GRINDING WHEEL AND METHOD OF MANUFACTURING GRINDING WHEEL

    公开(公告)号:US20220080556A1

    公开(公告)日:2022-03-17

    申请号:US17416784

    申请日:2019-12-23

    Abstract: Object: To provide a grinding wheel and a method of manufacturing a grinding wheel having added value while providing a suppressed manufacturing cost. Solution Means: The grinding wheel is a grinding wheel including an abrasive portion including nonwoven fabric, wherein the abrasive portion includes an outer peripheral portion formed with the nonwoven fabric including abrasive grains on an outer peripheral side, and an inner peripheral portion formed with the nonwoven fabric not including the abrasive grains, and a ratio of a thickness in a radial direction of the outer peripheral portion to a thickness in a radial direction of the abrasive portion is from 3% to 60%.

    ABRASIVE MATERIAL HAVING A STRUCTURED SURFACE
    2.
    发明申请
    ABRASIVE MATERIAL HAVING A STRUCTURED SURFACE 审中-公开
    具有结构表面的磨料

    公开(公告)号:US20170008143A1

    公开(公告)日:2017-01-12

    申请号:US15113244

    申请日:2015-01-21

    CPC classification number: B24B37/26

    Abstract: To provide an abrasive material having a structured surface that is excellent in preventing adhesion and accumulation of foreign objects, and a manufacturing method thereof. The abrasive material of an embodiment of the present disclosure is an abrasive material having an abrasive layer with a structured surface with a plurality of three-dimensional elements arranged thereon, a surface treatment selected from the group consisting of fluoride treatment and silicon treatment being performed on at least a portion of the structured surface, and the fluoride treatment being selected from the group consisting of plasma treatment, chemical vapor deposition, physical vapor deposition, and fluorine gas treatment.

    Abstract translation: 提供具有优异的防止异物的附着和积聚的结构化表面的研磨材料及其制造方法。 本公开的实施方案的研磨材料是具有研磨层的研磨材料,所述研磨层具有布置在其上的多个三维元件的结构化表面,从由氟化物处理和硅处理组成的组中进行的表面处理在 所述结构化表面的至少一部分,所述氟化物处理选自等离子体处理,化学气相沉积,物理气相沉积和氟气处理。

    POLISHING PAD
    3.
    发明申请

    公开(公告)号:US20210370475A1

    公开(公告)日:2021-12-02

    申请号:US15733073

    申请日:2018-10-31

    Abstract: Object: Providing a polishing pad that is deformable with a smaller force. Solution: A polishing pad (1) according to an aspect of the invention includes a substrate (2) made of a piece of non-woven fabric. The substrate (2) has a flat-plate shape extending in a first direction perpendicular to a thickness direction and in a second direction perpendicular to both the thickness direction and the first direction. The substrate (2) is divided into a plurality of blocks (3) arranged in the second direction and each extending in the first direction. A boundary portion (4) extending in the first direction is formed between each pair of the blocks (3), and a plurality of slits (6) are formed in the boundary portion (4). Each of the slits (6) is formed through the substrate (2) in the thickness direction and extends in first direction. The plurality of slits (6) that exist in the boundary portion (4) are spaced apart from each other in the first direction. A pair of the blocks (3) that are next to each other in the second direction are connected to each other by a connection portion (7) formed between the slits (6).

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