公开(公告)号：US20030113190A1

公开(公告)日：2003-06-19

申请号：US10348836

申请日：2003-01-22

Applicant: Applied Materials, Inc.

Inventor： Robert Z. Bachrach

IPC: B65G001/00

CPC classification number: H01L21/67727 ,  H01L21/6773 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67781 ,  Y10S414/139 ,  Y10S414/14

Abstract: An improved apparatus and method is provided for storing semiconductor wafer carriers, and for loading wafers or wafer carriers to a fabrication tool. The apparatus preferably provides an elevated port for receipt of wafer carriers from an overhead factory transport, allows for local interconnection among a plurality of the inventive apparatuses, and enables independent loading of the factory load port and the tool load port. An inventive wafer handling method which divides a lot of wafers into sublots and distributes the sublots among tools configured to perform the same process is also provided.

Abstract translation: 提供了一种改进的装置和方法，用于存储半导体晶片载体，并将晶片或晶片载体装载到制造工具。 该设备优选地提供用于从架空工厂运输接收晶片载体的升高端口，允许多个本发明设备之间的本地互连，并且使得能够独立地加载工厂装载端口和工具装载端口。 还提供了一种本发明的晶片处理方法，其将大量晶片划分成子图并且在配置为执行相同处理的工具之间分配子图。

公开(公告)号：US20030124848A1

公开(公告)日：2003-07-03

申请号：US10265620

申请日：2002-10-08

Applicant: APPLIED MATERIALS, INC.

Inventor： Jeffrey D. Chinn ,  Robert Z. Bachrach

IPC: H01L021/302 ,  H01L021/461

CPC classification number: B81C1/00476 ,  B81C99/0065 ,  B81C2201/0142

Abstract: A method of determining the time to release of a movable feature in a multilayer substrate of silicon-containing materials including alternate layers of polysilicon and silicon oxide wherein a mass monitoring device determines the mass of a released feature, and the substrate is etched with anhydrous hydrogen fluoride until the substrate mass is equivalent to that of the released movable feature when the etch time is noted. A suitable mass monitoring device is a quartz crystal microbalance.

Abstract translation: 一种确定在包含多晶硅和氧化硅的交替层的含硅材料的多层衬底中释放可移动特征的时间的方法，其中质量监测装置确定释放特征的质量，并且用无水氢氧化物蚀刻衬底 氟化物，直到当注意到蚀刻时间时，衬底质量等于释放的可移动特征的质量。 合适的质量监测装置是石英晶体微量天平。

公开(公告)号：US20030202868A1

公开(公告)日：2003-10-30

申请号：US10444530

申请日：2003-05-23

Applicant: Applied Materials, Inc.

Inventor： Robert Z. Bachrach

IPC: B65G001/00

CPC classification number: H01L21/6773 ,  H01L21/67733 ,  Y10S414/14

Abstract: A system adapted to exchange wafer carriers between an overhead transport mechanism and a platform is provided. The system employs a wafer carrier having at least one handle extending therefrom, an overhead transfer mechanism, a transporter coupled to the overhead transfer mechanism and adapted to move therealong and having a wafer carrier coupling mechanism adapted to couple to the at least one wafer carrier handle, a platform positioned below the overhead transfer mechanism such that wafer carriers traveling along the overhead transfer mechanism travel over the platform, and an actuator coupled to the platform and adapted so as to elevate the platform to an elevation wherein the loading platform may contact the bottom of a wafer carrier coupled to the overhead transfer mechanism.

公开(公告)号：US20040053184A1

公开(公告)日：2004-03-18

申请号：US10243158

申请日：2002-09-12

Applicant: Applied Materials, Inc.

Inventor： Robert Z. Bachrach ,  Wendell T. Blonigan

IPC: F27D003/00

CPC classification number: H01L21/67748 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/67742 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S414/14

Abstract: A system and method for processing large area substrates is provided. In one embodiment, a processing system includes a transfer chamber having at least one processing chamber and a substrate staging system coupled thereto. The staging system includes a load lock chamber having a first port coupled to the transfer chamber and a heat treating station coupled to a second port of the load lock chamber. A load lock robot is disposed in the load lock chamber to facilitate transfer between the heat treating station and the load lock chamber.

Abstract translation: 提供了一种用于处理大面积基板的系统和方法。 在一个实施例中，处理系统包括具有至少一个处理室和与其耦合的衬底分级系统的传送室。 分级系统包括负载锁定室，其具有耦合到传送室的第一端口和耦合到负载锁定室的第二端口的热处理站。 负载锁定机器人设置在负载锁定室中以便于热处理站和负载锁定室之间的传送。

公开(公告)号：US20020090282A1

公开(公告)日：2002-07-11

申请号：US09755394

申请日：2001-01-05

Applicant: Applied Materials, Inc.

Inventor： Robert Z. Bachrach

IPC: B65G001/00

CPC classification number: H01L21/6773 ,  H01L21/67733 ,  Y10S414/14

Abstract: A system adapted to exchange wafer carriers between an overhead transport mechanism and a platform is provided. The system employs a wafer carrier having at least one handle extending therefrom, an overhead transfer mechanism, a transporter coupled to the overhead transfer mechanism and adapted to move therealong and having a wafer carrier coupling mechanism adapted to couple to the at least one wafer carrier handle, a platform positioned below the overhead transfer mechanism such that wafer carriers traveling along the overhead transfer mechanism travel over the platform, and an actuator coupled to the platform and adapted so as to elevate the platform to an elevation wherein the loading platform may contact the bottom of a wafer carrier coupled to the overhead transfer mechanism.

Abstract translation: 提供了一种适于在架空输送机构和平台之间交换晶片载体的系统。 该系统采用具有从其延伸的至少一个手柄的晶片载体，塔顶转移机构，连接到塔顶转移机构的运输器，并适于沿其移动并具有适于联接到至少一个晶片载体手柄的晶片载体联接机构 位于架空传送机构下方的平台，使得沿着架空传送机构行进的晶片载体在平台上移动;以及致动器，其联接到平台并适于将平台升高至仰角，其中，装载平台可接触底部 耦合到架空输送机构的晶片载体。