公开(公告)号：US20130105331A1

公开(公告)日：2013-05-02

申请号：US13808391

申请日：2011-06-30

申请人： Dongping Zhan ,  Kang Shi ,  Zhongqun Tian ,  Jianzhang Zhou ,  Zhaowu Tian ,  Lianhuan Han ,  Jing Tang

发明人： Dongping Zhan ,  Kang Shi ,  Zhongqun Tian ,  Jianzhang Zhou ,  Zhaowu Tian ,  Lianhuan Han ,  Jing Tang

IPC分类号： C25F3/14

CPC分类号： C25F3/14 ,  C03C15/02 ,  C25F3/00 ,  C25F3/12 ,  C25F7/00 ,  H01L21/02024 ,  H01L21/30604 ,  H01L21/30612 ,  H01L21/32115 ,  H01L21/7684

摘要： The present invention provides a nano-presion photo/electrochemical planarization and polishing method and an apparatus therefor. The method comprises through electrochemical, photochemical or photoelectrochemical means, an etchant being generated on a surface of a tool electrode which has a nanometer-sized planeness; the generated etchant reacting with a scavenger contained in an working electrolyte solution, or decaying itself in the working electrolyte solution, such that a confined etchant liquid layer is generated on the tool electrode surface and having a confined thickness of nanoscale; and by a chemical reaction between the etchant contained in the confined etchant liquid layer and a surface of a workpiece, the surface of the workpiece being polished or planarized to a nanometer scaled profile precision and surface roughness, thereby, realizing the planarization and polishing in nano-precision for the workpiece.

摘要翻译： 本发明提供一种纳米级光电/电化学平面化和抛光方法及其装置。 该方法包括通过电化学，光化学或光电化学手段，在具有纳米级平面度的工具电极的表面上产生蚀刻剂; 生成的蚀刻剂与工作电解质溶液中所含的清除剂反应，或者在工作电解质溶液中自身衰退，使得在工具电极表面上产生局限的蚀刻剂液体层，并具有限定的纳米级厚度; 并且通过包含在限定的蚀刻剂液体层中的蚀刻剂与工件的表面之间的化学反应，将工件的表面抛光或平面化成纳米尺度的轮廓精度和表面粗糙度，从而实现纳米级的平坦化和抛光 - 工件精度。