口,以从照明系统的内壁和外壁之间泵送气体,或者如果存在辐射源,则在照明系统的内壁和 辐射源的内壁。