HEATED SUBSTRATE SUPPORT WITH TEMPERATURE PROFILE CONTROL
    1.
    发明申请
    HEATED SUBSTRATE SUPPORT WITH TEMPERATURE PROFILE CONTROL 有权
    加热基板支持与温度配置文件控制

    公开(公告)号:US20150076135A1

    公开(公告)日:2015-03-19

    申请号:US14481283

    申请日:2014-09-09

    Abstract: Methods and apparatus of substrate supports having temperature profile control are provided herein. In some embodiments, a substrate support includes: a plate having a substrate receiving surface and an opposite bottom surface; and a shaft having a first end comprising a shaft heater and a second end, wherein the first end is coupled to the bottom surface. Methods of making a substrate support having temperature profile control are also provided.

    Abstract translation: 本文提供了具有温度分布控制的基板支撑件的方法和装置。 在一些实施例中,衬底支撑件包括:板,其具有衬底接收表面和相对的底表面; 以及轴,其具有包括轴加热器和第二端的第一端,其中所述第一端联接到所述底表面。 还提供了制造具有温度分布控制的基板支撑件的方法。

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