Abstract:
A gas cleaning system for removing gaseous pollutants from a hot process gas comprises a vessel for bringing the hot process gas into contact with an absorbent material, and a separating device for separating at least a portion of the absorbent material from the hot process gas to form a separated dust material. The gas cleaning system further comprises a measuring device for measuring, directly or indirectly, a dust parameter such as a density, and/or a friction, and/or a hygroscopicity, and/or an electrical property of the separated dust material, to obtain a measurement, and a control system for controlling at least one operating parameter of the gas cleaning system based on the measurement of the measured dust parameter.