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公开(公告)号:US20250028241A1
公开(公告)日:2025-01-23
申请号:US18589501
申请日:2024-02-28
Inventor: Benjamin LUND , Jesse HUFFSTETLER , Daniel ZAMORANO , Sushanta DAS , Crystal NIERMANN , Caleb LUND , Amy NGUYEN , Yili WU , Walter VOIT
IPC: G03F7/00 , B33Y70/00 , B33Y70/10 , B33Y80/00 , C08F2/44 , C08F220/18 , C08F220/56 , C08F222/08 , G03F7/004 , G03F7/027 , G03F7/029 , G03F7/105
Abstract: The present disclosure relates to thiol-acrylate photopolymerizable resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing in an oxygen environment, the resin comprising: a crosslinking component; at least one monomer and/or oligomer; and a chain transfer agent comprising at least one of a thiol, a secondary alcohol, and/or a tertiary amine, wherein the resin may be configured to react by exposure to light to form a cured material.