公开(公告)号：US20250155792A1

公开(公告)日：2025-05-15

申请号：US19022508

申请日：2025-01-15

Applicant: AGC Inc.

Inventor： Yuya NAGATA ,  Daijiro AKAGI ,  Kenichi SASAKI ,  Hiroaki IWAOKA

IPC: G03F1/24 ,  G03F1/48

Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light. The substrate, the multilayer reflective film, the protection film, and the phase shift film are arranged in this order. The phase shift film is made of an Ir-based material containing Ir as a main component, and the protection film is made of a Rh-based material containing Rh as a main component.

公开(公告)号：US20240295807A1

公开(公告)日：2024-09-05

申请号：US18649410

申请日：2024-04-29

Applicant: AGC Inc.

Inventor： Yuya NAGATA ,  Daijiro AKAGI ,  Kenichi SASAKI ,  Hiroaki IWAOKA

IPC: G03F1/24 ,  G03F1/26 ,  G03F1/52 ,  G03F1/80

CPC classification number: G03F1/24 ,  G03F1/26 ,  G03F1/52 ,  G03F1/80

Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light. The phase shift film contains Ir as a main component. A ratio of a maximum value of an intensity of a peak of diffracted light from the phase shift film in a 2θ range of 35° to 45° to an average value of an intensity of the diffracted light in a 2θ range of 55° to 60° measured using an XRD method with a CuKα ray, upon being irradiated with the EUV light with an incident angle of θ, is 1.0 or more and 30 or less. A refractive index and an extinction coefficient of the phase shift film to the EUV light are 0.925 or less, and 0.030 or more, respectively.

公开(公告)号：US20240160096A1

公开(公告)日：2024-05-16

申请号：US18420846

申请日：2024-01-24

Applicant: AGC Inc.

Inventor： Yuya NAGATA ,  Daijiro AKAGI ,  Kenichi SASAKI ,  Hiroaki IWAOKA

IPC: G03F1/24 ,  G03F1/48

CPC classification number: G03F1/24 ,  G03F1/48

Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light. The substrate, the multilayer reflective film, the protection film, and the phase shift film are arranged in this order. The phase shift film is made of an Ir-based material containing Ir as a main component, and the protection film is made of a Rh-based material containing Rh as a main component.