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公开(公告)号:US20230215783A1
公开(公告)日:2023-07-06
申请号:US17566294
申请日:2021-12-30
Inventor: Yan Xun Xue , Long-Ching Wang , Xiaoguang Zeng , Mary Jane R. Alin , Hailin Zhou , Guobing Shen
IPC: H01L23/495 , H01L23/31 , H01L23/00
CPC classification number: H01L23/49503 , H01L23/49541 , H01L23/3107 , H01L24/40 , H01L2224/40175
Abstract: A semiconductor package comprises a lead frame, a chip, and a molding encapsulation. The lead frame comprises one or more die paddles comprising a first die paddle. The first die paddle comprises one or more through holes, one or more protrusions with grooves on top surfaces of the one or more protrusions, or one or more squeezed extensions. Each of the one or more through holes is filled with a respective portion of the molding encapsulation. Each of the one or more through holes may be of a rectangular shape, a rectangular shape with four filleted corners, a circular shape, or an oval shape. Each of the grooves is filled with a respective portion of the molding encapsulation. A respective side wall of each of the one or more squeezed extensions is of a swallowtail shape. The swallowtail shape directly contacts the molding encapsulation.
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公开(公告)号:US20250070069A1
公开(公告)日:2025-02-27
申请号:US18783446
申请日:2024-07-25
Inventor: Lin Lv , Zhen Yang , Shuhua Zhou , Long-Ching Wang
IPC: H01L23/00 , H01L21/304 , H01L23/31
Abstract: A semiconductor package comprises a semiconductor substrate, a plurality of contact pads, a plurality of metal bumps, a metal layer, and a molding encapsulation. A thickness of the semiconductor substrate is less than 35 microns. A first method comprises the steps of providing a device wafer; attaching a first carrier; applying a thinning process; forming a metal layer; applying a first tape; removing the first carrier; applying a first singulation process; removing the first tape; attaching a second carrier; forming a molding encapsulation; removing the second carrier; forming a plurality of metal bumps; applying a second tape; and applying a singulation process and removing the second tape. A second method comprises the steps of providing a device wafer; attaching a carrier; applying a thinning process; forming a metal layer; forming a molding encapsulation; removing the carrier; forming a plurality of metal bumps; and applying a singulation process.
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公开(公告)号:US20230307325A1
公开(公告)日:2023-09-28
申请号:US17701695
申请日:2022-03-23
Inventor: Lin Lv , Shuhua Zhou , Long-Ching Wang , Jun Lu
IPC: H01L23/482 , H01L23/29
CPC classification number: H01L23/4827 , H01L23/295 , H01L27/088
Abstract: A semiconductor device comprises a semiconductor substrate, a plurality of metal layers, an adhesive layer, a compound layer, and a plurality of contact pads. A thickness of the semiconductor substrate is in a range from 15 μm to 35 μm. A thickness of the compound layer is larger than the thickness of the semiconductor substrate. A coefficient of thermal expansion of the compound layer is less than or equal to 9 ppm/° C. A glass transition temperature of the compound layer is larger than 150° C. The plurality of metal layers comprises a first titanium layer, a first nickel layer, a silver layer, a second nickel layer, and a metallic layer. In a first example, the metallic layer is a second titanium layer. In a second example, the metallic layer is a Titanium Nitride (TiN) layer.
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公开(公告)号:US11721665B2
公开(公告)日:2023-08-08
申请号:US17750118
申请日:2022-05-20
Inventor: Yan Xun Xue , Madhur Bobde , Long-Ching Wang , Bo Chen
IPC: H01L21/32 , H01L23/00 , H01L21/683 , H01L21/78
CPC classification number: H01L24/97 , H01L21/6836 , H01L21/78 , H01L24/32 , H01L2221/68327 , H01L2221/68368 , H01L2224/32245 , H01L2224/95001
Abstract: A wafer level chip scale semiconductor package comprises a device semiconductor layer, a backside metallization layer, a film laminate layer, and a metal layer. The device semiconductor layer comprises a plurality of metal electrodes disposed on a front surface of the device semiconductor. Each side surface of the backside metallization layer is coplanar with a corresponding side surface of the device semiconductor layer. Each side surface of the metal layer is coplanar with a corresponding side surface of the film laminate layer. A surface area of a back surface of the backside metallization layer is smaller than a surface area of a front surface of the metal layer.
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公开(公告)号:US20220278076A1
公开(公告)日:2022-09-01
申请号:US17750118
申请日:2022-05-20
Inventor: Yan Xun Xue , Madhur Bobde , Long-Ching Wang , Bo Chen
IPC: H01L23/00 , H01L21/683 , H01L21/78
Abstract: A wafer level chip scale semiconductor package comprises a device semiconductor layer, a backside metallization layer, a film laminate layer, and a metal layer. The device semiconductor layer comprises a plurality of metal electrodes disposed on a front surface of the device semiconductor. Each side surface of the backside metallization layer is coplanar with a corresponding side surface of the device semiconductor layer. Each side surface of the metal layer is coplanar with a corresponding side surface of the film laminate layer. A surface area of a back surface of the backside metallization layer is smaller than a surface area of a front surface of the metal layer.
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公开(公告)号:US20220278009A1
公开(公告)日:2022-09-01
申请号:US17187682
申请日:2021-02-26
Inventor: Yan Xun Xue , Long-Ching Wang , Hongyong Xue , Madhur Bobde , Zhiqiang Niu , Jun Lu
Abstract: A method comprises the steps of providing a wafer; applying a redistribution layer, grinding a back side of the wafer; depositing a metal layer; and applying a singulation process. A semiconductor package comprises a metal-oxide-semiconductor field-effect transistor (MOSFET), a redistribution layer, and a metal layer. The MOSFET comprises a source electrode, a gate electrode, a drain electrode and a plurality of partial drain plugs. The source electrode, the gate electrode, and the drain electrode are positioned at a front side of the MOSFET.
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公开(公告)号:US20250070049A1
公开(公告)日:2025-02-27
申请号:US18882783
申请日:2024-09-12
Inventor: Lin Lv , Zhen Yang , Shuhua Zhou , Long-Ching Wang
IPC: H01L23/00 , H01L21/3205 , H01L21/78
Abstract: A semiconductor package comprises a semiconductor substrate, a plurality of contact pads, a seed layer, a first thick metal layer, a second thick metal layer, and a coating metal layer. Direct attachment of the first thick metal layer and the second thick metal layer comprises bonded metal atoms. The first thick metal layer and the second thick metal layer are bonded by an SAB process. A method comprises the steps of providing an upper device portion, providing a lower carrier portion, applying an SAB process, applying a de-bonding process, applying a tape, applying a singulation process, and removing the tape.
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公开(公告)号:US12142548B2
公开(公告)日:2024-11-12
申请号:US17566294
申请日:2021-12-30
Inventor: Yan Xun Xue , Long-Ching Wang , Xiaoguang Zeng , Mary Jane R. Alin , Hailin Zhou , Guobing Shen
IPC: H01L23/495 , H01L23/00 , H01L23/31
Abstract: A semiconductor package comprises a lead frame, a chip, and a molding encapsulation. The lead frame comprises one or more die paddles comprising a first die paddle. The first die paddle comprises one or more through holes, one or more protrusions with grooves on top surfaces of the one or more protrusions, or one or more squeezed extensions. Each of the one or more through holes is filled with a respective portion of the molding encapsulation. Each of the one or more through holes may be of a rectangular shape, a rectangular shape with four filleted corners, a circular shape, or an oval shape. Each of the grooves is filled with a respective portion of the molding encapsulation. A respective side wall of each of the one or more squeezed extensions is of a swallowtail shape. The swallowtail shape directly contacts the molding encapsulation.
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公开(公告)号:US20230021687A1
公开(公告)日:2023-01-26
申请号:US17960700
申请日:2022-10-05
Inventor: Jun Lu , Long-Ching Wang , Madhur Bobde , Bo Chen , Shuhua Zhou
IPC: H01L23/00 , H01L23/31 , H01L21/78 , H01L21/683 , H01L23/15
Abstract: A semiconductor package comprises a semiconductor substrate, a first metal layer, an adhesive layer, a second metal layer, a rigid supporting layer, and a plurality of contact pads. A thickness of the semiconductor substrate is equal to or less than 50 microns. A thickness of the rigid supporting layer is larger than the thickness of the semiconductor substrate. A thickness of the second metal layer is larger than a thickness of the first metal layer. A method comprises the steps of providing a device wafer; providing a supporting wafer; attaching the supporting wafer to the device wafer via an adhesive layer; and applying a singulaton process so as to form a plurality of semiconductor packages.
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公开(公告)号:US11495548B2
公开(公告)日:2022-11-08
申请号:US17137893
申请日:2020-12-30
Inventor: Jun Lu , Long-Ching Wang , Madhur Bobde , Bo Chen , Shuhua Zhou
IPC: H01L23/31 , H01L23/00 , H01L21/78 , H01L21/683 , H01L23/15
Abstract: A semiconductor package comprises a semiconductor substrate, a first metal layer, an adhesive layer, a second metal layer, a rigid supporting layer, and a plurality of contact pads. A thickness of the semiconductor substrate is equal to or less than 50 microns. A thickness of the rigid supporting layer is larger than the thickness of the semiconductor substrate. A thickness of the second metal layer is larger than a thickness of the first metal layer. A method comprises the steps of providing a device wafer; providing a supporting wafer; attaching the supporting wafer to the device wafer via an adhesive layer; and applying a singulation process so as to form a plurality of semiconductor packages.
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