公开(公告)号：US20200292084A1

公开(公告)日：2020-09-17

申请号：US16306189

申请日：2017-06-02

Applicant: APPLIED MATERIALS, INC.

Inventor： Joseph YUDOVSKY ,  David ISHIKAWA ,  Travis TESCH

IPC: F16K3/02 ,  B08B5/02 ,  F16K51/02 ,  H01L21/67 ,  G05D16/20

Abstract: Embodiments of gate valves and methods for using same are provided herein. In some embodiments, a gate valve for processing a continuous substrate includes: a body; a plurality of seals disposed within the body and configured to move between a closed position and an open position; a plurality of volumes disposed between adjacent ones of the plurality of seals and defined by the plurality of seals and the body; a gas inlet disposed through a first side of the body and fluidly coupled to an innermost one of the plurality of volumes; and a gas outlet disposed through a second side of the body opposite the first side and fluidly coupled to other ones of the plurality of volumes disposed on either side of the innermost one of the plurality of volumes.