公开(公告)号：US11667730B2

公开(公告)日：2023-06-06

申请号：US15629773

申请日：2017-06-22

Applicant: ADEKA CORPORATION

Inventor： Daisuke Sawamoto ,  Koichi Kimijima ,  Kiyoshi Murata ,  Yasunori Kozaki ,  Takeo Oishi

IPC: C08F2/50 ,  C07D209/88 ,  G03F7/004 ,  G03F7/031

CPC classification number: C08F2/50 ,  C07D209/88 ,  G03F7/0045 ,  G03F7/031

Abstract: An oxime ester compound represented by general formula (I):




wherein R1, R2, and R3 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, R4 and R5 each independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom, or a hydroxyl group; and a and b each independently represent 0 to 3.

公开(公告)号：US09594302B2

公开(公告)日：2017-03-14

申请号：US14381772

申请日：2013-03-05

Applicant: ADEKA CORPORATION

Inventor： Takeo Oishi ,  Koichi Kimijima ,  Nobuhide Tominaga ,  Hirokatsu Shinano ,  Daisuke Sawamoto ,  Kiyoshi Murata

IPC: G03F7/004 ,  C07D209/88 ,  C07D211/70 ,  C07D233/06 ,  C07D241/06 ,  C07D403/12 ,  C07D401/12 ,  C07D209/86 ,  G03F7/038

CPC classification number: G03F7/0045 ,  C07D209/86 ,  C07D209/88 ,  C07D211/70 ,  C07D233/06 ,  C07D241/06 ,  C07D401/12 ,  C07D403/12 ,  G03F7/038

Abstract: A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R5, R6, R7, R8, R9, R10, and R11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.

Abstract translation: 通式（1）中的符号如说明书中所定义。

公开(公告)号：US20150064623A1

公开(公告)日：2015-03-05

申请号：US14381772

申请日：2013-03-05

Applicant: ADEKA CORPORATION

Inventor： Takeo Oishi ,  Koichi Kimijima ,  Nobuhide Tominaga ,  Hirokatsu Shinano ,  Daisuke Sawamoto

IPC: G03F7/004 ,  C07D209/88 ,  C07D403/12

CPC classification number: G03F7/0045 ,  C07D209/86 ,  C07D209/88 ,  C07D211/70 ,  C07D233/06 ,  C07D241/06 ,  C07D401/12 ,  C07D403/12 ,  G03F7/038

Abstract: A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R5, R6, R7, R8, R9, R10, and R11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.

Abstract translation: 提供具有令人满意的灵敏度的新化合物（碱产生性能），含有该化合物作为光引发剂的感光性树脂组合物和该组合物的固化物。 具体而言，提供由通式（1）表示的化合物（化合物（1）），含有（A）含有至少一种化合物（1）和（B）感光性树脂的光引发剂的感光性树脂组合物。 优选的是其中R 1是未取代或取代的C 6 -C 20芳族烃基的化合物（1），其中R 5，R 6，R 7，R 8，R 9，R 10和R 11中的至少一个是硝基的化合物（1） 和其中n为0的化合物（1）。通式（1）中的符号如说明书中所定义。