专利检索 ap:("ADEKA CORPORATION") AND inv:"Ryota Fukushima" 第 1 页

1.

发明授权
Compound, thin-film forming raw material that contains said compound, and method of manufacturing thin film 有权

公开(公告)号：US12104245B2

公开(公告)日：2024-10-01

申请号：US17771181

申请日：2020-10-19

申请人： ADEKA CORPORATION

发明人： Atsushi Sakurai , Masako Hatase , Masaki Enzu , Keisuke Takeda , Ryota Fukushima , Atsushi Yamashita

IPC分类号： C23C16/18 , C07D487/10 , C07F1/00 , C07F3/00 , C07F7/22 , C07F13/00 , C07F15/04 , C07F15/06 , C23C16/455

CPC分类号： C23C16/18 , C07D487/10 , C07F1/005 , C07F3/003 , C07F7/2284 , C07F13/005 , C07F15/045 , C07F15/065 , C23C16/45553

摘要： Provided is a thin-film forming raw material containing a compound represented by the following formula (1):

in the formula (1), R1 to R5 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a group containing a fluorine atom, M represents a metal atom, and “n” represents a valence of the metal atom represented by M, provided that at least one of R2, R3, and R4 represents the group containing a fluorine atom.