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公开(公告)号:US20190276329A1
公开(公告)日:2019-09-12
申请号:US16302448
申请日:2017-05-19
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor: Tilman C. Zipplies , Klaus Hintzer , Monika A. Willert-Porada , Achim Schmidt-Rodenkirchen , Thomas F. Berger , Thorsten Gerdes , Christoph Schymura , Andreas P. Spiewok
Abstract: A process for generating calcium fluoride particles having a particle size (d50) of from about 15 μm to about 300 μm. The process features contacting a gas stream having gaseous hydrogen fluoride (HF) with a fluidized bed of calcium carbonate particles in a fluidized bed reactor.
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公开(公告)号:US10358402B2
公开(公告)日:2019-07-23
申请号:US15516124
申请日:2015-09-30
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor: Tilman C. Zipplies , Klaus Hintzer , Monika A. Willert-Porada , Thorsten Gerdes , Jens Herdegen , Achim Schmidt-Rodenkirchen , Stephan Aschauer
IPC: C07C17/361 , C07C17/23 , B01J19/12 , B01J19/08 , C07C21/185
Abstract: Provided is a process for producing fluorinated alkenes by providing a microwave plasma in a reactor chamber, introducing a protective gas feed into the reactor chamber, and contacting a conversion feed comprising at least one fluorinated linear or branched alkane with the plasma. Also provided are an apparatus and the use of the process and the apparatus.
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公开(公告)号:US20170305820A1
公开(公告)日:2017-10-26
申请号:US15516124
申请日:2015-09-30
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor: Tilman C. Zipplies , Klaus Hintzer , Monika A. Willert-Porada , Thorsten Gerdes , Jens Herdegen , Achim Schmidt-Rodenkirchen , Stephan Aschauer
IPC: C07C17/361 , B01J19/12
CPC classification number: C07C17/361 , B01J19/088 , B01J19/126 , B01J2219/0875 , B01J2219/0896 , B01J2219/1206 , B01J2219/1293 , C07C17/23 , C07C21/185 , C07C21/18
Abstract: Provided is a process for producing fluorinated alkenes by providing a microwave plasma in a reactor chamber, introducing a protective gas feed into the reactor chamber, and contacting a conversion feed comprising at least one fluorinated linear or branched alkane with the plasma. Also provided are an apparatus and the use of the process and the apparatus.
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