公开(公告)号：US11373836B2

公开(公告)日：2022-06-28

申请号：US16966908

申请日：2018-12-27

Applicant: 38th Research Institute, China Electronics Technology Group Corporation

Inventor： Xuehui Wang ,  Junting Wang ,  Xianbin Hu ,  Dizhi Chen ,  Guang Tang ,  Huarong Liu ,  Lei Zheng ,  Qing Qian ,  Chunning Zheng ,  Guochao Wang

IPC: H01J37/073 ,  H01J37/065 ,  H01J3/02

Abstract: The present disclosure provides a method of manufacturing an electron source. The method includes forming one or more fixed emission sites on at least one needle tip, the fixed emission sites including a reaction product formed by metal atoms on a surface of the needle tip and gas molecules.

公开(公告)号：US11189453B2

公开(公告)日：2021-11-30

申请号：US16966907

申请日：2018-12-26

Applicant: 38th Research Institute, China Electronics Technology Group Corporation

Inventor： Huarong Liu ,  Junting Wang ,  Xuehui Wang ,  Yuxuan Qi ,  Xianbin Hu ,  Xueming Jin ,  Zhao Huang ,  Dizhi Chen ,  Yijing Li ,  Youyin Deng

IPC: H01J37/073 ,  H01J3/02 ,  H01J37/065 ,  H01J37/07

Abstract: The present disclosure provides an electron source, including one or more tips, wherein at least one of the tips comprises one or more fixed emission sites, wherein at least one of the tips includes one or more fixed emission sites, wherein the emission sites includes a reaction product of metal atoms on a surface of the tip with gas molecules.